Abstract: The present disclosure provides a waveguide display apparatus. The waveguide waveguide display apparatus of the present disclosure is a waveguide display apparatus for correcting curved surface reflection distortion, the waveguide display apparatus including a waveguide for guiding light inputted from the outside; a first diffractive optical element disposed at the waveguide, and diffracting the light inputted from the outside to the inside of the waveguide; and a second diffractive optical element disposed at the waveguide, and diffracting the light guided by the waveguide to output a plurality of diffracted lights in a direction of a curved surface reflector located outside, wherein the second diffractive optical element has a structure of a diffraction grating corresponding to a curvature of the curved surface reflector such that the diffracted lights are reflected at different locations of the curved surface reflector in directions parallel to each other.

Abstract: A diffractive light guide plate including a light guide unit; an input diffractive optical element that receives lights output from a light source and diffracts the received lights to be guided on the light guide unit; and two output diffractive optical elements disposed in a predetermined region of the light guide unit and having different linear grating patterns from each other, wherein the two output diffractive optical elements are configured so that each one output diffractive optical element receives the lights from the input diffractive optical element and allows the received lights to be directed to the other output diffractive optical element by diffraction, and so that each one output diffractive optical element receives lights from the other output diffractive optical element and allows the received lights to be output from the light guide unit by diffraction, and the two output diffractive optical elements having different linear grating patterns are alternately arranged in at least one dimension

Abstract: An embodiment according to an aspect of the present disclosure provides a device for manufacturing a display lens, a method for manufacturing a display lens using the device, and a head-mounted display device including the display lens manufactured thereby. The device for manufacturing a display lens including a holographic optical element formed by recording a hologram on a photosensitive substrate, in which a substrate is coated with a photosensitive material, through irradiation of laser beams includes: a first laser light incidence unit configured to cause first laser light, converging along an irradiation direction, to be incident on one surface of the photosensitive substrate; and a second laser light incidence unit configured to cause second laser light, diverging at a plurality of points along an irradiation direction, to be incident on the other surface of the photosensitive substrate.

Abstract: The present disclosure provides a diffraction light guide plate including: a light guide unit; an input diffraction optical element configured to diffract light which is outputted from a light source and inputted to the input diffraction optical element, to guide the inputted light on the light guide unit; and two diffraction optical elements configured to receive the diffracted light from the input diffraction optical element and one-dimensionally expand the received light by diffraction, wherein each of the two diffraction optical elements receives the expanded light from the other of the diffraction optical elements and outputs the received light from the light guide unit by the diffraction, and there is no region where the two diffraction optical elements overlap each other on the light guide unit.

Abstract: A diffraction light guide plate, including: a first diffraction substrate; and a second diffraction substrate provided on the first diffraction substrate. The first diffraction substrate includes a first diffraction grating layer on one surface and a second diffraction grating layer on an opposite surface. The second diffraction substrate includes a third diffraction grating layer on one surface and a stress compensation layer on an opposite surface. The first diffraction grating layer separates light having a wavelength of 550 nm or more and 700 nm or less, the second diffraction grating layer separates light having a wavelength of 400 nm or more and 550 nm or less, the third diffraction grating layer separates light having a wavelength of 450 nm or more and 650 nm or less, and the stress compensation layer has stress in the same direction as a direction of stress of the third diffraction grating layer.

Abstract: A method of quantifying whether an adhesive agent leaks from a polarizing plate and/or a degree of leakage of the adhesive agent according to an exemplary embodiment of the present invention, including: (a) preparing a polarizing plate including an adhesive layer; (b) providing the polarizing plate so that one end of the polarizing plate adjoins a guide unit; (c) moving the polarizing plate on the guide unit; (d) measuring frictional force applied between the polarizing plate and the guide unit while moving the polarizing plate; (e) deriving a determination criterion based on the measured value of the frictional force, and (f) determining whether the adhesive agent leaks from the polarizing plate and/or the degree of leakage of the adhesive agent based on the determination criterion.

Abstract: A display device capable of minimizing a light loss occurring due to photodiffraction by scattering, through a light scattering unit, light outputted by a light output unit in a given direction is provided. A part for the display device includes a light scattering unit configured to scatter light, and a light guide unit configured to expand the scattered light in a given direction. The light guide unit includes a light guide, a first optical element disposed on one surface or other surface of the light guide and a second optical element disposed on the one surface or the other surface of the light guide.

Abstract: A method of manufacturing a holographic optical element, including: irradiating a first surface of a photosensitive substrate with a first layer, and irradiating a second surface of the photosensitive substrate with a second laser. The light emitted by the first laser is spread in an irradiation direction and the light emitted by the second laser is collected in the irradiation direction to form a plurality of groups and a plurality of overlapping angles formed by a progress direction of the light emitted by the first laser and the progress direction of the light emitted by the second laser at a predetermined location of a photosensitive area, and each of the plurality of the overlapping angles are different from each other. A display device including the holographic optical element measured using this method.

Abstract: A system for observing an object by using a hologram optical element is disclosed herein. In some embodiments, a system for observing an object includes an infrared (IR) light source for emitting infrared light, a hologram optical element (HOE) including an optical element film, wherein the optical element film for reflecting and diffracting the emitted infrared light, wherein infrared light of a specific wavelength from among the emitted infrared light emitted is reflected towards the object, and an IR light detector for detecting the infrared light of a specific wavelength reflected from the object.

Abstract: The present disclosure provides a diffraction light guide plate, including a light guide unit, an input diffraction optical device configured to receive light from a light source and diffract the received light, an intermediate diffraction optical device configured to receive the diffracted light from the input diffraction optical device and extend the received light one-dimensionally by diffraction, and an output diffraction optical device configured to receive the extended light from the intermediate diffraction optical device and output the received light from the light guide unit by diffraction. The intermediate diffraction optical device and the output diffraction optical device are separately disposed in regions divided horizontally on the light guide unit, and the intermediate diffraction optical device includes a main intermediate diffraction optical device and an auxiliary intermediate diffraction optical device, which are disposed separate apart from each other vertically on the light guide unit.

Abstract: A wearable device which is lighter, relatively safer at the time of breakage, and smaller than a wearable device having a lens substrate that is a glass substrate.

Abstract: The present invention relates to a method for forming an amorphous layer on one surface of a second substrate through a simple method of performing laser irradiation on a multilayered metal layer provided on a first substrate.

Abstract: A three-dimensional printing ink that has a viscosity suitable for three-dimensional printing, and improved performance.

Abstract: A method of manufacturing a module having multiple pattern areas, a module having multiple pattern areas according to the method, and a method of manufacturing a diffraction grating module or a mold for a diffraction grating module. The method of manufacturing a module having multiple pattern areas comprises: disposing a first substrate having a first pattern on a first base substrate; forming a first cutting line on the first substrate; forming a second cutting line on the first substrate; removing any one of a first area defined by the first cutting line and a second area defined by the second cutting line from the first substrate to form a removed area on the first substrate; disposing a second base substrate having a second pattern different from the first pattern in the removed area; and removing the first substrate from the base substrate without removing the first and second areas.

Abstract: The present invention provides a nanoparticle synthesis device capable of improving productivity of nanoparticles by increasing the size of a reaction region of laser pyrolysis of a source gas.

Abstract: A reactor for nanoparticle production comprising a main chamber including a first nozzle to which raw material gas is supplied, a lens housing connected to the main chamber in a fluidly movable manner and including a second nozzle for supplying flushing gas to the lens housing, a lens mounted on the lens housing, a light source for irradiating a laser, which passes through the lens to reach the raw material gas in the main chamber, and a hood for discharging nanoparticles generated in the main chamber. A cross-sectional area of at least a part of the lens housing decreases along a direction facing the main chamber.

Abstract: A plasma etching method using a Faraday cage, which effectively produces a blazed grating pattern.

Abstract: A joining material for laser welding, a laser welding method using the same, and a laser joined body using the laser welding method. The joining material includes a polymer matrix and a needle-shaped inorganic filler. The polymer matrix includes a polypropylene resin having a melt index of 80 g/10 min or more to 95 g/10 min or less as measured at a temperature of 230° C. and a load of 2.16 kg, and the needle-shaped inorganic filler has an aspect ratio of 10:1 to 20:1.

Abstract: The present specification relates to a joint body of different materials, and a method of manufacturing the same. The joint body includes a metal layer; and a resin layer provided on and in contact with one surface of the metal layer. The metal layer comprises two or more etching grooves and two or more burrs provided on a surface of the metal layer adjacent to the etching grooves.

Abstract: A plasma etching method using a Faraday cage, including: providing an etch substrate in a Faraday cage, where the etch substrate includes a metal mask provided on one surface thereof, and where an upper surface of the Faraday cage is provided with a mesh portion; a first patterning step of forming a first pattern area on the etch substrate; and a second patterning step of forming a second pattern area on the etch substrate after shielding at least a part of the mesh portion with a shutter. The first pattern area includes a first groove pattern having a depth gradient of 0 to 40 nm per 5 mm, and the second pattern area includes a second groove pattern having a depth gradient of 50 to 300 nm per 5 mm.