Abstract: Disclosed is an apparatus for generating EUV light by means of plasma, the apparatus comprising: a laser source for outputting laser; a tunable laser mirror (TLM) for reflecting laser beams from the laser source; a focusing mirror (FM) for focusing the laser beams reflected from the TLM; a gas cell for generating EUV light by forming a plasma from the laser beams and reaction gas, the laser being incident on the gas cell after being focused on the TM, and the reaction gas being supplied by a gas supply line for a plasma-induced path corresponding to a section on the gas cell in which the focal point of the incident laser occurs; and a vacuum chamber for accommodating the TLM, FM and the gas cell in a state of vacuum. The present invention having features as discussed has the benefit of allowing simple but effective generation of EUV light.