Patents by Inventor Buguslaw Swedek

Buguslaw Swedek has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and apparatus for optical monitoring in chemical mechanical polishing
    Patent number: 6659842
    Abstract: An apparatus, as well as a method, brings a surface of a substrate into contact with a polishing pad that has a window, causes relative motion between the substrate and the polishing pad, and directs a light beam through the window so that the motion of the polishing pad relative to the substrate causes the light beam to move in a path across the substrate. Light beam reflections from the substrate are detected, and used to determine polishing parameters, detect process repeatability, and qualify processes.
    Type: Grant
    Filed: August 14, 2001
    Date of Patent: December 9, 2003
    Assignee: Applied Materials Inc.
    Inventors: Andreas Norbert Wiswesser, Judon Tony Pan, Buguslaw Swedek, Manoocher Birang
  • Method and apparatus for optical monitoring in chemical mechanical polishing
    Publication number: 20020013120
    Abstract: An apparatus, as well as a method, brings a surface of a substrate into contact with a polishing pad that has a window, causes relative motion between the substrate and the polishing pad, and directs a light beam through the window so that the motion of the polishing pad relative to the substrate causes the light beam to move in a path across the substrate. Light beam reflections from the substrate are detected, and used to determine polishing parameters, detect process repeatability, and qualify processes.
    Type: Application
    Filed: August 14, 2001
    Publication date: January 31, 2002
    Applicant: Applied Materials, a Delaware corporation
    Inventors: Andreas Norbert Wiswesser, Judon Tony Pan, Buguslaw Swedek, Manoocher Birang