Abstract: An evaluation method for evaluating an aberration of a projection optical system in an exposure apparatus is provided. A first prediction coefficient of a first prediction formula for an aberration that is symmetrical with respect to an optical axis of the projection optical system is obtained, and a second prediction coefficient of a second prediction formula for an aberration that is asymmetrical with respect to the optical axis of the projection optical system is obtained. The aberration of the projection optical system is evaluated using the first prediction coefficient in a case where the shape of the illuminated region is determined as symmetrical with respect to the optical axis, and the aberration of the projection optical system is evaluated using the first and the second prediction coefficients in a case where the shape of the illuminated region is asymmetrical with respect to the optical axis.

Abstract: An evaluation method for evaluating an aberration of a projection optical system in an exposure apparatus is provided. A first prediction coefficient of a first prediction formula for an aberration that is symmetrical with respect to an optical axis of the projection optical system is obtained, and a second prediction coefficient of a second prediction formula for an aberration that is asymmetrical with respect to the optical axis of the projection optical system is obtained. The aberration of the projection optical system is evaluated using the first prediction coefficient in a case where the shape of the illuminated region is determined as symmetrical with respect to the optical axis, and the aberration of the projection optical system is evaluated using the first and the second prediction coefficients in a case where the shape of the illuminated region is asymmetrical with respect to the optical axis.

Abstract: The present invention provides an exposure apparatus including a projection optical system configured to project light from a reticle onto a substrate, a processor configured to estimate a variation in imaging characteristic of the projection optical system, based on a model determined in advance, and an adjusting device configured to adjust the imaging characteristic of the projection optical system based on the variation estimated by the processor, wherein the processor is configured, if an error of the imaging characteristic of the projection optical system adjusted by the adjusting device based on the variation which is estimated based on a first number of models, for estimating the variation, determined in advance without the reticle, does not fall within a tolerance, to generate a second number of models for estimating the variation, the second number being larger than the first number.

Abstract: The present invention provides an exposure apparatus comprising a projection optical system configured to project a pattern of a reticle onto a substrate, a driving unit configured to drive a plurality of optical elements which form the projection optical system so as to adjust an imaging state of light which passes through the projection optical system, a detecting unit configured to detect a driving error when the driving unit drives a first optical element of the plurality of optical elements, and a control unit configured to control the driving unit to drive a second optical element different from the first optical element of the plurality of optical elements so as to reduce a change in the imaging state of the light which passes through the projection optical system due to the driving error.

Abstract: The present invention provides an exposure apparatus comprising a projection optical system configured to project a pattern of a reticle onto a substrate, a driving unit configured to drive a plurality of optical elements which form the projection optical system so as to adjust an imaging state of light which passes through the projection optical system, a detecting unit configured to detect a driving error when the driving unit drives a first optical element of the plurality of optical elements, and a control unit configured to control the driving unit to drive a second optical element different from the first optical element of the plurality of optical elements so as to reduce a change in the imaging state of the light which passes through the projection optical system due to the driving error.

Abstract: The present invention provides an exposure apparatus comprising a projection optical system configured to project a pattern of a reticle onto a substrate, a driving unit configured to drive a plurality of optical elements which form the projection optical system so as to adjust an imaging state of light which passes through the projection optical system, a detecting unit configured to detect a driving error when the driving unit drives a first optical element of the plurality of optical elements, and a control unit configured to control the driving unit to drive a second optical element different from the first optical element of the plurality of optical elements so as to reduce a change in the imaging state of the light which passes through the projection optical system due to the driving error.

Abstract: The present invention provides an exposure apparatus including a projection optical system configured to project light from a reticle onto a substrate, a processor configured to estimate a variation in imaging characteristic of the projection optical system, based on a model determined in advance, and an adjusting device configured to adjust the imaging characteristic of the projection optical system based on the variation estimated by the processor, wherein the processor is configured, if an error of the imaging characteristic of the projection optical system adjusted by the adjusting device based on the variation which is estimated based on a first number of models, for estimating the variation, determined in advance without the reticle, does not fall within a tolerance, to generate a second number of models for estimating the variation, the second number being larger than the first number.

Abstract: The present invention provides an exposure apparatus comprising a projection optical system configured to project a pattern of a reticle onto a substrate, a driving unit configured to drive a plurality of optical elements which form the projection optical system so as to adjust an imaging state of light which passes through the projection optical system, a detecting unit configured to detect a driving error when the driving unit drives a first optical element of the plurality of optical elements, and a control unit configured to control the driving unit to drive a second optical element different from the first optical element of the plurality of optical elements so as to reduce a change in the imaging state of the light which passes through the projection optical system due to the driving error.