Patents by Inventor Byeol Han

Byeol Han has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250074144
    Abstract: An air conditioning system for a vehicle includes an input device connected to an air conditioning device in which an air conditioning area of conditioned air is allocated to each discharge port; a temperature sensor that detects an indoor temperature or an outdoor temperature; and a controller that stores determination modes, determines a temperature or discharge area of the conditioned air depending on a difference between the indoor temperature and the outdoor temperature, and outputs a control signal to be transmitted to the input device. The air conditioning system can adjust the temperature and discharge direction of the conditioned air based on the outdoor temperature and an air conditioning load to optimize air conditioning efficiency.
    Type: Application
    Filed: March 15, 2024
    Publication date: March 6, 2025
    Inventors: Byeol Han, Yoon Hyung Lee, Jae Geun Jeong, Myung Hoe Kim, Yu Mi Kim
  • Publication number: 20250010693
    Abstract: An air vent device for a vehicle includes an air guide configured to protrude towards a passage through which air flows, wherein a length of the air guide protruding into the passage is adjustable by rotation with respect to the passage.
    Type: Application
    Filed: November 15, 2023
    Publication date: January 9, 2025
    Applicants: HYUNDAI MOTOR COMPANY, KIA CORPORATION, ITW EF&C KOREA LLC.
    Inventors: Yu Mi Kim, Yoon Hyung Lee, Myung Hoe Kim, Byeol Han, Jin Hu Kim, Joong Ho Maeng, Yong Seok Park
  • Patent number: 10622226
    Abstract: Disclosed are an apparatus and a method for cleaning a component of a substrate dry processing apparatus. The method for cleaning a component of a substrate dry processing apparatus includes dipping the component in a cleaning solution received in a cleaning bath, generating radicals from the cleaning solution, and cleaning the component with the radicals. The component is cleaned with hydrogen radicals (H2*) and hydroxyl radicals (OH*) generated from ozone water. Accordingly, it is possible to rapidly remove carbon (C) and fluorine (F) deposited on the component.
    Type: Grant
    Filed: October 17, 2017
    Date of Patent: April 14, 2020
    Assignee: SEMES CO. LTD.
    Inventors: Soon-Cheon Cho, Bongkyu Shin, Byeol Han, Hyun Joong Kim
  • Publication number: 20180108546
    Abstract: Disclosed are an apparatus and a method for cleaning a component of a substrate dry processing apparatus. The method for cleaning a component of a substrate dry processing apparatus includes dipping the component in a cleaning solution received in a cleaning bath, generating radicals from the cleaning solution, and cleaning the component with the radicals. The component is cleaned with hydrogen radicals (H2*) and hydroxyl radicals (OH*) generated from ozone water. Accordingly, it is possible to rapidly remove carbon (C) and fluorine (F) deposited on the component.
    Type: Application
    Filed: October 17, 2017
    Publication date: April 19, 2018
    Inventors: Soon-Cheon Cho, Bongkyu Shin, Byeol Han, Hyun Joong Kim