Abstract: There are provided an electrostatic chuck (ESC) temperature control unit capable of independently controlling multi-zones of an electrostatic chuck using an alternating current (AC) heater and a direct current (DC) heater, and a substrate treating apparatus including the same. The substrate treating apparatus includes: a housing; a substrate support unit; a shower head unit; a plasma generating unit; and an ESC temperature control unit, wherein the ESC temperature control unit which controls a temperature of the electrostatic chuck includes: a plurality of first heaters; a plurality of second heaters providing power different from that of the first heaters; and a control module controlling the first heaters and the second heaters, and the control module independently controls the first heaters and the second heaters.

Abstract: Disclosed is a substrate treating apparatus including a chamber having a process space therein in which a substrate is treated, a substrate support assembly located in the chamber and including a support plate that supports the substrate, a gas supply unit that supplies gas into the chamber, a gas distribution plate that distributes the gas and supplies the gas into the process space, and a temperature control unit that controls temperature of the gas distribution plate. The temperature control unit includes a heating member that heats the gas distribution plate, a cooling member that cools the gas distribution plate, and a control member that controls the heating member and the cooling member, based on a correlation coefficient regarding an interaction of the heating member and the cooling member and a disturbance coefficient regarding an external influence.

Abstract: Disclosed is a substrate treating apparatus including a chamber having a process space therein in which a substrate is treated, a substrate support assembly located in the chamber and including a support plate that supports the substrate, a gas supply unit that supplies gas into the chamber, a gas distribution plate that distributes the gas and supplies the gas into the process space, and a temperature control unit that controls temperature of the gas distribution plate. The temperature control unit includes a heating member that heats the gas distribution plate, a cooling member that cools the gas distribution plate, and a control member that controls the heating member and the cooling member, based on a correlation coefficient regarding an interaction of the heating member and the cooling member and a disturbance coefficient regarding an external influence.