Abstract: The present invention relates to a focus ring for improvement of a semiconductor plasma etching process, which is circular, penetrates vertically into the middle portion thereof, and has a plurality of slots equally spaced apart from one another by a given distance on the edge periphery of the underside thereof in a longitudinal direction thereof, wherein so as to allow a plasma to be dispersed and exhausted uniformly at a fast speed through the slots, each slot becomes increased or decreased in diameter in a direction from top to bottom thereof to thus have a top diameter and a bottom diameter different from each other, and otherwise, each slot is rounded inward from both of top and bottom peripheries thereof.

Abstract: Provided herein is a mechanism for correcting the deformation generated at a portion of the rotation pin between a single pole unit farthest away from a switching mechanism and a single pole unit adjacent thereto, and there is disclosed a correction plate provided at a portion of the pair of rotation pins located between a single pole unit farthest away from the switching mechanism and a single pole unit adjacent thereto, having a pair of rotation pin through hole portions to allow the pair of rotation pins to be penetrated, respectively, and a pair of adjustment extending portions extended in the direction in which the rotation pins penetrate at the upper or lower portion of the rotation pin through hole portions to determine the height of penetration allowance hole of the rotation pins together with the rotation pin through hole portions.

Abstract: A movable contactor assembly for a current limiting type circuit breaker comprises a movable contactor having a pair of curved protrusions having cam profiles, a shaft to rotatably support the movable contactor located therein, a pair of contact levers each having a contact surface contactable with the curved protrusion of the movable contactor and a pair of spring supporting recess portions and a pair of springs each having both end portions supported by the spring supporting recess portions, the pair of springs applying an elastic force as contact pressure for maintaining a contact state between the movable contactor and the stationary contactor when the movable contactor is located at the first position, and applying the elastic force in a direction to separate the movable contactor from the stationary contactor when the movable contactor is moved over a dead point while rotating toward the second position.

Abstract: A movable contactor assembly for a current limiting type circuit breaker comprises a movable contactor having a pair of curved protrusions having cam profiles, a shaft to rotatably support the movable contactor located therein, a pair of contact levers each having a contact surface contactable with the curved protrusion of the movable contactor and a pair of spring supporting recess portions and a pair of springs each having both end portions supported by the spring supporting recess portions, the pair of springs applying an elastic force as contact pressure for maintaining a contact state between the movable contactor and the stationary contactor when the movable contactor is located at the first position, and applying the elastic force in a direction to separate the movable contactor from the stationary contactor when the movable contactor is moved over a dead point while rotating toward the second position.

Abstract: Provided herein is a mechanism for correcting the deformation generated at a portion of the rotation pin between a single pole unit farthest away from a switching mechanism and a single pole unit adjacent thereto, and there is disclosed a correction plate provided at a portion of the pair of rotation pins located between a single pole unit farthest away from the switching mechanism and a single pole unit adjacent thereto, having a pair of rotation pin through hole portions to allow the pair of rotation pins to be penetrated, respectively, and a pair of adjustment extending portions extended in the direction in which the rotation pins penetrate at the upper or lower portion of the rotation pin through hole portions to determine the height of penetration allowance hole of the rotation pins together with the rotation pin through hole portions.