Abstract: There is provided a substrate for a surface acoustic wave device, comprising a 2-dimensional (2D) crystalline hexagonal boron nitride layer, wherein a surface acoustic wave of the surface acoustic wave device is transmitted through the 2D crystalline hexagonal boron nitride layer.

Abstract: A memory device includes at least one semiconductor layer having a double PN junction, and an anode and a cathode which simultaneously contact the semiconductor layer, wherein a junction between the semiconductor layer and the anode is a Schottky junction, and a junction between the semiconductor layer and the cathode is an Ohmic junction. In addition, a capacitor-less memory device includes at least one semiconductor layer including a double PN junction, a control gate which contacts the semiconductor layer, and an anode and a cathode which simultaneously contact the semiconductor layer, wherein a junction between the semiconductor layer and the anode is a Schottky junction, and a junction between the semiconductor layer and the cathode is an Ohmic junction. Methods of operating the memory device and the capacitor-less memory device are also disclosed.

Abstract: A memory device includes at least one semiconductor layer having a double PN junction, and an anode and a cathode which simultaneously contact the semiconductor layer, wherein a junction between the semiconductor layer and the anode is a Schottky junction, and a junction between the semiconductor layer and the cathode is an Ohmic junction. In addition, a capacitor-less memory device includes at least one semiconductor layer including a double PN junction, a control gate which contacts the semiconductor layer, and an anode and a cathode which simultaneously contact the semiconductor layer, wherein a junction between the semiconductor layer and the anode is a Schottky junction, and a junction between the semiconductor layer and the cathode is an Ohmic junction. Methods of operating the memory device and the capacitor-less memory device are also disclosed.

Abstract: A device having: a substrate having a dielectric surface; a gate electrode; a drain electrode; a source electrode having a conductive contact and a two-dimensional material edge; and a dielectric material between the source and the gate. The source is adjacent to the gate. The drain electrode is not laterally between the edge and the gate electrode, and the distance from the drain electrode to the edge is greater than the distance from the gate electrode to the edge. The edge does not contact any other component of the device. The gate, drain, and source are not in electrical contact with each other. There is a line of sight or electron path from the edge to the drain electrode.

Abstract: A device having: a substrate having a dielectric surface; a gate electrode; a drain electrode; a source electrode having a conductive contact and a two-dimensional material edge; and a dielectric material between the source and the gate. The source is adjacent to the gate. The drain electrode is not laterally between the edge and the gate electrode, and the distance from the drain electrode to the edge is greater than the distance from the gate electrode to the edge. The edge does not contact any other component of the device. The gate, drain, and source are not in electrical contact with each other. There is a line of sight or electron path from the edge to the drain electrode.