Patents by Inventor Byoung Guk SON

Byoung Guk SON has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Substrate processing apparatus
    Patent number: 11292023
    Abstract: The present invention provides a substrate processing apparatus including: a process chamber having a process space in which a substrate is processed; a substrate support including a susceptor having a plurality of pocket grooves recessed in a circumferential direction from a top surface with a circular plate shape so that the substrate is seated, a shaft configured to rotate the susceptor, and a satellite seated in the pocket groove and on which the substrate is seated; and a gas injection unit disposed at an upper portion of the process chamber to face the substrate support, thereby injecting a process gas toward the substrate support.
    Type: Grant
    Filed: December 9, 2020
    Date of Patent: April 5, 2022
    Assignee: WONIK IPS CO., LTD.
    Inventors: Woo Young Park, Ja Hyun Koo, Chang Hee Han, Sung Eun Lee, Sung Ho Jeon, Byoung Guk Son, Sung Ho Roh, Yeong Taek Oh
  • SUBSTRATE PROCESSING APPARATUS
    Publication number: 20210170436
    Abstract: The present invention provides a substrate processing apparatus including: a process chamber having a process space in which a substrate is processed; a substrate support including a susceptor having a plurality of pocket grooves recessed in a circumferential direction from a top surface with a circular plate shape so that the substrate is seated, a shaft configured to rotate the susceptor, and a satellite seated in the pocket groove and on which the substrate is seated; and a gas injection unit disposed at an upper portion of the process chamber to face the substrate support, thereby injecting a process gas toward the substrate support.
    Type: Application
    Filed: December 9, 2020
    Publication date: June 10, 2021
    Applicant: WONIK IPS CO., LTD.
    Inventors: Woo Young PARK, Ja Hyun KOO, Chang Hee HAN, Sung Eun LEE, Sung Ho JEON, Byoung Guk SON, Sung Ho ROH, Yeong Taek OH
  • Substrate processing apparatus and substrate processing method using the same
    Patent number: 10662528
    Abstract: Provided are a substrate processing apparatus and a substrate processing method using the same and, more particularly, a substrate processing apparatus capable of controlling deposition of a reactive-metal-containing precursor in an exhaust line, and a substrate processing method using the same.
    Type: Grant
    Filed: December 12, 2017
    Date of Patent: May 26, 2020
    Assignee: WONIK IPS CO., LTD.
    Inventors: Jeong Min Lee, Jin Pil Heo, Tae Ho Jeon, Seung Han Lee, Byoung Guk Son
  • SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USING THE SAME
    Publication number: 20180163303
    Abstract: Provided are a substrate processing apparatus and a substrate processing method using the same and, more particularly, a substrate processing apparatus capable of controlling deposition of a reactive-metal-containing precursor in an exhaust line, and a substrate processing method using the same.
    Type: Application
    Filed: December 12, 2017
    Publication date: June 14, 2018
    Inventors: Jeong Min LEE, Jin Pil HEO, Tae Ho JEON, Seung Han LEE, Byoung Guk SON