Patents by Inventor Byoung Gyu Song
Byoung Gyu Song has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20220328340Abstract: The present disclosure relates to a substrate transfer device for sensing deflection of an end-effector and a substrate processing apparatus having the same. The substrate transfer device includes: an end-effector extending in a first direction and supporting a substrate; an end-effector hand connected with one side in the first direction of the end-effector; a horizontal movement unit connected with the end-effector hand and moving the end-effector in the first direction; and a deflection sensing unit including a light emitting part and a light receiving part, which are respectively disposed at both sides of a movement path of the end-effector, and sensing deflection of the end-effector.Type: ApplicationFiled: April 8, 2022Publication date: October 13, 2022Inventors: Byoung Gyu SONG, Hyeong Sik KO, Hyeong Hwan BAE, Jun Jin HYON
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Patent number: 10793949Abstract: The present disclosure relates to a substrate processing apparatus and a substrate processing method using the same, and more particularly, to a substrate processing apparatus that is capable of improving a flow of a process gas that is participated in a substrate processing process and a substrate processing method using the same.Type: GrantFiled: October 10, 2016Date of Patent: October 6, 2020Assignee: EUGENE TECHNOLOGY CO., LTD.Inventors: Jun Jin Hyon, Sung Tae Je, Byoung Gyu Song, Yong Ki Kim, Kyong Hun Kim, Chang Dol Kim, Yang Sik Shin, Jae Woo Kim
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Patent number: 10593545Abstract: A substrate processing method in which processes with respect to substrates are performed comprises: stacking the substrates on a substrate holder disposed in a staking space formed within a lower chamber through a passage formed in a side of the lower chamber, exhausting the stacking space through an auxiliary exhaust port connected to the stacking space, moving the substrate holder into an external reaction tube closing an opened upper side of the lower chamber to provide a process space in which the processes are performed, and supplying a reaction gas into the process space using a supply nozzle connected to the process space and exhausting the process space using an exhaust nozzle connected to the process space and an exhaust port connected to the exhaust nozzle.Type: GrantFiled: February 7, 2017Date of Patent: March 17, 2020Assignee: EUGENE TECHNOLOGY CO., LTD.Inventors: Il-Kwang Yang, Sung-Tae Je, Byoung-Gyu Song, Yong-Ki Kim, Kyong-Hun Kim, Yang-Sik Shin
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Patent number: 10337103Abstract: Provided is a substrate processing apparatus including a tube having an inner space therein, a substrate supporting unit including a plurality of isolation plates configured to vertically stack a plurality of substrates thereon and divide a processing space, in which the plurality of substrates are processed, into a plurality of processing spaces in the tube, a gas supply unit configured to supply a processing gas to the plurality of substrates, and an exhaust unit disposed to face the gas supply unit to exhaust a gas inside the tube. A plurality of through-holes are defined in each of the isolation plates.Type: GrantFiled: July 26, 2016Date of Patent: July 2, 2019Assignee: EUGENE TECHNOLOGY CO., LTD.Inventors: Jun Jin Hyon, Sung Tae Je, Byoung Gyu Song, Yong Ki Kim, Kyoung Hun Kim, Chang Dol Kim, Yang Sik Shin, Jae Woo Kim
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Patent number: 10229845Abstract: Provided is a substrate processing apparatus.Type: GrantFiled: October 17, 2014Date of Patent: March 12, 2019Assignee: EUGENE TECHNOLOGY CO., LTD.Inventors: Jun-Jin Hyon, Byoung-Gyu Song, Kyong-Hun Kim, Yong-Ki Kim, Yang-Sik Shin, Chang-Dol Kim
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Patent number: 10161036Abstract: The present invention may include: a tube providing an interior space in which substrates are processed; a substrate support portion stacking a plurality of substrates in the interior space of the tube in multi-level; a gas supply portion supplying a process gas to the plurality of substrates; an exhaust portion disposed to face the gas supply portion to absorb the process gas; and a flowage adjustment portion having spray openings formed along a circumference of the tube between the gas supply portion and the exhaust portion to spray an adjusting gas, and may be capable of controlling the amount of process gas supplied to an upper surface of the substrate by adjusting the flowage of process gas.Type: GrantFiled: July 26, 2016Date of Patent: December 25, 2018Assignee: EUGENE TECHNOLOGY CO., LTD.Inventors: Jun Jin Hyon, Sung Tae Je, Byoung Gyu Song, Yong Ki Kim, Kyoung Hun Kim, Chang Dol Kim, Yang Sik Shin, Jae Woo Kim
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Patent number: 9953850Abstract: Provided is a substrate processing apparatus.Type: GrantFiled: November 16, 2012Date of Patent: April 24, 2018Assignee: EUGENE TECHNOLOGY CO., LTD.Inventors: Il-Kwang Yang, Sung-Tae Je, Byoung-Gyu Song, Yong-Ki Kim, Kyong-Hun Kim, Yang-Sik Shin
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Patent number: 9875895Abstract: Provided is a substrate processing apparatus.Type: GrantFiled: November 16, 2012Date of Patent: January 23, 2018Assignee: EUGENE TECHNOLOGY CO., LTD.Inventors: Il-Kwang Yang, Sung-Tae Je, Byoung-Gyu Song, Yong-Ki Kim, Kyong-Hun Kim, Yang-Sik Shin
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Patent number: 9869019Abstract: Provided is a substrate processing apparatus. The substrate processing apparatus in which a process with respect to substrates is performed includes a lower chamber having an opened upper portion, the lower chamber having a passage, through which the substrates are accessible, in a side thereof, an external reaction tube closing the opened upper portion of the lower chamber to provide a process space in which the process is performed, a substrate holder on which the one or more substrates are vertically stacked, the substrate holder being movable between a stacking position at which the substrates are stacked within the substrate holder and a process position at which the process with respect to the substrates is performed, a gas supply unit supplying a reaction gas into the process space, and a processing unit disposed outside the external reaction tube to activate the reaction gas, thereby performing the process with respect to the substrates.Type: GrantFiled: November 23, 2012Date of Patent: January 16, 2018Assignee: EUGENE TECHNOLOGY CO., LTD.Inventors: Il-Kwang Yang, Byoung-Gyu Song, Yong-Ki Kim, Kyong-Hun Kim, Yang-Sik Shin
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Publication number: 20170148649Abstract: A substrate processing method in which processes with respect to substrates are performed comprises: stacking the substrates on a substrate holder disposed in a staking space formed within a lower chamber through a passage formed in a side of the lower chamber, exhausting the stacking space through an auxiliary exhaust port connected to the stacking space, moving the substrate holder into an external reaction tube closing an opened upper side of the lower chamber to provide a process space in which the processes are performed, and supplying a reaction gas into the process space using a supply nozzle connected to the process space and exhausting the process space using an exhaust nozzle connected to the process space and an exhaust port connected to the exhaust nozzle.Type: ApplicationFiled: February 7, 2017Publication date: May 25, 2017Applicant: EUGENE TECHNOLOGY CO., LTD.Inventors: IL-KWANG YANG, SUNG-TAE JE, BYOUNG-GYU SONG, YONG-KI KIM, KYONG-HUN KIM, YANG-SIK SHIN
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Publication number: 20170137938Abstract: The present disclosure relates to a substrate processing apparatus and a substrate processing method using the same, and more particularly, to a substrate processing apparatus that is capable of improving a flow of a process gas that is participated in a substrate processing process and a substrate processing method using the same.Type: ApplicationFiled: October 10, 2016Publication date: May 18, 2017Inventors: Jun Jin HYON, Sung Tae JE, Byoung Gyu SONG, Yong Ki KIM, Kyong Hun KIM, Chang Dol KIM, Yang Sik SHIN, Jae Woo KIM
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Patent number: 9644895Abstract: Provided is a substrate processing apparatus. The substrate processing apparatus includes a chamber providing an inner space in which a process with respect to a substrate is performed, a heating plate on which the substrate is placed, the heating plate being fixedly disposed within the chamber, a heater spaced from a lower portion of the heating plate to heat the heating plate, and a lift module lifting the heater.Type: GrantFiled: April 3, 2013Date of Patent: May 9, 2017Assignee: EUGENE TECHNOLOGY CO., LTD.Inventors: Il-Kwang Yang, Byoung-Gyu Song, Kyong-Hun Kim, Yong-Ki Kim, Yang-Sik Shin
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Patent number: 9620395Abstract: Provided is a substrate processing apparatus. The substrate processing apparatus in which processes with respect to substrates are performed includes a lower chamber having an opened upper side, the lower chamber including a passage allowing the substrates to pass therethrough in a side thereof, an external reaction tube closing the opened upper side of the lower chamber to provide a process space in which the processes are performed, a substrate holder on which the one ore more substrates are vertically stacked, the substrate holder being movable between a stacking position in which the substrates are stacked within the substrate holder and a process position in which the processes with respect to the substrates are performed, and a gas supply unit disposed inside the external reaction tube to supply a reaction gas into the process space, the gas supply unit forming a flow of the reaction gas having different phase differences in a vertical direction.Type: GrantFiled: November 16, 2012Date of Patent: April 11, 2017Assignee: EUGENE TECHNOLOGY CO., LTD.Inventors: Il-Kwang Yang, Sung-Tae Je, Byoung-Gyu Song, Yong-Ki Kim, Kyong-Hun Kim, Yang-Sik Shin
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Publication number: 20170073810Abstract: The present invention may include: a tube providing an interior space in which substrates are processed; a substrate support portion stacking a plurality of substrates in the interior space of the tube in multi-level; a gas supply portion supplying a process gas to the plurality of substrates; an exhaust portion disposed to face the gas supply portion to absorb the process gas; and a flowage adjustment portion having spray openings formed along a circumference of the tube between the gas supply portion and the exhaust portion to spray an adjusting gas, and may be capable of controlling the amount of process gas supplied to an upper surface of the substrate by adjusting the flowage of process gas.Type: ApplicationFiled: July 26, 2016Publication date: March 16, 2017Inventors: Jun Jin HYON, Sung Tae JE, Byoung Gyu SONG, Yong Ki KIM, Kyoung Hun KIM, Chang Dol KIM, Yang Sik SHIN, Jae Woo KIM
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Publication number: 20170073813Abstract: Provided is a substrate processing apparatus including a tube having an inner space therein, a substrate supporting unit including a plurality of isolation plates configured to vertically stack a plurality of substrates thereon and divide a processing space, in which the plurality of substrates are processed, into a plurality of processing spaces in the tube, a gas supply unit configured to supply a processing gas to the plurality of substrates, and an exhaust unit disposed to face the gas supply unit to exhaust a gas inside the tube. A plurality of through-holes are defined in each of the isolation plates.Type: ApplicationFiled: July 26, 2016Publication date: March 16, 2017Inventors: Jun Jin HYON, Sung Tae JE, Byoung Gyu SONG, Yong Ki KIM, Kyoung Hun KIM, Chang Dol KIM, Yang Sik SHIN, Jae Woo KIM
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Patent number: 9593418Abstract: Provided is a substrate processing apparatus. The substrate processing apparatus includes a chamber body having an opened upper side, the chamber body providing an inner space in which processes with respect to a substrate are performed, a chamber lid disposed on an upper portion of the chamber body to close the opened upper side of the chamber body, and a showerhead disposed on a lower portion of the chamber lid to supply a reaction gas into the inner space. The showerhead includes a flange contacting the chamber lid, the flange having a passage recessed from a top surface of the flange to allow a refrigerant to flow therein, and a flat plate disposed inside the flange, the flat plate having at least one injection hole for injecting the reaction gas in a thickness direction thereof.Type: GrantFiled: November 23, 2012Date of Patent: March 14, 2017Assignee: EUGENE TECHNOLOGY CO., LTD.Inventors: Il-Kwang Yang, Byoung-Gyu Song, Yong-Ki Kim, Kyong-Hun Kim, Yang-Sik Shin
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Patent number: 9593415Abstract: Provided is a substrate processing apparatus.Type: GrantFiled: November 16, 2012Date of Patent: March 14, 2017Assignee: EUGENE TECHNOLOGY CO., LTD.Inventors: Il-Kwang Yang, Sung-Tae Je, Byoung-Gyu Song, Yong-Ki Kim, Kyong-Hun Kim, Yang-Sik Shin
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Publication number: 20160195331Abstract: Provided is a substrate processing apparatus.Type: ApplicationFiled: October 17, 2014Publication date: July 7, 2016Applicant: EUGENE TECHNOLOGY CO., LTD.Inventors: Jun-Jin HYON, Byoung-Gyu SONG, Kyong-Hun KIM, Yong-Ki KIM, Yang-Sik SHIN, Chang-Dol KIM
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Patent number: 9368380Abstract: Provided is a substrate processing apparatus. The substrate processing apparatus includes a chamber providing a stacking space in which a substrate is stacked and a process space in which a process with respect to the substrate is performed, a boat including at least one boat frame that vertically stands up, the boat being elevated to move into the stacking space and the process space, a plurality of susceptors disposed on the boat frame and spaced apart from each other along a longitudinal direction of the boat frame, wherein, as the boat moves into the process space, the substrate is successively loaded on a top surface of each of the plurality of susceptors, and at least holder including a vertical rod disposed parallel to the boat frame and a substrate support tip protruding from an inner surface of the vertical rod to support the substrate, wherein, when the boat moves into the process space, the vertical rod relatively moves along the longitudinal direction of the boat frame.Type: GrantFiled: February 17, 2014Date of Patent: June 14, 2016Assignee: EUGENE TECHNOLOGY CO., LTD.Inventors: Il-Kwang Yang, Byoung-Gyu Song, Kyong-Hun Kim, Yong-Ki Kim, Yang-Sik Shin
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Publication number: 20160013086Abstract: Provided is a substrate processing apparatus. The substrate processing apparatus includes a chamber providing a stacking space in which a substrate is stacked and a process space in which a process with respect to the substrate is performed, a boat including at least one boat frame that vertically stands up, the boat being elevated to move into the stacking space and the process space, a plurality of susceptors disposed on the boat frame and spaced apart from each other along a longitudinal direction of the boat frame, wherein, as the boat moves into the process space, the substrate is successively loaded on a top surface of each of the plurality of susceptors, and at least holder including a vertical rod disposed parallel to the boat frame and a substrate support tip protruding from an inner surface of the vertical rod to support the substrate, wherein, when the boat moves into the process space, the vertical rod relatively moves along the longitudinal direction of the boat frame.Type: ApplicationFiled: February 17, 2014Publication date: January 14, 2016Applicant: EUGENE TECHNOLOGY CO., LTD.Inventors: Il-Kwang YANG, Byoung-Gyu SONG, Kyeong-Hun KIM, Yong-ki KIM, Yang-Sik SHIN