Abstract: A display device includes: a display panel; a heat dissipation sheet on a surface of the display panel; a circuit board electrically connected to the display panel, the circuit board being on a surface of the heat dissipation sheet; and a vapor chamber attached to the surface of the heat dissipation sheet to emit heat transferred through the heat dissipation sheet. The circuit board overlaps with a first area of the heat dissipation sheet. A first part of the vapor chamber is attached to a second area of the heat dissipation sheet, and a second part of the vapor chamber is spaced apart from the heat dissipation sheet.

Abstract: A system for controlling docking of an unmanned vehicle is provided. The system includes terrestrial mobility movable on the ground, an unmanned vehicle that detects the terrestrial mobility, and a server that transmits a docking request signal to the terrestrial mobility and the unmanned vehicle to dock, receives information for a plurality of authentication from the terrestrial mobility and the unmanned vehicle, and controls the unmanned vehicle to dock with the terrestrial mobility based on the information for the plurality of authentication.

Abstract: The present disclosure relates to a vehicle quality problem management system and a data processing method thereof. The system includes a management server including a server communication device that performs wireless communication with a mobile device, and a server processing device connected to the server communication device, and the server processing device receives a voice signal containing a current quality problem from the mobile device, converts the current quality problem in the voice signal to text using speech to text (STT), and registers the current quality problem converted into the text in a database (DB).

Abstract: A system for verifying quality of a part using an arm robot includes an arm robot, which includes a camera to acquire image data of a part assembled in each manufacturing process of a vehicle, a carrier, which includes a sliding rail allowing the arm robot to be movable around the vehicle along the sliding rail to acquire the image data, and a server which receives the image data acquired by the camera, compares the image data with modeling data of the vehicle, which is stored in a database, and determines whether the assembled part satisfies a preset inspection item, to verify quality of the assembled part, verifying the quality of the part in each process before the vehicle is completely manufactured.

Abstract: An embodiment mobility guidance system includes a sensor provided in a mobility and configured to capture a driving video or an image to transmit the driving video or the image, a memory configured to store a danger zone image, a detector configured to compare the driving video or the image captured by the sensor with the danger zone image stored in the memory to detect an existence of a danger zone on a driving path of the mobility, and a guide configured to set a guide zone in response to the detector detecting the existence of the danger zone and a change in a speed or an acceleration of the mobility, and to provide the guide zone to a second mobility.

Abstract: A system for controlling docking of an unmanned vehicle is provided. The system includes terrestrial mobility movable on the ground, an unmanned vehicle that detects the terrestrial mobility, and a server that transmits a docking request signal to the terrestrial mobility and the unmanned vehicle to dock, receives information for a plurality of authentication from the terrestrial mobility and the unmanned vehicle, and controls the unmanned vehicle to dock with the terrestrial mobility based on the information for the plurality of authentication.

Abstract: A data management system and an operation method thereof are disclosed. The system includes: a data collecting unit configured to collect input data obtained by hardware; a database configured to store analysis reference data for analysis of collected input data and analysis result data; and an analysis unit configured to compare input data with analysis reference data to extract abnormal data, and classify the abnormal data so as to store the abnormal data as analysis result data in the database.

Abstract: An embodiment mobility guidance system includes a sensor provided in a mobility and configured to capture a driving video or an image to transmit the driving video or the image, a memory configured to store a danger zone image, a detector configured to compare the driving video or the image captured by the sensor with the danger zone image stored in the memory to detect an existence of a danger zone on a driving path of the mobility, and a guide configured to set a guide zone in response to the detector detecting the existence of the danger zone and a change in a speed or an acceleration of the mobility, and to provide the guide zone to a second mobility.

Abstract: The present disclosure relates to a vehicle quality problem management system and a data processing method thereof. The system includes a management server including a server communication device that performs wireless communication with a mobile device, and a server processing device connected to the server communication device, and the server processing device receives a voice signal containing a current quality problem from the mobile device, converts the current quality problem in the voice signal to text using speech to text (STT), and registers the current quality problem converted into the text in a database (DB).

Abstract: A system for controlling a vehicle includes a terminal that collects at least one of a fault code of at least one controller of the vehicle, operation state data of the vehicle at a time the fault code is generated, and update data of the at least one controller, and a server that receives at least one of the fault code, the operation state data, or the update data of the at least one controller, in which the server labels fault code differently to classify the fault code depending on whether there is an update history of the at least one controller in which the fault code is generated.

Abstract: A system for verifying quality of a part using an arm robot includes an arm robot, which includes a camera to acquire image data of a part assembled in each manufacturing process of a vehicle, a carrier, which includes a sliding rail allowing the arm robot to be movable around the vehicle along the sliding rail to acquire the image data, and a server which receives the image data acquired by the camera, compares the image data with modeling data of the vehicle, which is stored in a database, and determines whether the assembled part satisfies a preset inspection item, to verify quality of the assembled part, verifying the quality of the part in each process before the vehicle is completely manufactured.

Abstract: Reticle and methods for forming a device or reticle are presented. A reticle is provided with a device pattern and a first monitoring pattern. The first monitoring pattern includes a plurality of first test cells having a first test cell area and a first test pattern. The first test cells have different first pitch ratios to an anchor pitch and the first test pattern fills the first test cell area of a first test cell. A wafer with a resist layer is exposed with a lithographic system using the reticle. The resist is developed to form a patterned resist layer on the wafer and the wafer is processed using the patterned resist layer.

Abstract: A lithography metrology method is provided. Focus sensitivity data and dose sensitivity data of sample patterns to be formed on a substrate are acquired. At least one focus pattern selected in descending order of focus sensitivity from among the acquired focus sensitivity data of the sample patterns is determined. At least one low-sensitivity focus pattern in ascending order of the focus sensitivity from among the acquired dose sensitivity data of the sample patterns is selected, and at least one dose pattern selected in descending order of dose sensitivity from among the at least one low-sensitivity focus pattern is determined. A split substrate having a plurality of chip regions is prepared. A plurality of focus split patterns having a shape corresponding to the at least one focus pattern and a plurality of dose split patterns having a shape corresponding to the at least one dose pattern in the plurality of chip regions are formed.

Abstract: A method of detecting focus shift in a lithography process, a method of analyzing an error of a transferred pattern using the same, and a method of manufacturing a semiconductor device using the methods are provided. The focus shift detecting method of a lithography process comprises generating a first contour band of a mask pattern between a first focus and a second focus, generating a second contour of the mask pattern between the first focus and a third focus, and determining whether focus shift of the mask pattern occurs using an intersection of the first contour band and the second contour band.

Abstract: A lithography metrology method is provided. Focus sensitivity data and dose sensitivity data of sample patterns to be formed on a substrate are acquired. At least one focus pattern selected in descending order of focus sensitivity from among the acquired focus sensitivity data of the sample patterns is determined. At least one low-sensitivity focus pattern in ascending order of the focus sensitivity from among the acquired dose sensitivity data of the sample patterns is selected, and at least one dose pattern selected in descending order of dose sensitivity from among the at least one low-sensitivity focus pattern is determined. A split substrate having a plurality of chip regions is prepared. A plurality of focus split patterns having a shape corresponding to the at least one focus pattern and a plurality of dose split patterns having a shape corresponding to the at least one dose pattern in the plurality of chip regions are formed.

Abstract: A method of detecting focus shift in a lithography process, a method of analyzing an error of a transferred pattern using the same, and a method of manufacturing a semiconductor device using the methods are provided. The focus shift detecting method of a lithography process comprises generating a first contour band of a mask pattern between a first focus and a second focus, generating a second contour of the mask pattern between the first focus and a third focus, and determining whether focus shift of the mask pattern occurs using an intersection of the first contour band and the second contour band.

Abstract: An approach is provided for enabling simulation of photomask contour shapes, performing verification on the simulated photomask shapes, and correcting errors in OPC correction or bad fracturing methods to perform photomask proximity correction in real time before physically writing of the photomask. Embodiments include performing optical proximity correction of a photomask of a semiconductor layout to generate a corrected photomask, simulating the corrected photomask to generate one or more simulated contour shapes within a simulated photomask, verifying the simulated contour shapes to determine errors associated with the simulated photomask, and correcting the errors in the simulated contour shapes of the simulated photomask to generate a final photomask.

Abstract: An approach is provided for enabling simulation of photomask contour shapes, performing verification on the simulated photomask shapes, and correcting errors in OPC correction or bad fracturing methods to perform photomask proximity correction in real time before physically writing of the photomask. Embodiments include performing optical proximity correction of a photomask of a semiconductor layout to generate a corrected photomask, simulating the corrected photomask to generate one or more simulated contour shapes within a simulated photomask, verifying the simulated contour shapes to determine errors associated with the simulated photomask, and correcting the errors in the simulated contour shapes of the simulated photomask to generate a final photomask.

Abstract: Reticle and methods for forming a device or reticle are presented. A reticle is provided with a device pattern and a first monitoring pattern. The first monitoring pattern includes a plurality of first test cells having a first test cell area and a first test pattern. The first test cells have different first pitch ratios to an anchor pitch and the first test pattern fills the first test cell area of a first test cell. A wafer with a resist layer is exposed with a lithographic system using the reticle. The resist is developed to form a patterned resist layer on the wafer and the wafer is processed using the patterned resist layer.

Abstract: A method of manufacture of an integrated circuit system includes: forming reticle data; detecting a sub-geometry, a singularity, or a combination thereof in the reticle data; applying a unit cell, a patch cell, or a combination thereof for removing the sub-geometry, the singularity, or the combination thereof from the reticle data; and fabricating an integrated circuit from the reticle data.