Abstract: An actuator for optical image stabilization, includes a fixed frame having an internal space; a moving frame, accommodated in the internal space, configured to linearly and rotatably move on a plane perpendicular to an optical axis; a first ball member disposed between the fixed frame and the moving frame; a first driver, disposed on the moving frame and the fixed frame, configured to provide a driving force to the moving frame; a plurality of magnetic bodies disposed on the fixed frame to generate attractive force with respect to the first driver disposed on the moving frame; a sensor substrate having a portion coupled to the moving frame to be movable, together with the moving frame, and another portion coupled to the fixed frame; and an image sensor disposed on the portion of the sensor substrate.

Abstract: The present design relates to an advantageous and useful sheet which contains rice bran and to a gift-set tray made with the same, wherein the sheet comprises: a substrate layer (10); and a rice-bran-containing layer (20) formed on at least one surface of the substrate layer (10), wherein the rice-bran-containing layer (20) consists of a rice-bran-containing composition comprising a synthetic resin and rice bran as well as an inorganic filler and an additive, such that the use of rice bran and inorganic filler provide a rice-bran foaming effect during extrusion of the sheets for gift-set trays, which makes it possible to reduce the synthetic resin content and prevent depletion of petroleum resources and reduce environmental pollution, while lowering production costs by addition of the rice bran, and provide unique texture and aroma which are not possible with synthetic resins, and the use of the rice bran sheets provides environmentally friendly gift-set trays.

Abstract: A method of forming a contact hole in a semiconductor device, by which a PMD layer as an insulating interlayer is prevented from being overetched by wet cleaning for removing polymer and photoresist after forming a contact hole perforating the PMD layer in a manner of adjusting temperature and concentration of an NC-2 solution for the wet cleaning. The present invention includes the steps of forming a premetal dielectric layer on a semiconductor substrate, forming a contact hole perforating the premetal dielectric layer, and cleaning the substrate using an NC-2 cleaning solution at a temperature equal to or lower than about 55° C.

Abstract: A method of pre-cleaning a wafer for gate oxide formation is described. In the method, a wafer is loaded into a cleaning bath, and a cleaning agent such as diluted HF is supplied into the bath so as to remove contaminants from the back surface of the wafer. Then the cleaning agent is drained from the bath, and the wafer is rinsed with DI water. During this DI rinsing step, contaminants removed from the wafer may remain as impurities and bind to or combine with silicon on the front surface of the wafer. To remove such impurities from the wafer, a second cleaning agent is supplied again into the bath. After removal, the second cleaning agent is drained from the bath, and the wafer is rinsed again with DI water. Finally, and optionally, the wafer may be treated with HCl and ozone.