Abstract: It is an object of the present invention to provide an exhaust gas processing apparatus capable of more effectively scraping off powder which is attached to an inner surface of a combustion chamber, and capable of increasing lifetime of an impact member which generates an impact against a scraping member. The exhaust gas processing apparatus is characterized in that a blade portion or an acute edge portion 7a1 is provided on a lever 7a which is a scraping member at a position opposed to an inner surface of a combustion chamber 1. The scraping member moves in a circumferential direction along the inner surface of the combustion chamber 1 to scrape off powder which is attached to the inner surface of the combustion chamber 1.

Abstract: Exhaust gas containing fluorine gas or halogen fluoride gas emitted from etching or cleaning steps is burned in a combustion chamber having a fluoride passivation film formed on its surface. It is possible to treat exhaust gas emitted from semiconductor fabrication processes which contains fluorine gas or halogen fluoride gas in high concentrations or large volumes, while abatement treatment can be accomplished safely and efficiently with less energy usage.