Patents by Inventor Byoung-taek Kim

Byoung-taek Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230058328
    Abstract: Disclosed are three-dimensional (3D) semiconductor memory devices and electronic system including the same. The 3D semiconductor memory device may include a substrate including first and second regions, a stack structure including interlayer dielectric layers and gate electrodes alternately and repeatedly stacked on the substrate and having a stepwise structure on the second region, a mold structure adjacent to the stack structure on the first region and including interlayer dielectric layers and sacrificial layers alternately and repeatedly stacked on the substrate, a first separation structure crossing the stack structure and extending along a first direction from the first region toward the second region, and a second separation structure crossing the mold structure and extending in the first direction on the first region. A level of a top surface of the first separation structure may be higher than a level of a top surface of the second separation structure.
    Type: Application
    Filed: May 9, 2022
    Publication date: February 23, 2023
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Haemin LEE, Byoung-Taek KIM, Hyeonjoo SONG
  • Publication number: 20220301628
    Abstract: A program method of a nonvolatile memory device that performs a plurality of program loops is provided. At least one of the plurality of program loops includes dividing a channel of a selected cell string into a first side channel and a second side channel during a first interval and a second interval, turning off a string selection transistor of the selected cell string by applying a string select line voltage of a first level during the first interval, and boosting a first voltage of the first side channel and a second voltage of the second side channel, and turning on the string selection transistor by applying the string select line voltage of a second level different from the first level during the second interval, and performing a hot carrier injection (HCI) program operation on a selected memory cell corresponding to the first side channel or the second side channel.
    Type: Application
    Filed: June 7, 2022
    Publication date: September 22, 2022
    Inventors: Won-bo SHIM, Ji-ho CHO, Yong-seok KIM, Byoung-taek KIM, Sun-gyung HWANG
  • Patent number: 11355195
    Abstract: A program method of a nonvolatile memory device that performs a plurality of program loops is provided. At least one of the plurality of program loops includes dividing a channel of a selected cell string into a first side channel and a second side channel during a first interval and a second interval, turning off a string selection transistor of the selected cell string by applying a string select line voltage of a first level during the first interval, and boosting a first voltage of the first side channel and a second voltage of the second side channel, and turning on the string selection transistor by applying the string select line voltage of a second level different from the first level during the second interval, and performing a hot carrier injection (HCI) program operation on a selected memory cell corresponding to the first side channel or the second side channel.
    Type: Grant
    Filed: April 1, 2021
    Date of Patent: June 7, 2022
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Won-bo Shim, Ji-ho Cho, Yong-seok Kim, Byoung-taek Kim, Sun-gyung Hwang
  • Publication number: 20210217477
    Abstract: A program method of a nonvolatile memory device that performs a plurality of program loops is provided. At least one of the plurality of program loops includes dividing a channel of a selected cell string into a first side channel and a second side channel during a first interval and a second interval, turning off a string selection transistor of the selected cell string by applying a string select line voltage of a first level during the first interval, and boosting a first voltage of the first side channel and a second voltage of the second side channel, and turning on the string selection transistor by applying the string select line voltage of a second level different from the first level during the second interval, and performing a hot carrier injection (HCI) program operation on a selected memory cell corresponding to the first side channel or the second side channel.
    Type: Application
    Filed: April 1, 2021
    Publication date: July 15, 2021
    Inventors: Won-bo SHIM, Ji-ho CHO, Yong-seok KIM, Byoung-taek KIM, Sun-gyung HWANG
  • Patent number: 10978480
    Abstract: A three-dimensional semiconductor memory device includes an electrode structure including gate electrodes and insulating layers, which are alternately stacked on a substrate, a semiconductor pattern extending in a first direction substantially perpendicular to a top surface of the substrate and penetrating the electrode structure, a tunnel insulating layer disposed between the semiconductor pattern and the electrode structure, a blocking insulating layer disposed between the tunnel insulating layer and the electrode structure, and a charge storing layer disposed between the blocking insulating layer and the tunnel insulating layer. The charge storing layer includes a plurality of first charge trap layers having a first energy band gap, and a second charge trap layer having a second energy band gap larger than the first energy band gap. The first charge trap layers are embedded in the second charge trap layer between the gate electrodes and the semiconductor pattern.
    Type: Grant
    Filed: April 23, 2020
    Date of Patent: April 13, 2021
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Kyunghwan Lee, Yongseok Kim, Byoung-Taek Kim, Tae Hun Kim, Dongkyun Seo, Junhee Lim
  • Patent number: 10971232
    Abstract: A program method of a nonvolatile memory device that performs a plurality of program loops is provided. At least one of the plurality of program loops includes dividing a channel of a selected cell string into a first side channel and a second side channel during a first interval and a second interval, turning off a string selection transistor of the selected cell string by applying a string select line voltage of a first level during the first interval, and boosting a first voltage of the first side channel and a second voltage of the second side channel, and turning on the string selection transistor by applying the string select line voltage of a second level different from the first level during the second interval, and performing a hot carrier injection (HCI) program operation on a selected memory cell corresponding to the first side channel or the second side channel.
    Type: Grant
    Filed: August 28, 2019
    Date of Patent: April 6, 2021
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Won-bo Shim, Ji-ho Cho, Yong-seok Kim, Byoung-taek Kim, Sun-gyung Hwang
  • Publication number: 20200258905
    Abstract: A three-dimensional semiconductor memory device includes an electrode structure including gate electrodes and insulating layers, which are alternately stacked on a substrate, a semiconductor pattern extending in a first direction substantially perpendicular to a top surface of the substrate and penetrating the electrode structure, a tunnel insulating layer disposed between the semiconductor pattern and the electrode structure, a blocking insulating layer disposed between the tunnel insulating layer and the electrode structure, and a charge storing layer disposed between the blocking insulating layer and the tunnel insulating layer. The charge storing layer includes a plurality of first charge trap layers having a first energy band gap, and a second charge trap layer having a second energy band gap larger than the first energy band gap. The first charge trap layers are embedded in the second charge trap layer between the gate electrodes and the semiconductor pattern.
    Type: Application
    Filed: April 23, 2020
    Publication date: August 13, 2020
    Inventors: KYUNGHWAN LEE, YONGSEOK KIM, BYOUNG-TAEK KIM, TAE HUN KIM, DONGKYUN SEO, JUNHEE LIM
  • Patent number: 10651195
    Abstract: A three-dimensional semiconductor memory device includes an electrode structure including gate electrodes and insulating layers, which are alternately stacked on a substrate, a semiconductor pattern extending in a first direction substantially perpendicular to a top surface of the substrate and penetrating the electrode structure, a tunnel insulating layer disposed between the semiconductor pattern and the electrode structure, a blocking insulating layer disposed between the tunnel insulating layer and the electrode structure, and a charge storing layer disposed between the blocking insulating layer and the tunnel insulating layer. The charge storing layer includes a plurality of first charge trap layers having a first energy band gap, and a second charge trap layer having a second energy band gap larger than the first energy band gap. The first charge trap layers are embedded in the second charge trap layer between the gate electrodes and the semiconductor pattern.
    Type: Grant
    Filed: October 23, 2018
    Date of Patent: May 12, 2020
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Kyunghwan Lee, Yongseok Kim, Byoung-Taek Kim, Tae Hun Kim, Dongkyun Seo, Junhee Lim
  • Patent number: 10636808
    Abstract: A vertical memory device and method of manufacture thereof are provided. The vertical memory device includes gate electrode layers stacked on a substrate; a channel layer penetrating through the gate electrode layers; and a first epitaxial layer in contact with a lower portion of the channel layer and including a region having a diameter smaller than an external diameter of the channel layer.
    Type: Grant
    Filed: March 30, 2018
    Date of Patent: April 28, 2020
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Kyung Hwan Lee, Yong Seok Kim, Tae Hun Kim, Byoung Taek Kim, Jun Hee Lim
  • Publication number: 20190392902
    Abstract: A program method of a nonvolatile memory device that performs a plurality of program loops is provided. At least one of the plurality of program loops includes dividing a channel of a selected cell string into a first side channel and a second side channel during a first interval and a second interval, turning off a string selection transistor of the selected cell string by applying a string select line voltage of a first level during the first interval, and boosting a first voltage of the first side channel and a second voltage of the second side channel, and turning on the string selection transistor by applying the string select line voltage of a second level different from the first level during the second interval, and performing a hot carrier injection (HCI) program operation on a selected memory cell corresponding to the first side channel or the second side channel.
    Type: Application
    Filed: August 28, 2019
    Publication date: December 26, 2019
    Inventors: Won-bo SHIM, Ji-ho CHO, Yong-seok KIM, Byoung-taek KIM, Sun-gyung HWANG
  • Patent number: 10424381
    Abstract: A program method of a nonvolatile memory device that performs a plurality of program loops is provided. At least one of the plurality of program loops includes dividing a channel of a selected cell string into a first side channel and a second side channel during a first interval and a second interval, turning off a string selection transistor of the selected cell string by applying a string select line voltage of a first level during the first interval, and boosting a first voltage of the first side channel and a second voltage of the second side channel, and turning on the string selection transistor by applying the string select line voltage of a second level different from the first level during the second interval, and performing a hot carrier injection (HCI) program operation on a selected memory cell corresponding to the first side channel or the second side channel.
    Type: Grant
    Filed: January 14, 2018
    Date of Patent: September 24, 2019
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Won-bo Shim, Ji-ho Cho, Yong-seok Kim, Byoung-taek Kim, Sun-gyung Hwang
  • Patent number: 10304541
    Abstract: A memory device includes a memory cell array including a first switch cell, a second switch cell, and a plurality of memory cells disposed between the first the second switch cells and connected to a plurality of word lines, and a control circuit configured to perform a program operation by providing a program voltage to a first word line among the plurality of word lines, a switch voltage to a second word line among the plurality of word lines, and a pass voltage to remaining word lines among the plurality of word lines, wherein the control circuit is configured to turn off the first switch cell and the second switch cell in a first section of the program operation, and configured to turn on the first switch cell and increase the switch voltage in a second section of the program operation later than the first section.
    Type: Grant
    Filed: January 26, 2018
    Date of Patent: May 28, 2019
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Sun Gyung Hwang, Byoung Taek Kim, Yong Seok Kim, Ju Seok Lee
  • Publication number: 20190139983
    Abstract: A three-dimensional semiconductor memory device includes an electrode structure including gate electrodes and insulating layers, which are alternately stacked on a substrate, a semiconductor pattern extending in a first direction substantially perpendicular to a top surface of the substrate and penetrating the electrode structure, a tunnel insulating layer disposed between the semiconductor pattern and the electrode structure, a blocking insulating layer disposed between the tunnel insulating layer and the electrode structure, and a charge storing layer disposed between the blocking insulating layer and the tunnel insulating layer. The charge storing layer includes a plurality of first charge trap layers having a first energy band gap, and a second charge trap layer having a second energy band gap larger than the first energy band gap. The first charge trap layers are embedded in the second charge trap layer between the gate electrodes and the semiconductor pattern.
    Type: Application
    Filed: October 23, 2018
    Publication date: May 9, 2019
    Inventors: KYUNGHWAN LEE, YONGSEOK KIM, BYOUNG-TAEK KIM, TAE HUN KIM, DONGKYUN SEO, JUNHEE LIM
  • Publication number: 20190019809
    Abstract: A vertical memory device and method of manufacture thereof are provided. The vertical memory device includes gate electrode layers stacked on a substrate; a channel layer penetrating through the gate electrode layers; and a first epitaxial layer in contact with a lower portion of the channel layer and including a region having a diameter smaller than an external diameter of the channel layer.
    Type: Application
    Filed: March 30, 2018
    Publication date: January 17, 2019
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Kyung Hwan LEE, Yong Seok KIM, Tae Hun KIM, Byoung Taek KIM, Jun Hee LIM
  • Publication number: 20180374540
    Abstract: A memory device includes a memory cell array including a first switch cell, a second switch cell, and a plurality of memory cells disposed between the first the second switch cells and connected to a plurality of word lines, and a control circuit configured to perform a program operation by providing a program voltage to a first word line among the plurality of word lines, a switch voltage to a second word line among the plurality of word lines, and a pass voltage to remaining word lines among the plurality of word lines, wherein the control circuit is configured to turn off the first switch cell and the second switch cell in a first section of the program operation, and configured to turn on the first switch cell and increase the switch voltage in a second section of the program operation later than the first section.
    Type: Application
    Filed: January 26, 2018
    Publication date: December 27, 2018
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Sun Gyung HWANG, Byoung Taek KIM, Yong Seok KIM, Ju Seok LEE
  • Publication number: 20180294270
    Abstract: A vertical stack memory device includes a doped semiconductor substrate having a common source to which a source power is applied and a low band gap layer that is spaced apart from the common source, and the low band gap comprising low band gap materials. A stack gate structure has gate electrodes and insulation interlayer patterns that are alternately and vertically stacked on the substrate in a first direction. A channel structure penetrates through the stack gate structure in the first direction. The channel structure makes contact with the low hand gap layer. A charge storage structure is interposed between the stack gate structure and the channel structure. The charge storage structure is configured to selectively store charge and to provide the stored charge to a memory cell, the stack gate structure, and the channel structure.
    Type: Application
    Filed: November 16, 2017
    Publication date: October 11, 2018
    Inventors: KYUNG-HWAN LEE, MIN-KYUNG BAE, BYOUNG-TAEK KIM, HYE-JIN CHO, YONG-SEOK KIM, TAE-HUN KIM, JUN-HEE LIM
  • Publication number: 20180268907
    Abstract: A program method of a nonvolatile memory device that performs a plurality of program loops is provided. At least one of the plurality of program loops includes dividing a channel of a selected cell string into a first side channel and a second side channel during a first interval and a second interval, turning off a string selection transistor of the selected cell string by applying a string select line voltage of a first level during the first interval, and boosting a first voltage of the first side channel and a second voltage of the second side channel, and turning on the string selection transistor by applying the string select line voltage of a second level different from the first level during the second interval, and performing a hot carrier injection (HCI) program operation on a selected memory cell corresponding to the first side channel or the second side channel.
    Type: Application
    Filed: January 14, 2018
    Publication date: September 20, 2018
    Inventors: Won-bo SHIM, Ji-ho CHO, Yong-seok KIM, Byoung-taek KIM, Sun-gyung HWANG
  • Patent number: 7356877
    Abstract: A caster includes a fixing portion installed on a bottom surface of an object, a wheel portion which is installed to be elevated into a flange portion and has a moving wheel provided on a bottom surface of the wheel portion, and an elevating portion to control the wheel portion to elevate into the flange portion. The wheel portion descends from the fixing portion to move the object and elevates into the fixing portion to fixedly dispose the object in a position. Therefore, a height of the caster is controlled to be high when the heavy object is being moved, and controlled to be low when fixing the object in a position, thus improving the appearance of the object.
    Type: Grant
    Filed: June 22, 2004
    Date of Patent: April 15, 2008
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Byoung-taek Kim, Sang-hak Kim
  • Publication number: 20050000056
    Abstract: A caster includes a fixing portion installed on a bottom surface of an object, a wheel portion which is installed to be elevated into a flange portion and has a moving wheel provided on a bottom surface of the wheel portion, and an elevating portion to control the wheel portion to elevate into the flange portion. The wheel portion descends from the fixing portion to move the object and elevates into the fixing portion to fixedly dispose the object in a position. Therefore, a height of the caster is controlled to be high when the heavy object is being moved, and controlled to be low when fixing the object in a position, thus improving the appearance of the object.
    Type: Application
    Filed: June 22, 2004
    Publication date: January 6, 2005
    Inventors: Byoung-taek Kim, Sang-hak Kim
  • Publication number: 20020149509
    Abstract: An integrated remote controller/wireless mouse includes first and second buttons installed on the upper surface of a body for operating first and second apparatuses, respectively, a signal generator for generating optical signals for controlling functions of the apparatuses in accordance with the operation of the buttons, and a track ball, protruding from the bottom surface of the body, to allow free rolling movement for operating the second apparatus.
    Type: Application
    Filed: November 6, 1998
    Publication date: October 17, 2002
    Inventors: BYOUNG-TAEK KIM, CHUNG-SIK BANG