Patents by Inventor Byoungcheol HWANG

Byoungcheol HWANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230037038
    Abstract: A deposition apparatus, includes a chamber having at least one first gas inlet therein. A fixed chuck is installed in the chamber and an electrostatic chuck is installed on the fixed chuck. An edge ring is disposed on an edge of the electrostatic chuck. A shower head is disposed above the edge ring. A baffle is disposed above the shower head and an upper electrode is disposed above the baffle. A gas guide member is disposed above the upper electrode so that a flow path provided in the upper electrode and the first gas inlet are connected. The gas guide member has a flow path hole penetrating in upward and downward directions, and a plurality of guide holes are provided on an inner surface of the gas guide member.
    Type: Application
    Filed: March 23, 2022
    Publication date: February 2, 2023
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Byoungcheol HWANG, Sangwook LEE, Sunghyup KIM, Keonwoo KIM, Junyoung CHOI, Sanghoon CHEONG