Patents by Inventor Byron L. Stafford

Byron L. Stafford has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • High rate chemical vapor deposition of carbon films using fluorinated gases
    Patent number: 5198263
    Abstract: A high rate, low-temperature deposition of amorphous carbon films is produced by PE-CVD in the presence of a fluorinated or other halide gas. The deposition can be performed at less than 100.degree. C., including ambient room temperature, with a radio frequency plasma assisted chemical vapor deposition process. With less than 6.5 atomic percent fluorine incorporated into the amorphous carbon film, the characteristics of the carbon film, including index of refraction, mass density, optical clarity, and chemical resistance are within fifteen percent (15%) of those characteristics for pure amorphous carbon films, but the deposition rates are high.
    Type: Grant
    Filed: March 15, 1991
    Date of Patent: March 30, 1993
    Assignee: The United States of America as represented by the United States Department of Energy
    Inventors: Byron L. Stafford, C. Edwin Tracy, David K. Benson, Arthur J. Nelson