Patents by Inventor Byung Gwan LIM

Byung Gwan LIM has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • CHAMBER CLEANING DEVICE AND CHAMBER CLEANING METHOD
    Publication number: 20220356569
    Abstract: The present disclosure relates to an apparatus and method for cleaning a chamber, and more particularly, to an apparatus and method for cleaning a chamber, which are capable of cleaning the chamber which is contaminated while depositing a thin film on a substrate. The chamber cleaning method in accordance with an exemplary embodiment is a method for cleaning a chamber configured to deposit a zinc oxide, the method comprising: supplying a chlorine (Cl)-containing gas and a hydrogen (H)-containing gas into a chamber; activating and reacting the separately supplied gases with each other inside the chamber to generate a reaction gas; and firstly cleaning the chamber with the reaction gas.
    Type: Application
    Filed: July 21, 2022
    Publication date: November 10, 2022
    Inventors: Dong Hwan LEE, Jae Ho KIM, Hyun Il KIM, Ho Jin YUN, Jae Wan LEE, Byung Gwan LIM
  • Chamber cleaning device and chamber cleaning method
    Patent number: 11427906
    Abstract: The present disclosure relates to an apparatus and method for cleaning a chamber, and more particularly, to an apparatus and method for cleaning a chamber, which are capable of cleaning the chamber which is contaminated while depositing a thin film on a substrate. The chamber cleaning method in accordance with an exemplary embodiment is a method for cleaning a chamber configured to deposit a zinc oxide, the method comprising: supplying a chlorine (Cl)-containing gas and a hydrogen (H)-containing gas into a chamber; activating and reacting the separately supplied gases with each other inside the chamber to generate a reaction gas; and firstly cleaning the chamber with the reaction gas.
    Type: Grant
    Filed: February 7, 2019
    Date of Patent: August 30, 2022
    Inventors: Dong Hwan Lee, Jae Ho Kim, Hyun Il Kim, Ho Jin Yun, Jae Wan Lee, Byung Gwan Lim
  • CHAMBER CLEANING DEVICE AND CHAMBER CLEANING METHOD
    Publication number: 20210040610
    Abstract: The present disclosure relates to an apparatus and method for cleaning a chamber, and more particularly, to an apparatus and method for cleaning a chamber, which are capable of cleaning the chamber which is contaminated while depositing a thin film on a substrate. The chamber cleaning method in accordance with an exemplary embodiment is a method for cleaning a chamber configured to deposit a zinc oxide, the method comprising: supplying a chlorine (Cl)-containing gas and a hydrogen (H)-containing gas into a chamber; activating and reacting the separately supplied gases with each other inside the chamber to generate a reaction gas; and firstly cleaning the chamber with the reaction gas.
    Type: Application
    Filed: February 7, 2019
    Publication date: February 11, 2021
    Inventors: Dong Hwan LEE, Jae Ho KIM, Hyun Il KIM, Ho Jin YUN, Jae Wan LEE, Byung Gwan LIM