Patents by Inventor Byung-Gwon Lee

Byung-Gwon Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6706771
    Abstract: The present invention relates to polymer membranes for separating olefins from paraffins which have the similar molecular size and close boiling point. More particularly, it relates to a silver salt-containing facilitated transport membrane for olefin separation, and also a method for producing the same. An object of the present invention is to provide a silver salt-containing facilitated transport membrane for olefin separation having improved stability, and also a method for preparing the same, which exhibits no deterioration in membrane performance even when operated for an extended period of time. The facilitated transport membrane for olefin/paraffin separation of the present invention comprises a polymer, a silver salt, and a phthalate compound represented by the following formula (1) wherein R denotes an alkyl group of 2 to 8 carbon atoms or a phenyl group.
    Type: Grant
    Filed: July 15, 2002
    Date of Patent: March 16, 2004
    Assignee: Korea Institute of Science and Technology
    Inventors: Hoon Sik Kim, Yong Soo Kang, Byung Gwon Lee, Hyun Joo Lee, Jae Hee Ryu
  • Patent number: 6692653
    Abstract: The present invention relates to a refrigerant composition of four-constituent system, comprising: (a) a first constituent of difluoromethane, (b) a second constituent of 1,1,1,2,3,3,3-heptafluoropropane, (c) a third constituent selected from the group consisting of 1,1,1,2-tetrafluoroethane and 1,1-difluoroethane and (d) a for the constituent selected from the group consisting of isobutane, 1,1,1,2,3,3,-hexafluoropropane and butane, useful as a substitute for chlorodifluoromethane (HCFC-22).
    Type: Grant
    Filed: February 13, 2002
    Date of Patent: February 17, 2004
    Assignee: Korea Institute of Science and Technology
    Inventors: Byung-Gwon Lee, Jong-Sung Lim, Hong-Gon Kim, Chang-Nyeon Kim
  • Publication number: 20040016902
    Abstract: A refrigerant composition that can be a substitute for chlorodifluoromethane (HCFC-22) comprises: (a) a first constituent of difluoromethane, (b) a second constituent of 1,1,1-trifluoroethane, (c) a third constituent of 1,1,1,2,3,3,3-heptafluoropropane and (d) a fourth constituent selected from the group consisting of isobutane, 1,1,1,2,3,3-hexafluropropane and butane; or comprises: (a) a first constituent of difluoromethane, (b) a second constituent of 1,1,1,2-tetrafluoroethane, (c) a third constituent of 1,1,-difluoroethane, and (d) a fourth constituent selected from the group consisting of 1,1,1,2,3,3,3-heptafluoropropane, 1,1,1,2,3,3-hexafluropropane and butane.
    Type: Application
    Filed: July 24, 2002
    Publication date: January 29, 2004
    Applicant: Korea Institute of Science and Technology
    Inventors: Byung-Gwon Lee, Jong-Sung Lim, Hoon Sik Kim, Chang-Nyeon Kim
  • Publication number: 20040016903
    Abstract: A refrigerant composition that can be a substitute for chlorodifluoromethane (HCFC-22) comprises: (a) a first constituent of difluoromethane, (b) a second constituent of 1,1,1-trifluoroethane, (c) a third constituent of 1,1-difluoroethane, and (d) a fourth constituent selected from the group consisting of 1,1,1,2,3,3,3-heptafluoropropane, isobutane, 1,1,1,2,3,3-hexafluropropane and butane.
    Type: Application
    Filed: July 24, 2002
    Publication date: January 29, 2004
    Applicant: Korea Institute of Science and Technology
    Inventors: Byung-Gwon Lee, Jong-Sung Lim, Sang Deuk Lee, Chang-Nyeon Kim
  • Publication number: 20030197149
    Abstract: A refrigerant composition that can be a substitute for chlorodifluoromethane (HCFC-22) comprises: (a) a first constituent of difluoromethane, (b) a second constituent of 1,1,1-trifluoroethane, (c) a third constituent of 1,1,1,2-tetrafluoroethane, and (d) a fourth constituent selected from the group consisting of 1,1-difluoroethane, 1,1,1,2,3,3,3-heptafluoropropane, 1,1,1,2,3,3-hexafluropropane and butane.
    Type: Application
    Filed: April 19, 2002
    Publication date: October 23, 2003
    Inventors: Byung-Gwon Lee, Jong-Sung Lim, Byoung Sung Ahn, Kun You Park, Chang-Nyeon Kim
  • Patent number: 6592773
    Abstract: A novel refrigerant composition useful as a substitute for HCFC-22, comprising a first constituent of difluoromethane (CH2F2, HFC-32); a second constituent of pentafluoroethane (CHF2CF3, HFC-125); a third constituent of 1,1,1-trifluoroethane (CH3CF3, HFC-143a); a fourth constituent selected from the group consisting of cyclopropane (C3H6, RC-270), 1,1,1,2,3,3,3-heptafluoropropane (CF3CHFCF3, HFC-227ea), 1,1,1,2,2-pentafluoropropane (CH3CF2CF3, HFC-245cb), isobutane (CH(CH3)2CH3, R-600a), octafluorocyclobutane (C4F8, RC-318), 1,1,1,2,3,3-hexafluoropropane (CHF2CHFCF3, HFC-236ea), butane (C4H10, R-600), bis(difluoromethyl)ether (CHF2OCHF2, HFE-134) and pentafluoroethylmethylether (CF3CF2OCH3, HFE-245).
    Type: Grant
    Filed: January 8, 2003
    Date of Patent: July 15, 2003
    Assignee: Korea Institute of Science and Technology
    Inventors: Byung Gwon Lee, Jong Sung Lim, Kun You Park, Moon Jo Chung, Seong Joon Cho
  • Publication number: 20030111635
    Abstract: A novel refrigerant composition useful as a substitute for HCFC-22, comprising a first constituent of difluoromethane (CH2F2, HFC-32); a second constituent of pentafluoroethane (CHF2CF3, HFC-125); a third constituent of 1,1,1-trifluoroethane (CH3CF3, HFC-143a); a fourth constituent selected from the group consisting of cyclopropane (C3H6, RC-270), 1,1,1,2,3,3,3-heptafluoropropane (CF3CHFCF3, HFC-227ea), 1,1,1,2,2-pentafluoropropane (CH3CF2CF3, HFC-245cb), isobutane (CH(CH3)2CH3, R-600a), octafluorocyclobutane (C4F8, RC-318), 1,1,1,2,3,3-hexafluoropropane (CHF2CHFCF3, HFC-236ea), butane (C4H10, R-600), bis(difluoromethyl)ether (CHF2OCHF2, HFE-134) and pentafluoroethylmethylether (CF3CF2OCH3, HFE-245).
    Type: Application
    Filed: January 8, 2003
    Publication date: June 19, 2003
    Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
    Inventors: Byung Gwon Lee, Jong Sung Lim, Kun You Park, Moon Jo Chung, Seong Joon Cho
  • Publication number: 20030052056
    Abstract: The present invention relates to polymer membranes for separating olefins from paraffins which have the similar molecular size and close boiling point. More particularly, it relates to a silver salt-containing facilitated transport membrane for olefin separation, and also a method for producing the same. An object of the present invention is to provide a silver salt-containing facilitated transport membrane for olefin separation having improved stability, and also a method for preparing the same, which exhibits no deterioration in membrane performance even when operated for an extended period of time.
    Type: Application
    Filed: July 15, 2002
    Publication date: March 20, 2003
    Applicant: KOREA INSTITUE OF SCIENCE AND TECHNOLOGY
    Inventors: Hoon Sik Kim, Yong Soo Kang, Byung Gwon Lee, Hyun Joo Lee, Jae Hee Ryu
  • Patent number: 6524495
    Abstract: A novel refrigerant composition useful as a substitute for HCFC-22, comprising a first constituent of difluoromethane (CH2F2, HFC-32); a second constituent of pentafluoroethane (CHF2CF3, HFC-125); a third constituent of 1,1,1-trifluoroethane (CH3CF3, HFC-143a); a fourth constituent selected from the group consisting of cyclopropane (C3H6, RC-270), 1,1,1,2,3,3,3-heptafluoropropane (CF3CHFCF3, HFC-227ea), 1,1,1,2,2-pentafluoropropane (CH3CF2CF3, HFC-245cb), isobutane (CH(CH3)2CH3, R-600a), octafluorocyclobutane (C4F8, RC-318), 1,1,1,2,3,3-hexafluoropropane (CHF2CHFCF3, HFC-236ea), butane (C4H10, R-600), bis(difluoromethyl)ether (CHF2OCHF2, HFE-134) and pentafluoroethylmethylether (CF3CF2OCH3, HFE-245).
    Type: Grant
    Filed: November 9, 2000
    Date of Patent: February 25, 2003
    Assignee: Korea Institute of Science and Technology
    Inventors: Byung Gwon Lee, Jong Sung Lim, Kun You Park, Moon Jo Chung, Seong Joon Cho
  • Patent number: 6508950
    Abstract: The present invention relates to novel refrigerant mixtures as a substitute for chlorodifluoromethane (CHClF2, HCFC-22). More specifically, the invention is directed to refrigerant mixtures that comprise: difluoromethane (CH2F2, HFC-32) as the first component; pentafluoroethane (CHF2CF3, HFC-125) as the second component; 1,1,1,2-tetrafluoroethane (CH2FCF3, HFC-134a) as the third component; any one of cyclopropane (C3H6, RC-270), 1,1-difluoroethane (CH3CHF2, HFC-152a), 1,1,1,2,3,3,3-heptafluoropropane (CF3CHFCF3, HFC-227ea), 1,1,1,2,2-pentafluoropropane (CH3CF2CF3, HFC-245cb), octafluorocyclobutane (C4F8, RC-318), 1,1,1,2,3,3-hexafluoropropane (CHF2CHFCF3, HFC-236ea), bis(difluoromethyl)ether (CHF2OCHF2, HFE-134), pentafluoroethylmethylether (CF3CF2OCH3, HFE-245), n-pentane (C5H12, R-601) and isopentane ((CH3)2CHCH2CH3, R-601a) as the fourth component.
    Type: Grant
    Filed: October 20, 2000
    Date of Patent: January 21, 2003
    Assignee: Korea Institute of Science and Technology
    Inventors: Jong-Sung Lim, Byung-Gwon Lee, Jae-Duck Kim, Sang-Deuk Lee, Hoon-Sik Kim
  • Publication number: 20030001132
    Abstract: The present invention relates to a refrigerant composition of four-constituent system, comprising: (a) a first constituent of difluoromethane, (b) a second constituent of 1,1,1,2,3,3,3-heptafluoropropane, (c) a third constituent selected from the group consisting of 1,1,1,2-tetrafluoroethane and 1,1-difluoroethane and (d) a for the constituent selected from the group consisting of isobutane, 1,1,1,2,3,3,-hexafluoropropane and butane, useful as a substitute for chlorodifluoromethane (HCFC-22).
    Type: Application
    Filed: February 13, 2002
    Publication date: January 2, 2003
    Applicant: Korea Institute of Science and Technology
    Inventors: Byung-Gwon Lee, Jong-Sung Lim, Hong-Gon Kim, Chang-Nyeon Kim
  • Patent number: 6407264
    Abstract: The present invention relates to a method to prepare alkylene carbonate of the formula (1) wherein, R1 and R2 are each independently H; C1-C4 alkyl or phenyl group; which method characterized by reacting alkylene oxide with carbon dioxide in the presence of a catalyst system comprising a) metal halide [MXm] and b) pyridine or pyridine derivative [Py], wherein Py is selected from a group of pyridines; M is a metal atom selected from the group consisting of Zn, Fe, Mn, Pb and In; X is a halogen selected from the group consisting of Cl, Br and I; and m is 2 or 3.
    Type: Grant
    Filed: February 9, 2001
    Date of Patent: June 18, 2002
    Assignee: Korea Institute of Science and Technology
    Inventors: Hoon Sik Kim, Jai Jun Kim, Byung Gwon Lee, Hong Gon Kim
  • Patent number: 6399536
    Abstract: A catalyst of the formula (1) for the synthesis of alkylene carbonate by reacting alkylene oxide and carbon dioxide LmMXn  (1) wherein L is selected from a group of pyridines; M is a metal atom selected from Zn, Fe, Mn, Pb and In; X is a halogen atom selected from Cl, Br and I; m is 1 or 2, and n is 2 or 3.
    Type: Grant
    Filed: February 9, 2001
    Date of Patent: June 4, 2002
    Assignee: Korea Institute of Science and Technology
    Inventors: Hoon Sik Kim, Byung Gwon Lee, Sang Deuk Lee, Young Soo Kwon, Hyun Joo Lee
  • Publication number: 20020013477
    Abstract: The present invention relates to a method to prepare alkylene carbonate of the formula (1) 1
    Type: Application
    Filed: February 9, 2001
    Publication date: January 31, 2002
    Applicant: Korea Institute of Science and Technology
    Inventors: Hoon Sik Kim, Jai Jun Kim, Byung Gwon Lee, Hong Gon Kim
  • Publication number: 20010019993
    Abstract: A catalyst of the formula (1) for the synthesis of alkylene carbonate by reacting alkylene oxide and carbon dioxide
    Type: Application
    Filed: February 9, 2001
    Publication date: September 6, 2001
    Applicant: Korean Institute of Science and Technology
    Inventors: Hoon Sik Kim, Byung Gwon Lee, Sang Deuk Lee
  • Patent number: 6231780
    Abstract: A refrigerant composition useful as a substitute for chlorodifluoromethane (CHCIF2, HCFC-22). The refrigerant mixture has a first constituent of difluoromethane (CH2F2, HFC-32); a second constituent selected from perfluoropropane (C3F8, PFC-218), cyclopropane (C3H6, RC-270) and butane (C4H10, R-600); and a third constituent selected from 1,1-difluoroethane (CH3CHF2, HFC-152a), 1,1,1,2,2-pentafluoropropane (CH3CF2CF3, HFC-245cb) and bis(difluoromethyl)ether (CHF2OCHF2, HFE-134).
    Type: Grant
    Filed: October 1, 1999
    Date of Patent: May 15, 2001
    Assignee: Korea Institute of Science and Technology
    Inventors: Byung Gwon Lee, Jong Sung Lim, Kun You Park, Byoung Sung Ahn, Sang Deuk Lee
  • Patent number: 6231781
    Abstract: A refrigerant composition useful as a substitute for chlorodifluoromethane (CHClF2, HCFC-22). The refrigerant composition has a first constituent of difluoromethane (CH2F2, HFC-32); a second constituent of 1,1,1-trifluoroethane (CH3CF3; namely, HFC-143a); and a third constituent selected from cyclopropane (C3H6, RC-270), 1,1,1,2,3,3,3-heptafluoropropane (CF3CHFCF3, HFC-227ea), 1,1,1,2,2-pentafluoropropane (CH3CF2CF3, HFC-245cb), 1,1,1,2,3,3-hexafluoropropane (CHF2CHFCF3, HFC-236ea), butane (C4H10, R-600), bis(difluoromethyl)ether (CHF2OCHF2, HFE-134) and pentafluoroethylmethylether (CF3CF2OCH3, HFE-245).
    Type: Grant
    Filed: October 1, 1999
    Date of Patent: May 15, 2001
    Assignee: Korea Institute of Science and Technology
    Inventors: Byung Gwon Lee, Jong Sung Lim, Young Soo Kwon, Honggon Kim, Dong Joo Mun
  • Patent number: 6160130
    Abstract: The present invention relates to a method for preparing alkylene carbonate by reacting alkylene oxide with carbon dioxide in the presence of a catalyst comprising:a) at least one alkali metal halide selected from the group consisting of MCl, MBr and MI, whrerin M is alkali metal; andb) at least one manganese halide selected from the group consisting of MnCl.sub.2, MnBr.sub.2 and MnI.sub.2.
    Type: Grant
    Filed: January 5, 2000
    Date of Patent: December 12, 2000
    Assignee: Korea Institute of Science and Technology
    Inventors: Hoon Sik Kim, Jai Jun Kim, Byung Gwon Lee, Young Soo Kwon
  • Patent number: 6075167
    Abstract: This invention relates to a method for preparing cycloaliphatic diamines by hydrogenating aromatic diamines in the presence of a supported ruthenium catalyst and a metal nitrite as a catalyst promoter to increase the rate of the hydrogenation reaction and decrease the amount of higher boiler by-products.
    Type: Grant
    Filed: September 25, 1998
    Date of Patent: June 13, 2000
    Assignee: Korea Institute of Science and Technology
    Inventors: Hoon Sik Kim, Kun Yu Park, Young Soo Kwon, Moon Jo Chung, Byung Gwon Lee
  • Patent number: 5723700
    Abstract: There is a method for concurrently producing 1,1,1,2-tetrafluoroethane and pentafluoroethane, which comprises (A) reacting 1,1,1-trifluoro-2-chloroethane, hydrogen fluoride and chlorine in a first reactor in the presence of flurorination catalyst at a temperature in the range of from 300.degree. C. to 450.degree. C.; (B) transfering the products of step (A) together with trichloroethylene to a second reactor and reacting them at a temperature in the range of from 200.degree. C. to 400.degree. C.; (C) separating 1,1,1,2-tetrafluoroethane and pentafluoroethane from the resultant products; and (D) feeding the remaining products from step (C) back to the first reactor, wherein the molar ratio of chlorine/1,1,1-trifluoro-2-chloroethanethe in step (A) is in the range of from 0.001 to 0.
    Type: Grant
    Filed: September 5, 1996
    Date of Patent: March 3, 1998
    Assignee: Korea Institute of Science and Technology
    Inventors: Byung Gwon Lee, Hoon Sik Kim, Honggon Kim, Sang Deuk Lee, Moon Jo Chung