Abstract: Plasma processing equipment includes a chuck stage for supporting a wafer and including a lower electrode, an upper electrode disposed on the chuck stage, an AC power supply which applies first to third signals having different magnitudes of frequencies to the upper electrode or the lower electrode, a dielectric ring which surrounds the chuck stage, an edge electrode located within the dielectric ring, and a resonance circuit connected to the edge electrode. The resonance circuit includes a filter circuit which allows only the third signal among the first to third signals to pass, and a series resonance circuit connected in series with the filter circuit and having a first coil and a first variable capacitor connected in series and grounded.

Abstract: Plasma processing equipment includes a chuck stage for supporting a wafer and including a lower electrode, an upper electrode disposed on the chuck stage, an AC power supply which applies first to third signals having different magnitudes of frequencies to the upper electrode or the lower electrode, a dielectric ring which surrounds the chuck stage, an edge electrode located within the dielectric ring, and a resonance circuit connected to the edge electrode. The resonance circuit includes a filter circuit which allows only the third signal among the first to third signals to pass, and a series resonance circuit connected in series with the filter circuit and having a first coil and a first variable capacitor connected in series and grounded.

Abstract: A semiconductor manufacturing device includes a plasma chamber, a source power supply, and first and second bias power supplies. The source power supply applies a first source voltage to the plasma chamber at a first time and a second source voltage to the plasma chamber at a second time. The first bias power supply applies a first turn-on voltage to the plasma chamber at the first time and a first turn-off voltage to the plasma chamber at the second time. The second bias power supply applies a second turn-off voltage to the plasma chamber at the first time and a second turn-on voltage to the plasma chamber at the second time. The plasma chamber forms plasmas of different conditions from a gas mixture in the plasma chamber based on the source, turn-on, and turn-off voltages.

Abstract: Plasma processing equipment includes a chuck stage for supporting a wafer and including a lower electrode, an upper electrode disposed on the chuck stage, an AC power supply which applies first to third signals having different magnitudes of frequencies to the upper electrode or the lower electrode, a dielectric ring which surrounds the chuck stage, an edge electrode located within the dielectric ring, and a resonance circuit connected to the edge electrode. The resonance circuit includes a filter circuit which allows only the third signal among the first to third signals to pass, and a series resonance circuit connected in series with the filter circuit and having a first coil and a first variable capacitor connected in series and grounded.

Abstract: A semiconductor manufacturing device includes a plasma chamber, a source power supply, and first and second bias power supplies. The source power supply applies a first source voltage to the plasma chamber at a first time and a second source voltage to the plasma chamber at a second time. The first bias power supply applies a first turn-on voltage to the plasma chamber at the first time and a first turn-off voltage to the plasma chamber at the second time. The second bias power supply applies a second turn-off voltage to the plasma chamber at the first time and a second turn-on voltage to the plasma chamber at the second time. The plasma chamber forms plasmas of different conditions from a gas mixture in the plasma chamber based on the source, turn-on, and turn-off voltages.

Abstract: The present invention relates to a novel salicylic acid-maltol conjugates of the formula I. ##STR1## wherein R represents H, alkyl groups containing C.sub.1-5 carbon atoms or alkanoyl groups containing C.sub.1-5 carbon atoms. R.sub.1 represents H or alkyl groups containing C.sub.1-5 carbon atoms.A novel maltol esters of salicylic acid derivatives exhibit antioxidant and antithrombotic activities to a greater extent than salicylic acid derivatives.

Abstract: The present invention relates to 1,4-dihydropyridine of the formula(I) ##STR1## wherein R.sup.1 represents a phenyl group which may be substituted by one or two substituents selected from halogeno, nitro, trifluoromethyl and difluoromethoxy group, or 2,1,3-benzoxadiazole-4-yl group, R.sup.2 represents a lower alkyl or phenyl group, R.sup.3 represents a lower alkyl group and Y represents an oxygen or sulfur atom.The compounds of the formula(I) can be employed for treatment or prevention of cardiovascular diseases.

Abstract: A method of preparing a triterpenoids from Ilex pubescens which includes extracting the Ilex pubescens roots with organic solvent to an initial extract and converting the initial extract to the triterpenoids exhibiting antithrombotic activity on humans or mammals. Also, a pharmaceutical composition containing an effective antithrombotic amount of the triterpenoids from the Ilex pubescens.