Abstract: A chip-stacked semiconductor package includes a first chip having a first front surface, a first back surface, and a first connection member on the first front surface, the first back surface being opposite to the first front surface; a second chip having a second front surface, a second back surface, a second connection member and a first through-silicon via (TSV) electrically connected to the second connection member, the second back surface opposite to the second front surface, and the second connection member on the second front face; and a first sealing member between the first front surface and the second front surface, the first sealing member filling a space between the first connection member and the second connection member, the first connection member of the first chip and the second connection member of the second chip being symmetric with respect to each other.

Abstract: A chip-stacked semiconductor package includes a first chip having a first front surface, a first back surface, and a first connection member on the first front surface, the first back surface being opposite to the first front surface; a second chip having a second front surface, a second back surface, a second connection member and a first through-silicon via (TSV) electrically connected to the second connection member, the second back surface opposite to the second front surface, and the second connection member on the second front face; and a first sealing member between the first front surface and the second front surface, the first sealing member filling a space between the first connection member and the second connection member, the first connection member of the first chip and the second connection member of the second chip being symmetric with respect to each other.

Abstract: A chip-stacked semiconductor package includes a first chip having a first front surface, a first back surface, and a first connection member on the first front surface, the first back surface being opposite to the first front surface; a second chip having a second front surface, a second back surface, a second connection member and a first through-silicon via (TSV) electrically connected to the second connection member, the second back surface opposite to the second front surface, and the second connection member on the second front face; and a first sealing member between the first front surface and the second front surface, the first sealing member filling a space between the first connection member and the second connection member, the first connection member of the first chip and the second connection member of the second chip being symmetric with respect to each other.

Abstract: A chip-stacked semiconductor package includes a first chip having a first front surface, a first back surface, and a first connection member on the first front surface, the first back surface being opposite to the first front surface; a second chip having a second front surface, a second back surface, a second connection member and a first through-silicon via (TSV) electrically connected to the second connection member, the second back surface opposite to the second front surface, and the second connection member on the second front face; and a first sealing member between the first front surface and the second front surface, the first sealing member filling a space between the first connection member and the second connection member, the first connection member of the first chip and the second connection member of the second chip being symmetric with respect to each other.

Abstract: A semiconductor device comprises a semiconductor substrate including a first core region and a second core region between which a cell array region is interposed, a first conductive line and a second conductive line extending to the first core region across the cell array region, and a third conductive line and a fourth conductive line extending to the second core region across the cell array region, wherein a line width of the first through fourth conductive lines is smaller than a resolution limit in a lithography process.

Abstract: A semiconductor device comprises a semiconductor substrate including a first core region and a second core region between which a cell array region is interposed, a first conductive line and a second conductive line extending to the first core region across the cell array region, and a third conductive line and a fourth conductive line extending to the second core region across the cell array region, wherein a line width of the first through fourth conductive lines is smaller than a resolution limit in a lithography process.

Abstract: A semiconductor device comprises a semiconductor substrate including a first core region and a second core region between which a cell array region is interposed, a first conductive line and a second conductive line extending to the first core region across the cell array region, and a third conductive line and a fourth conductive line extending to the second core region across the cell array region, wherein a line width of the first through fourth conductive lines is smaller than a resolution limit in a lithography process.

Abstract: A semiconductor device includes first gate structures, second gate structures, a first capping layer pattern, a second capping layer pattern, first spacers, second spacers, third spacers, and a substrate having first impurity regions and second impurity regions. The first gate structures are arranged on the substrate at a first pitch. The second gate structures are arranged on the substrate at a second pitch greater than the first pitch. The first capping layer pattern has segments extending along side faces of the first gate structures and segments extending along the substrate. The second capping layer pattern has segments extending along the second gate structures and segments extending along the substrate. The first spacers and the second spacers are stacked on the second capping layer pattern. The third spacers are formed on the first capping layer pattern.

Abstract: A semiconductor device includes first gate structures, second gate structures, a first capping layer pattern, a second capping layer pattern, first spacers, second spacers, third spacers, and a substrate having first impurity regions and second impurity regions. The first gate structures are arranged on the substrate at a first pitch. The second gate structures are arranged on the substrate at a second pitch greater than the first pitch. The first capping layer pattern has segments extending along side faces of the first gate structures and segments extending along the substrate. The second capping layer pattern has segments extending along the second gate structures and segments extending along the substrate. The first spacers and the second spacers are stacked on the second capping layer pattern. The third spacers are formed on the first capping layer pattern.

Abstract: A semiconductor device comprises a semiconductor substrate including a first core region and a second core region between which a cell array region is interposed, a first conductive line and a second conductive line extending to the first core region across the cell array region, and a third conductive line and a fourth conductive line extending to the second core region across the cell array region, wherein a line width of the first through fourth conductive lines is smaller than a resolution limit in a lithography process.

Abstract: Insulated electrodes are formed by first forming on an integrated circuit substrate, an insulating layer, a conductive layer on the insulating layer, and a metal silicide layer on the conductive layer, and then forming a metal silicon nitride layer on the metal silicide layer. The metal silicon nitride layer acts as a silicon protrusion-preventing layer on the metal silicide layer that prevents formation of silicon protrusions from the metal silicide layer during subsequent processing. Reliability and/or yield problems that are caused by undercutting of an insulation layer in an insulated electrode may also be reduced by forming on an integrated circuit substrate, an insulating layer, conductive layer on the insulating layer and a metal silicide layer on the conductive layer.

Abstract: A method for forming a trench isolator in a semiconductor substrate comprises: forming a mask layer on the substrate having a opening defining a trench formation region on the substrate; etching the semiconductor substrate through the opening in the mask to form a trench in the substrate; depositing a trench isolation material on the substrate to fill the trench with the isolation material and form a trench isolator in the substrate; planarization-etching the trench isolation material until a top surface of the mask layer is exposed; and, forming a thin protective layer on the surface of the semiconductor substrate. The thin protective layer prevents an edge dipping effect of the trench isolator during subsequent cleaning processes, and enables the planarization-etching to reduce the thickness of the mask layer to the minimum thickness possible, thereby reducing the stresses applied to the semiconductor substrate by the mask layer during subsequent high temperature annealing processes.

Abstract: A integrated circuit field effect transistor is formed with device isolation regions disposed on opposite sides of the transistor, each of which include a shallow insulation-filled trench region which abuts an insulating region underlying an active region of the transistor. A pair of spaced apart insulation-filled trench regions are formed in a semiconductor substrate at a surface of the substrate. An insulated gate is formed on the substrate between and separated from the insulation-filled trench regions. Spaced apart source and drain insulating regions are formed in the substrate, a respective one of which is disposed between the insulated gate and a respective one of the insulation-filled trench regions. Corresponding spaced apart source and drain regions are then formed on the spaced apart source and drain insulating regions. The insulated gate is formed overlying a channel region disposed between lightly doped source and drain regions.