Patents by Inventor Byung Ju Min

Byung Ju Min has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250114900
    Abstract: Disclosed are window-mounted polishing pad. Since thermal fusion method and vibration fusion method are not applied while window is inserted into and attached to polishing pad, polishing pad is not deformed and polishing slurry does not leak through a gap between window and the polishing pad. A method of manufacturing the window-mounted polishing pad is also disclosed. The window-mounted polishing pad includes: polishing layer in which first punched hole is formed in thickness direction; window that is inserted into and fixed to the first punched hole of polishing layer; lower support layer; adhesive layer that mediates bonding of polishing layer and lower support layer; a sealing adhesive member positioned between the window and adhesive layer.
    Type: Application
    Filed: August 11, 2022
    Publication date: April 10, 2025
    Applicant: KPX CHEMICAL CO., LTD.
    Inventors: Byung Ju MIN, Seok Ji HONG, Hak Su KANG, Dae Han JUNG, GiYoung PARK, Hyun II JANG
  • Publication number: 20240367356
    Abstract: A method for manufacturing a window for a polishing pad is disclosed. The method includes: a) mixing a curing agent with a polyurethane prepolymer having a temperature of 50° C. or higher to less than 100° C. to prepare a mixture; b) injecting the mixture into a mold heated to a temperature of 30° C. or higher to less than 100° C. to a thickness of 5 mm or less; c) demolding a polyurethane cured product from the mold; and d) processing the polyurethane cured product to a thickness of the window of the polishing pad. A polishing pad including the window is also disclosed.
    Type: Application
    Filed: August 24, 2022
    Publication date: November 7, 2024
    Applicant: KPX CHEMICAL CO., LTD.
    Inventors: Byung Ju MIN, Seok Ji HONG, Hak Su KANG, Dae Han JUNG, Gi Young PARK, Hyun II JANG
  • Publication number: 20240253178
    Abstract: A composite polishing pad for chemical mechanical polishing (CMP) and a method for producing the composite CMP. The composite polishing pad for CMP contains a polymer substrate layer including a plurality of protrusions formed on the upper surface thereof; and a carbon nanotube layer including carbon nanotubes embedded in and fixed to the upper portion of the substrate layer.
    Type: Application
    Filed: November 12, 2021
    Publication date: August 1, 2024
    Applicants: KPX CHEMICAL CO., LTD., KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY
    Inventors: Byung Ju MIN, Seok Ji HONG, Seung Geun KIM, Jung Hee CHOI, Min Woo KANG, Nam Gue OH, Sanha KIM, Ji Hun JEONG, Hyun Jun RYU, Sukkyung KANG, Seong Jae KIM
  • Publication number: 20240217056
    Abstract: The present invention provides a composite polishing pad for CMP, and a method for producing the same. The composite polishing pad for CMP comprises: a soft polymer substrate layer including a plurality of protrusions formed on the upper surface thereof; a carbon nanotube layer including carbon nanotubes embedded in and bound to the upper portion of the substrate layer; and a hard polymer coating layer having the carbon nanotubes protruding outwardly on the upper portion of the carbon nanotube layer embedded and bound thereto.
    Type: Application
    Filed: November 12, 2021
    Publication date: July 4, 2024
    Applicants: KPX CHEMICAL CO., LTD., KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY
    Inventors: Byung Ju MIN, Seok Ji HONG, Seung Geun KIM, Jung Hee CHOI, Min Woo KANG, Nam Gue OH, Sanha KIM, Ji Hun JEONG, Hyun Jun RYU, Sukkyung KANG, Seong Jae KIM
  • Publication number: 20110053479
    Abstract: A method of manufacturing a cutting tool is disclosed. An object of the manufacturing method of a cutting tool is to reduce contamination of an abrasive layer surface, particularly, agglomeration contamination due to slurry by improving hydrophobicity maintaining performance of an abrasive layer. A cutting tool according to the method of manufacturing comprises an abrasive layer on a base member, the abrasive layer having abrasives bonded to a surface thereof; and a coating on the surface of the abrasive layer that is a hydrophobic material film.
    Type: Application
    Filed: May 19, 2008
    Publication date: March 3, 2011
    Applicant: SHINHAN DIAMOND IND. CO., LTD.
    Inventors: Shin Kyung Kim, Kee Jung Cheong, Brian Song, Tae Jin Kim, Mun Seak Park, Byung Ju Min, Jeong Bin Jeon