Patents by Inventor Byung Ki Son

Byung Ki Son has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • PURIFICATION METHOD OF HIGH PURITY ISOPROPYL ALCOHOL USED IN SEMICONDUCTOR CLEANING PROCESS
    Publication number: 20230365904
    Abstract: In a method for purifying highly pure isopropyl alcohol used in a semiconductor cleaning process, diacetone alcohol present in isopropyl alcohol is removed by an adsorption process, and diacetone alcohol, triisopropyl borate, and metal impurities are removed by a distillation process. The purified isopropyl alcohol may have a purity of has the moisture of 10 ppm or less, the triisopropyl boron compound of 50 ppt or less, and each metal of the metal impurities of 20 ppt or less.
    Type: Application
    Filed: May 10, 2023
    Publication date: November 16, 2023
    Inventors: Sung Won SHIM, Byung Ki SON, Yung LIM, Hwan CHOI, Youn Soo SHIN, Min Young KIM, Tae Gi CHOI
  • METHOD FOR PURIYFING WASTE N-METHYL-2-PYRROLIDONE
    Publication number: 20230192609
    Abstract: Provided is a method for purifying waste N-methyl-2-pyrrolidone, the method comprising the steps of: reacting the waste N-methyl-2-pyrrolidone containing an amine compound with an acid anhydride; converting the amine compound into an amide compound; and removing the amide compound by distillation, thereby manufacturing high-purity N-methyl-2-pyrrolidone that can be reused.
    Type: Application
    Filed: December 20, 2022
    Publication date: June 22, 2023
    Applicant: JAEWON INDUSTRIAL CO., LTD
    Inventors: Sung Won SHIM, Byung Ki SON, Hwan CHOI, Youn Soo SHIN, Hwa Yeong CHOI, Tae Gi CHOI, Yeong Su CHOO
  • METHOD FOR PURIFYING AN ALKYLENE GLYCOL MONOALKYL ETHER CARBOXYLIC ACID ESTER HAVING HIHG-PURITY USED IN PHOTO RESIST PROCESS
    Publication number: 20230095681
    Abstract: Provided is a method for purifying an alkylene glycol monoalkyl ether carboxylic acid ester (AGAECE) for photoresist processing, wherein the method comprises the step of distillation after passing industrial AGAECE through a porous adsorbent impregnated with a basic material, and it is possible to obtain a semiconductor-grade high-purity AGAECE maintaining a low acid value and high purity according to the present invention.
    Type: Application
    Filed: September 21, 2022
    Publication date: March 30, 2023
    Applicant: JAEWON INDUSTRIAL CO., LTD
    Inventors: Sung Won SHIM, Byung Ki SON, Hwan CHOI, Youn Soo SHIN, Hwa Yeong CHOI, Ho JEONG
  • Clamp device
    Patent number: 8100390
    Abstract: A clamp device for clamping a panel regardless of the panel's shape may include an air conduit, an air supplying unit that is communicated with the air conduit for selectively supplying air thereto and a tube that is connected with the air conduit to communicate therewith and expanded outwardly.
    Type: Grant
    Filed: June 30, 2009
    Date of Patent: January 24, 2012
    Assignee: Hyundai Motor Company
    Inventor: Byung Ki Son
  • CLAMP DEVICE
    Publication number: 20100109222
    Abstract: A clamp device for clamping a panel regardless of the panel's shape may include an air conduit, an air supplying unit that is communicated with the air conduit for selectively supplying air thereto and a tube that is connected with the air conduit to communicate therewith and expanded outwardly.
    Type: Application
    Filed: June 30, 2009
    Publication date: May 6, 2010
    Applicant: HYUNDAI MOTOR COMPANY
    Inventor: Byung Ki Son