Patents by Inventor Byung-Sug Lee

Byung-Sug Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7486392
    Abstract: In a method of inspecting an object, a first light is irradiated onto a bare object and a first reflection signal is reflected from the bare object. A second light is irradiated onto a processed object and a second reflection signal is reflected from the processed object. The first and second reflection signals are differentiated, to thereby generate respective first and second differential signals. A defect on the processed object is detected by a comparison between the first and second differential signals. The first and second differential signals overlap with each other and at least one signal-deviation portion is detected. The first and second differential signals are spaced apart out of an allowable error range in the signal-deviation portion. The defect is detected from a portion of the processed object corresponding to the signal-deviation portion.
    Type: Grant
    Filed: June 29, 2006
    Date of Patent: February 3, 2009
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Yu-Sin Yang, Chung-Sam Jun, Ki-Suk Chung, Tae-Sung Kim, Byung-Sug Lee
  • Patent number: 7446865
    Abstract: A method of classifying defects of an object includes irradiating multi-wavelength light onto the object, splitting light reflected from the object into light beams, each of the light beams having different wavelengths, obtaining image information of the object based on each of the light beams, forming a characteristic matrix that represent the wavelengths and the image information, and analyzing the characteristic matrix to determine types of the defects on the object. Thus, the defects may be accurately classified using a difference between reactivity of each of the defects in accordance with variations of the wavelengths and inspection conditions.
    Type: Grant
    Filed: May 30, 2006
    Date of Patent: November 4, 2008
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Ki-Suk Chung, Chung-Sam Jun, Yu-Sin Yang, Byung-Sug Lee, Ji-Young Shin, Tae-Sung Kim
  • Patent number: 7394279
    Abstract: In a method of measuring a surface voltage of an insulating layer, the number of times that surface voltages are measured in a depletion region increases so that precise data about the depletion region may be obtained. The number of times that the surface voltages are measured in an accumulation region and an inversion region decreases so that the data about the depletion region may be rapidly obtained.
    Type: Grant
    Filed: July 31, 2006
    Date of Patent: July 1, 2008
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Mi-Sung Lee, Yu-Sin Yang, Chung-Sam Jun, Byung-Sug Lee
  • Patent number: 7385689
    Abstract: A method of inspecting an inspection pattern using a statistical inference function is disclosed. The inference function is generated in relation to optical reference signal data and reference pattern characteristic data for a plurality of reference patterns formed by a unit process of interest on reference substrates.
    Type: Grant
    Filed: August 22, 2005
    Date of Patent: June 10, 2008
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Kye-Weon Kim, Chung-Sam Jun, Ki-Suk Chung, Sang-Mun Chon, Seong-Jin Kim, Byung-Sug Lee, Yu-Sin Yang
  • Publication number: 20070202615
    Abstract: In a method of measuring a critical dimension for conductive structures or openings exposing conductive structures formed on a substrate, a corona ion charge is deposited on the conductive structures and/or an insulating layer having the openings in a measurement region of the substrate. The critical dimension of the conductive structures or the openings may be determined by comparing variations of a surface voltage caused by leakage current through the conductive structures with reference data to thereby improve reliability of the critical dimension measurement.
    Type: Application
    Filed: February 6, 2007
    Publication date: August 30, 2007
    Inventors: Byung-Sug Lee, Mi-Sung Lee, Yu-Sin Yang, Yun-Jung Jee, Chung-Sam Jun
  • Publication number: 20070041609
    Abstract: A method of classifying defects of an object includes irradiating multi-wavelength light onto the object, splitting light reflected from the object into light beams, each of the light beams having different wavelengths, obtaining image information of the object based on each of the light beams, forming a characteristic matrix that represent the wavelengths and the image information, and analyzing the characteristic matrix to determine types of the defects on the object. Thus, the defects may be accurately classified using a difference between reactivity of each of the defects in accordance with variations of the wavelengths and inspection conditions.
    Type: Application
    Filed: May 30, 2006
    Publication date: February 22, 2007
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Ki-Suk CHUNG, Chung-Sam JUN, Yu-Sin YANG, Byung-Sug LEE, Ji-Young SHIN, Tae-Sung KIM
  • Publication number: 20070023834
    Abstract: In a method of measuring a surface voltage of an insulating layer, the number of times that surface voltages are measured in a depletion region increases so that precise data about the depletion region may be obtained. The number of times that the surface voltages are measured in an accumulation region and an inversion region decreases so that the data about the depletion region may be rapidly obtained.
    Type: Application
    Filed: July 31, 2006
    Publication date: February 1, 2007
    Inventors: Mi-Sung LEE, Yu-Sin YANG, Chung-Sam JUN, Byung-Sug LEE
  • Publication number: 20070002317
    Abstract: In a method of inspecting an object, a first light is irradiated onto a bare object and a first reflection signal is reflected from the bare object. A second light is irradiated onto a processed object and a second reflection signal is reflected from the processed object. The first and second reflection signals are differentiated, to thereby generate respective first and second differential signals. A defect on the processed object is detected by a comparison between the first and second differential signals. The first and second differential signals overlap with each other and at least one signal-deviation portion is detected. The first and second differential signals are spaced apart out of an allowable error range in the signal-deviation portion. The defect is detected from a portion of the processed object corresponding to the signal-deviation portion.
    Type: Application
    Filed: June 29, 2006
    Publication date: January 4, 2007
    Inventors: Yu-Sin Yang, Chung-Sam Jun, Ki-Suk Chung, Tae-Sung Kim, Byung-Sug Lee
  • Publication number: 20060039598
    Abstract: A method of inspecting an inspection pattern using a statistical inference function is disclosed. The inference function is generated in relation to optical reference signal data and reference pattern characteristic data for a plurality of reference patterns formed by a unit process of interest on reference substrates.
    Type: Application
    Filed: August 22, 2005
    Publication date: February 23, 2006
    Inventors: Kye-Weon Kim, Chung-Sam Jun, Ki-Suk Chung, Sang-Mun Chon, Seong-Jin Kim, Byung-Sug Lee, Yu-Sin Yang