Abstract: A method for forming a coating layer on a metal base material for a semiconductor reactor according to an aspect of the present invention comprises the steps of: immersing a metal base material for a semiconductor reactor in an aqueous alkaline electrolyte solution containing NaOH and NaAlO2; and connecting an electrode to the metal base material and supplying power to the electrode to form a coating layer on the metal base material through a plasma electrolytic oxidation (PEO) method.

Abstract: Provided is a method of fabricating a nano particle complex catalyst including generating a plasma ion of a solid element and performing plasma ion implantation to carry a catalyst component of the solid element in a porous carrier. In the method, a pulse direct current voltage is applied to the deposition source to generate the plasma ion of the solid element, and a synchronized voltage is applied to the porous carrier, thereby instantly applying a pulse high voltage to the solid element. The ionized solid element is accelerated toward the porous carrier by the pulse high voltage instantly applied to the solid element, thereby performing the ion implantation.

Abstract: Disclosed is a wire-type corona charger having a wire electrode disposed between ground electrode plates. The wire electrode is supported by the ends of the plurality of wire electrode supporters which are so arranged that their ends have a curvature equal to arcuately-shaped upper edge of the ground electrode plates. The curvature coincides with one of the curvatures of the horizontal axis and the vertical axis of the interior surface of the panel faceplate, while the charger is pivoted along the other curvature of the faceplate. The charger can uniformly charge the photoconductive layer and improves the charging efficiency.