Patents by Inventor Cédric GUERARD

Cédric GUERARD has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230421094
    Abstract: A method for optimizing an existing generator system based on photovoltaic cells and provided with an existing photovoltaic panel or a group of existing photovoltaic panels, each panel having a first plurality of cells of a first type interconnected in series or in series/in parallel. The method includes: determining an operating voltage of the panel(s); producing additional panel module(s) having a second plurality of thin-film cells of a second type and having a different band gap width than the cells of the panel(s), the additional module(s) being configured to supply an operating voltage equal, within ±10%, to the voltage of the panel(s); positioning the additional module to overlap on or under the panel or one of the panel(s), the module being connected in parallel to the panel(s), or positioning several additional modules to overlap on or under several panels, the several modules being connected in parallel to panels.
    Type: Application
    Filed: November 19, 2021
    Publication date: December 28, 2023
    Applicants: ELECTRICITE DE FRANCE, INSTITUT PHOTOVOLTAIQUE D'ILE DE FRANCE (IPVF), CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE - CNRS -, TOTALENERGIES ONETECH, ECOLE POLYTECHNIQUE
    Inventors: Sébastien JUTTEAU, Pierre-Philippe GRAND, Cédric GUERARD, Etienne DRAHI
  • Publication number: 20120285380
    Abstract: A vapor-phase deposition source including a vessel equipped with two zones. The first zone is for the production of vapor. It is equipped with a receptacle for the material and element for heating the material placed in the receptacle. The second is a diffusion zone including a vessel communicating with the production zone and equipped with at least one opening so that the vapor-phase material is transmitted towards the exterior of the vessel through the opening. The source is characterized in that it includes elements for closing the orifice and elements for moving the closing elements between an active closed position and an orifice open position without changing the volume of the diffusion zone.
    Type: Application
    Filed: February 15, 2011
    Publication date: November 15, 2012
    Applicant: ASTRON FIAMM SAFETY
    Inventors: Bruno Dussert-Vidalet, Cedric Guerard
  • Publication number: 20120285381
    Abstract: A vapor-phase deposition source includes a vessel equipped with two zones. The first zone is for the production of vapor. It is equipped with a receptacle for the material and elements for heating the material placed in the receptacle. The second is a diffusion zone having a vessel communicating with the production zone and equipped with at least one orifice so that the vapor-phase material is transmitted towards the exterior of the vessel through the orifice. The source is characterized in that, on the one hand, the room includes an inner wall and an outer envelope defining an intermediate space filled with a heat-transporting liquid and, on the other, it is equipped with elements for heating the coolant.
    Type: Application
    Filed: February 15, 2011
    Publication date: November 15, 2012
    Applicant: ASTRON FIAMM SAFETY SARL
    Inventors: Bruno Dussert-Vidalet, Cedric Guerard