Patents by Inventor C. Eric Ramberg
C. Eric Ramberg has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7882053Abstract: Computer-implemented methods, systems and apparatus, including computer program apparatus, provide techniques for designing a set of experiments to be performed with a set of resources. A plurality of experimental configurations are generated based on a set of parameters describing factors to be varied in the experiments and a set of constraints representing limitations on operations that can be performed with the set of resources. A set of experiments is defined based on a selected configuration. The constraints can be represented as patterns defining an application of a parameter to a set of one or more points of an experimental lattice.Type: GrantFiled: February 6, 2006Date of Patent: February 1, 2011Assignee: FreeSlate, Inc.Inventors: Youqi Wang, Marco Falcioni, Stephen J. Turner, C. Eric Ramberg
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Patent number: 7482676Abstract: Low dielectric materials and films comprising same have been identified for improved performance when used as performance materials, for example, in interlevel dielectrics integrated circuits as well as methods for making same. In one aspect of the present invention, the performance of the dielectric material may be improved by controlling the weight percentage of ethylene oxide groups in the at least one porogen.Type: GrantFiled: July 11, 2006Date of Patent: January 27, 2009Assignee: Air Products and Chemicals, Inc.Inventors: Brian Keith Peterson, John Francis Kirner, Scott Jeffrey Weigel, James Edward MacDougall, Lisa Deis, Thomas Albert Braymer, Keith Douglas Campbell, Martin Devenney, C. Eric Ramberg, Konstantinos Chondroudis, Keith Cendak
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Patent number: 7307343Abstract: Low dielectric materials and films comprising same have been identified for improved performance when used as interlevel dielectrics in integrated circuits as well as methods for making same. These materials are characterized as having a dielectric constant (?) a dielectric constant of about 3.7 or less; a normalized wall elastic modulus (E0?), derived in part from the dielectric constant of the material, of about 15 GPa or greater; and a metal impurity level of about 500 ppm or less. Low dielectric materials are also disclosed having a dielectric constant of less than about 1.95 and a normalized wall elastic modulus (E0?), derived in part from the dielectric constant of the material, of greater than about 26 GPa.Type: GrantFiled: May 30, 2002Date of Patent: December 11, 2007Assignee: Air Products and Chemicals, Inc.Inventors: John Francis Kirner, James Edward MacDougall, Brian Keith Peterson, Scott Jeffrey Weigel, Thomas Alan Deis, Martin Devenney, C. Eric Ramberg, Konstantinos Chondroudis, Keith Cendak
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Patent number: 7294585Abstract: Low dielectric materials and films comprising same have been identified for improved performance when used as performance materials, for example, in interlevel dielectrics integrated circuits as well as methods for making same. In one aspect of the present invention, the performance of the dielectric material may be improved by controlling the weight percentage of ethylene oxide groups in the at least one porogen.Type: GrantFiled: July 11, 2006Date of Patent: November 13, 2007Assignee: Air Products and Chemicals, Inc.Inventors: Brian Keith Peterson, John Francis Kirner, Scott Jeffrey Weigel, James Edward MacDougall, Lisa Deis, legal representative, Thomas Albert Braymer, Keith Douglas Campbell, Martin Devenney, C. Eric Ramberg, Konstantinos Chondroudis, Keith Cendak, Thomas Alan Deis, deceased
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Patent number: 7186613Abstract: Low dielectric materials and films comprising same have been identified for improved performance when used as interlevel dielectrics in integrated circuits as well as methods for making same. These materials are characterized as having a dielectric constant (?) a dielectric constant of about 3.7 or less; a normalized wall elastic modulus (E0?), derived in part from the dielectric constant of the material, of about 15 GPa or greater; and a metal impurity level of about 500 ppm or less. Low dielectric materials are also disclosed having a dielectric constant of less than about 1.95 and a normalized wall elastic modulus (E0?), derived in part from the dielectric constant of the material, of greater than about 26 GPa.Type: GrantFiled: October 13, 2004Date of Patent: March 6, 2007Assignee: Air Products And Chemicals, Inc.Inventors: John Francis Kirner, James Edward MacDougall, Brian Keith Peterson, Scott Jeffrey Weigel, Thomas Alan Deis, Martin Devenney, C. Eric Ramberg, Konstantinos Chondroudis, Keith Cendak
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Patent number: 7122880Abstract: Low dielectric materials and films comprising same have been identified for improved performance when used as performance materials, for example, in interlevel dielectrics integrated circuits as well as methods for making same. In one aspect of the present invention, the performance of the dielectric material may be improved by controlling the weight percentage of ethylene oxide groups in the at least one porogen.Type: GrantFiled: May 20, 2003Date of Patent: October 17, 2006Assignee: Air Products and Chemicals, Inc.Inventors: Brian Keith Peterson, John Francis Kirner, Scott Jeffrey Weigel, James Edward MacDougall, Lisa Deis, Thomas Albert Braymer, Keith Douglas Campbell, Martin Devenney, C. Eric Ramberg, Konstantinos Chondroudis, Keith Cendak
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Patent number: 6996550Abstract: Computer-implemented methods, systems and apparatus, including computer program apparatus, provide techniques for designing a set of experiments to be performed with a set of resources. A plurality of experimental configurations are generated based on a set of parameters describing factors to be varied in the experiments and a set of constraints representing limitations on operations that can be performed with the set of resources. A set of experiments is defined based on a selected configuration. The constraints can be represented as patterns defining an application of a parameter to a set of one or more points of an experimental lattice.Type: GrantFiled: December 17, 2001Date of Patent: February 7, 2006Assignee: Symyx Technologies, Inc.Inventors: Youqi Wang, Marco Falcioni, Stephen J. Turner, C. Eric Ramberg
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Patent number: 6983233Abstract: Methods and apparatus, including computer program apparatus, implementing techniques for designing sets of combinatorial experiments. A set of experimental parameters, sampling patterns, and constraints defines a set of experiments that is limited to a volume of a hyperspace defined by the set of experimental parameters. Parameters can be grouped by type such that grouped parameters are constrained to perform a common role in the set of experiments. The practicability of the experiment design can be estimated based on the number of experiments in the set of experiments. The experiment design can be used to prepare one or more combinatorial libraries.Type: GrantFiled: April 19, 2001Date of Patent: January 3, 2006Assignee: Symyx Technologies, Inc.Inventors: Marco Falcioni, C. Eric Ramberg, Youqi Wang
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Patent number: 6830663Abstract: The present invention is directed to a method for depositing a radial profile of a target material onto a substrate. The method comprises directing one or more target materials toward a substrate, blocking some predetermined portion of the target material with at least a first shutter so that it does not strike the substrate, and rotating the substrate relative to the first shutter while the target material is directed toward the substrate so that a radial profile is formed on the substrate. In on embodiment, the substrate is rotated, and the first shutter does not rotate. In another embodiment, the first shutter rotates and the substrate does not rotate. The method permits a radial thickness or composition gradient on the substrate to be formed. The method may also include using one or more contact masks placed on the substrate during the deposition in order to mask off particular portions of the substrate during the deposition process.Type: GrantFiled: April 1, 2002Date of Patent: December 14, 2004Assignee: Symyx Technologies, Inc.Inventors: Youqi Wang, C. Eric Ramberg
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Publication number: 20040071888Abstract: The present invention is generally relates to the field of research for the discovery of films with desirable properties, and to a process for making such films. More particularly, the present invention is directed to a system or an apparatus and a method for the rapid formation of a library of liquid samples and a library of thin films therefrom, as well as to the rapid screening of these films to identify those having desirable properties, all of which may be achieved using combinatorial techniques.Type: ApplicationFiled: May 30, 2003Publication date: April 15, 2004Applicants: Symyx Technologies, Inc., Air Products and Chemicals, Inc.Inventors: Konstantinos Chondroudis, Keith Cendak, Martin Devenney, C. Eric Ramberg, Xuejun (Jason) Wang, Raymond E. Carhart, Scott Jeffrey Weigel, John Francis Kirner, Thomas Alan Deis, Earl Danielson, James Edward MacDougall, Lisa Deis, Sum Nguyen
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Publication number: 20040048960Abstract: Low dielectric materials and films comprising same have been identified for improved performance when used as performance materials, for example, in interlevel dielectrics integrated circuits as well as methods for making same. In one aspect of the present invention, the performance of the dielectric material may be improved by controlling the weight percentage of ethylene oxide groups in the at least one porogen.Type: ApplicationFiled: May 20, 2003Publication date: March 11, 2004Inventors: Brian Keith Peterson, John Francis Kirner, Scott Jeffrey Weigel, James Edward MacDougall, Lisa Deis, Thomas Albert Braymer, Keith Douglas Campbell, Martin Devenney, C. Eric Ramberg, Konstantinos Chondroudis, Keith Cendak
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Publication number: 20030224105Abstract: In a method and apparatus for forming a plurality of films on the surface of a substrate, at least two liquid samples are deposited by a deposition device onto the substrate surface. The substrate is moved so that the liquid samples on the substrate are subjected to a non-contact spreading force sufficient to cause the samples to spread over the surface to form a respective film thereon. At least a portion of each film is discrete from one or more other films formed on each substrate surface. In another embodiment, liquid samples of different compositions are deposited on an array of substrates. The liquid samples on at least two of the substrates are subjected to non-contact spreading forces during overlapping durations of time whereby the spreading forces are sufficient to cause the samples to spread over respective surfaces of the substrates to form films thereon.Type: ApplicationFiled: May 30, 2002Publication date: December 4, 2003Applicant: Symyx Technologies, Inc.Inventors: Konstantinos Chondroudis, C. Eric Ramberg, Martin Devenney, Keith Cendak, Sum Nguyen, Qun Fan, Xuejun Wang
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Publication number: 20030224156Abstract: Low dielectric materials and films comprising same have been identified for improved performance when used as interlevel dielectrics in integrated circuits as well as methods for making same. These materials are characterized as having a dielectric constant (&kgr;) a dielectric constant of about 3.7 or less; a normalized wall elastic modulus (E0′), derived in part from the dielectric constant of the material, of about 15 GPa or greater; and a metal impurity level of about 500 ppm or less. Low dielectric materials are also disclosed having a dielectric constant of less than about 1.95 and a normalized wall elastic modulus (E0′), derived in part from the dielectric constant of the material, of greater than about 26 GPa.Type: ApplicationFiled: May 30, 2002Publication date: December 4, 2003Inventors: John Francis Kirner, James Edward MacDougall, Brian Keith Peterson, Scott Jeffrey Weigel, Thomas Alan Deis, Martin Devenney, C. Eric Ramberg, Konstantinos Chondroudis, Keith Cendak
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Publication number: 20030124028Abstract: The invention provides methods, apparatus, and systems for performing high-throughput preparation and screening of salts and polymorphs of drug candidates. The invention is directed towards enhancing the pre-formulation discovery process used for drug development. In particular, processes that determine suitable salts and processes that discover substantially every polymorph that can form from a particular drug candidate are provided. The processes are performed using several apparatuses that are specifically configured to carry-out various steps in a high-throughput characterization process. One such apparatus is configured for synthesizing a plurality of library members based on, for example, a library model generated by a computer system. Another apparatus may filter the synthesized solution to provide a substantially pure mixture that can be subjected to salt or polymorph testing.Type: ApplicationFiled: May 24, 2002Publication date: July 3, 2003Inventors: Eric D. Carlson, Peijun Cong, William H. Chandler, Henry K. Chau, Earl Danielson, Peter J. Desrosiers, Robert D. Doolen, Luping Wu, C. Eric Ramberg, Thomas Crevier, Ralph B. Nielsen, Colin S. Masui, John F. Varni
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Publication number: 20030055587Abstract: A library of materials is screened for characteristics. Accordingly, a library of materials is provided and an electromagnetic wavefront is directed at each member of the library. The electromagnetic wavefront is monitored for a response after the wavefront encounters the at least for sample materials. Thereafter, the response of the electromagnetic wavefront is correlated to a characteristic of the at least four sample materials.Type: ApplicationFiled: September 17, 2001Publication date: March 20, 2003Applicant: Symyx Technologies, Inc.Inventors: Youqi Wang, Qun Fan, C. Eric Ramberg, Earl Danielson, Damian A. Hajduk
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Publication number: 20020162740Abstract: The gradient deposition method and apparatus permits a radial thickness or composition gradient on a substrate to be formed. The system comprises one or more deposition sources that can be fired sequentially or simultaneously. The system also comprises one or more dynamic shutters (e.g., shutters that can be moved independently of each other and during the deposition of a material) in combination with equipment that permits the substrate to be rotated during the deposition of the material onto the substrate. The system may also include one or more contact masks that may be placed on the substrate during the deposition in order to mask off particular portions of the substrate during the deposition process.Type: ApplicationFiled: April 1, 2002Publication date: November 7, 2002Inventors: Youqi Wang, C. Eric Ramberg
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Publication number: 20020152057Abstract: Computer-implemented methods, systems and apparatus, including computer program apparatus, provide techniques for designing a set of experiments to be performed with a set of resources. A plurality of experimental configurations are generated based on a set of parameters describing factors to be varied in the experiments and a set of constraints representing limitations on operations that can be performed with the set of resources. A set of experiments is defined based on a selected configuration. The constraints can be represented as patterns defining an application of a parameter to a set of one or more points of an experimental lattice.Type: ApplicationFiled: December 17, 2001Publication date: October 17, 2002Inventors: Youqi Wang, Marco Falcioni, Stephen J. Turner, C. Eric Ramberg