Patents by Inventor C. James Bryer

C. James Bryer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Methods for removing metallic contamination from wafer containers
    Patent number: 6869486
    Abstract: In a method for cleaning for cleaning metallic ion contamination, and especially copper, from wafer containers, the containers are loaded into a cleaning apparatus. The containers are sprayed with a dilute chelating agent solution. The chelating agent solution removes metallic contamination from the containers. The containers are then rinsed with a rinsing liquid, such as deionized water and a surfactant. The containers are then dried, preferably by applying heat and/or hot air movement.
    Type: Grant
    Filed: October 23, 2003
    Date of Patent: March 22, 2005
    Assignee: Semitool, Inc.
    Inventors: Ronald G. Breese, C. James Bryer, Eric J. Bergman, Dana R. Scranton
  • Apparatus and methods for removing metallic contamination from wafer containers
    Publication number: 20040079393
    Abstract: In a method for cleaning for cleaning metallic ion contamination, and especially copper, from wafer containers, the containers are loaded into a cleaning apparatus. The containers are sprayed with a dilute chelating agent solution. The chelating agent solution removes metallic contamination from the containers. The containers are then rinsed with a rinsing liquid, such as deionized water and a surfactant. The containers are then dried, preferably by applying heat and/or hot air movement.
    Type: Application
    Filed: October 23, 2003
    Publication date: April 29, 2004
    Inventors: Ronald G. Breese, C. James Bryer, Eric J. Bergman, Dana R. Scranton
  • Apparatus and methods for removing metallic contamination from wafer containers
    Publication number: 20030062069
    Abstract: In a method for cleaning for cleaning metallic ion contamination, and especially copper, from wafer containers, the containers are loaded into a cleaning apparatus. The containers are sprayed with a dilute chelating agent solution. The chelating agent solution removes metallic contamination from the containers. The containers are then rinsed with a rinsing liquid, such as deionized water and a surfactant. The containers are then dried, preferably by applying heat and/or hot air movement.
    Type: Application
    Filed: August 20, 2002
    Publication date: April 3, 2003
    Applicant: Semitool, Inc
    Inventors: Ronald G. Breese, C. James Bryer, Eric J. Bergman, Dana R. Scranton
  • Apparatus and methods for removing metallic contamination from wafer containers
    Publication number: 20030051743
    Abstract: In a method for cleaning for cleaning metallic ion contamination, and especially copper, from wafer containers, the containers are loaded into a loader of a cleaning apparatus. The containers are sprayed with a dilute chelating agent solution, while the rotor is spinning. The chelating agent solution removes metallic contamination from the containers. The containers are then sprayed with a rinsing liquid, such as deionized water and a surfactant while the rotor is spinning and heat is applied. The containers are then dried by applying heat, hot air movement and spinning the rotor.
    Type: Application
    Filed: July 19, 2002
    Publication date: March 20, 2003
    Applicant: Semitool, Inc.
    Inventors: Ronald G. Breese, C. James Bryer, Eric J. Bergman, Dana R. Scranton