Patents by Inventor C. Koemtzopoulos

C. Koemtzopoulos has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for Hard Mask CD Trim
    Publication number: 20070249177
    Abstract: Broadly speaking, methods and an apparatus are provided for removing an inorganic material from a substrate. More specifically, the methods provide for removing the inorganic material from the substrate through exposure to a high density plasma generated using an inductively coupled etching apparatus. The high density plasma is set and controlled to isotropically contact particular regions of the inorganic material to allow for trimming and control of a critical dimension associated with the inorganic material.
    Type: Application
    Filed: June 22, 2007
    Publication date: October 25, 2007
    Applicant: Lam Research Corporation
    Inventors: C. Koemtzopoulos, Shibu Gangadharan, Chris Lee, Alan Miller
  • Dual doped polysilicon and silicon germanium etch
    Publication number: 20050205862
    Abstract: A method for etching a stack with at least one silicon germanium layer over a substrate in a processing chamber is provided. A silicon germanium etch is provided. An etchant gas is provided into the processing chamber, wherein the etchant gas comprises HBr, an inert diluent, and at least one of O2 and N2. The substrate is cooled to a temperature below 40° C. The etching gas is transformed to a plasma to etch the silicon germanium layer.
    Type: Application
    Filed: March 17, 2004
    Publication date: September 22, 2005
    Inventors: C. Koemtzopoulos, Yoko Adams, Yoshinori Miyamoto, Yousun Taylor