Patents by Inventor Céline C. Guermeur

Céline C. Guermeur has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Self-aligned aperture masks having high definition apertures
    Patent number: 6770425
    Abstract: Self-aligned aperture masks are produced using a positive-acting photoresist (18) which is developed with a liquid developer. The apertures (30) of the mask have lower levels of inter-aperture variability than masks produced using mechanical transfer of toner particles (FIGS. 4-5 and 7-8), both for the apertures of a given mask and between masks.
    Type: Grant
    Filed: April 15, 2003
    Date of Patent: August 3, 2004
    Assignee: Corning Incorporated
    Inventors: Michael D. Brady, Céline C. Guermeur, Yann P. M. Nédeléc