Patents by Inventor C. M. Chi

C. M. Chi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for cleaning interior of etching chamber
    Patent number: 6401728
    Abstract: A process for cleaning the interior walls of a reaction chamber after a number of silicon wafers is etched inside the chamber. The cleaning process includes bombarding the interior walls of the chamber with a first type of plasma in a dry cleaning operation, and then bombarding the interior walls of the chamber with a second type of plasma containing the element hydrogen in a warm-up operation. No silicon wafers need to be placed inside the chamber when the dry cleaning operation or the warm-up operation is conducted.
    Type: Grant
    Filed: April 5, 1999
    Date of Patent: June 11, 2002
    Assignee: United Microelectronics Corp.
    Inventors: Yu-Chang Chow, W. H. Cheng, Chia-Fu Yeh, C. M. Chi, Cobby Lee