Patents by Inventor C. P. Fan

C. P. Fan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Integrated film etching/chamber cleaning process
    Patent number: 5868853
    Abstract: The present invention discloses a method for in-situ cleaning a reactive ion etching (RIE) chamber after a silicon nitride etching process by maintaining a vacuum and a radial frequency power in the chamber while flowing a chlorine gas into the chamber at a sufficient flow rate. The chlorine gas cleaning step can be integrated into the process recipe for the etching process without significantly affecting the cycle time and the yield of the process.
    Type: Grant
    Filed: June 18, 1997
    Date of Patent: February 9, 1999
    Assignee: Taiwan Semiconductor Manufacturing Co. Ltd.
    Inventors: J. G. Chen, L. M. Huang, W. C. Chien, C. P. Fan