Patents by Inventor C. Wallace Wang

C. Wallace Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • End-point detection in plasma etching or phosphosilicate glass
    Patent number: 4415402
    Abstract: A method for determining the completion of removal by plasma etching of phosphorus doped silicon dioxide from an underlying substrate.
    Type: Grant
    Filed: April 2, 1981
    Date of Patent: November 15, 1983
    Assignee: The Perkin-Elmer Corporation
    Inventors: Barry Gelernt, C. Wallace Wang