Abstract: Methods for recognizing gestures made by a conductive object on a touch-sensor pad are disclosed. Tapping, pushing, hopping, and zigzag gestures are recognized by analyzing the position, pressure, and movement of the conductive object on the sensor pad during the time of a suspected gesture, and signals are sent to a host indicating the occurrence of these gestures. Signals for compensating for unintended motion of the conductive object on the touch-sensor pad during the gestures are also sent to the host.

Abstract: A phosphate ester-based functional fluid composition that generates reduced levels of carboxylic acid during use by incorporating at least one acid scavenger selected from the epoxides of the invention. The phosphate ester-based functional fluids are particularly useful as hydraulic fluids.

Abstract: According to the present invention, a photomultiplier tube is used with a high-speed feedback mechanism to continuously modulate the gain of the tube in response to the size of the input signal. The gain of the tube and the anode current are independently converted to ideal logarithms. These signals are then subtracted from one another to reconstruct a true logarithmic representation of the optical signal. This log-light-level signal has a higher dynamic range and faster temporal response than has previously been achieved by other methods.

Abstract: Methods for recognizing gestures made by a conductive object on a touch-sensor pad and for cursor motion are disclosed. Tapping, drags, pushes, extended drags and variable drags gestures are recognized by analyzing the position, pressure, and movement of the conductive object on the sensor pad during the time of a suspected gesture, and signals are sent to a host indicating the occurrence of these gestures. Signals indicating the position of a conductive object and distinguishing between the peripheral portion and an inner portion of the touch-sensor pad are also sent to the host.

Abstract: According to the present invention, a photomultiplier tube is used with a high-speed feedback mechanism to continuously modulate the gain of the tube in response to the size of the input signal. The gain of the tube and the anode current are independently converted to ideal logarithms. These signals are then subtracted from one another to reconstruct a true logarithmic representation of the optical signal. This log-light-level signal has a higher dynamic range and faster temporal response than has previously been achieved by other methods.

Abstract: Methods for recognizing gestures made by a conductive object on a touch-sensor pad and for cursor motion are disclosed. Tapping, drags, pushes, extended drags and variable drags gestures are recognized by analyzing the position, pressure, and movement of the conductive object on the sensor pad during the time of a suspected gesture, and signals are sent to a host indicating the occurrence of these gestures. Signals indicating the position of a conductive object and distinguishing between the peripheral portion and an inner portion of the touch-sensor pad are also sent to the host.

Abstract: An RF diode reactive ion etching (RIE) method and apparatus (20) include an evacuable reaction chamber (22) in which an anode electrode (76) and cathode electrode (30)are spaced-apart facing each other and defining a gap (78) between the electrodes. A substrate (40) to be etched is placed in thermal contact with the cathode. A magnet (70) behind the anode provides a magnetic field which is characterized by lines-of-force (80) extending continuously through the gap from one of the electrodes to the other. To etch the substrate the reaction chamber is evacuated, an etchant-gas is admitted into the gap at a predetermined low pressure, a plasma (79) including ions of the etchant gas is generated by applying RF power to the electrodes. The substrate is etched by etchant gas ions attracted from the plasma toward the substrate by a negative self-bias potential established on the cathode.

Abstract: An intelligent system for the efficient selection and allocation of the various types of resources available in a multimedia environment. The system interrelates a combination of user input parameters with the resident hardware and software parameters of the requesting multimedia resources by grouping into common computing needs. In addition to traditionally known hardware/software parameters the system recognizes specific limitations of resources which would effect a proper multimedia presentation to the end user. The system uses an internal graph structure to interrelate the various resources as they are allocated to proved for an intelligent data flow.

Abstract: The present invention is, in part, a new process for dopant diffusion, both p-type (e.g., B) and n-type (e.g., P, As), into silicon wafers, using rapid thermal processing (RTP). It uses a surface layer of a new planar dopant as an active dopant source. Such a source is produced using either a rigid holder wafer with a spin-on dopant or CVD doped oxides deposited on its surface, or such a source is high pressure planar solid source having a surface that has been activated by dry etching or sputtering etching. Such a dopant source is placed in proximity to a processed silicon wafer in such a manner that its active surface is facing the surface of the silicon wafer during RTP. Both the silicon wafer and the dopant source are heated by lamps emitting light causing transport of dopant from the dopant source to the silicon surface.

Abstract: A method of suppressing adherence of silicon particles to IC bond pads, and corrosion thereof, during the dicing of silicon wafers by sawing. An anion of an organic acid is added to saw coolant water.

Abstract: A process for depositing a compound of a metal and a reactive gas includes heating a metal target (32), in an evacuated chamber (22) to a predetermined reaction temperature. The reaction temperature is above a critical temperature which is higher than about half the melting point of the metal but below the vaporization temperature of the metal target. At this reaction temperature, the metal target reacts with the reactive gas to produce, in gaseous form, the compound or a sub-compound of the metal and the reactive gas. The gaseous compound or sub-compound is reacted with the reactive gas on a substrate (36) to form a solid layer of the compound on the substrate.

Abstract: A soft reusable tracheostomy collar is provided for holding a tracheostomy tube securely in place. The collar is specifically made with machine washable materials. The present tracheostomy collar provides increased comfort and stability to the tracheostomy tube, alleviating leaks and dislodged tracheostomy tubes. In addition, the present tracheostomy collar includes two tying tapes of equal lengths with easily threadable plastic tips to place through the tracheostomy tube flanges and tie at the back of the neck. The present collar also is available with two additional tying tapes to tie across the front to hold a mechanical breathing device in place. The present tracheostomy collar is provided in a variety of different sizes to accommodate all possibilities. Furthermore, the relatively simple design makes the present collar easy and inexpensive to manufacture.

Abstract: A method for removing flux residue from an electronic component using a solution having tetrahydrofurfuryl alcohol (THFA) and an activator. As activators, compounds of the formula ##STR1## are used, wherein R.sub.1, R.sub.2 and R.sub.3 are independently hydrogen, C.sub.1 -C.sub.7 alkyl, C.sub.5 -C.sub.6 cycloalkyl, furanyl which can be substituted by C.sub.1 -C.sub.7 alkyl, tetrahydrofuranyl which can be substituted by C.sub.1 -C.sub.7 alkyl, pyrrolyl, pyrrolidinyl, benzyl which can be substituted by C.sub.1 -C.sub.7 alkyl, phenyl which can be substituted by C.sub.1 -C.sub.7 alkyl, C.sub.1 -C.sub.7 alkenyl, C.sub.1 -C.sub.7 alkenyl, furfuryl which can be substituted by C.sub.1 -C.sub.7 alkyl, or tetrahydrofurfuryl which can be substituted by C.sub.1 -C.sub.7 alkyl, wherein R.sub.1, R.sub.2 and R.sub.3 can be hydroxy groups, where R.sub.1, R.sub.2 and R.sub.3 are not simultaneously hydrogen, R.sub.4 is hydrogen, C.sub.1 -C.sub.6 alkyl, C.sub.5 -C.sub.6 cycloalkyl, furanyl which can be substituted by C.sub.

Abstract: An inspection apparatus for a light diffracting surface employs a planar array of individually addressable light valves for use as a spatial filter in an imaged Fourier plane of a diffraction pattern, with valves having a stripe geometry corresponding to positions of members of the diffraction pattern, blocking light from those members. The remaining valve stripes, i.e. those not blocking light from diffraction order members, are open for transmission of light. Light directed onto the surface, such as a semiconductor wafer, forms elongated curved diffraction orders from repetitive patterns of circuit features. The curved diffraction orders are transformed to linear orders by a Fourier transform lens. The linear diffraction orders from repetitive patterns of circuit features are blocked, while light from non-repetitive features, such as dirt particles or defects is allowed to pass through the light valves to a detector.

Abstract: A thin film thickness monitor using successive reflection of a polychromatic light beam off of reference thin film of variable optical thickness and a sample thin film whose thickness is to be determined, in which a monochromatic light source is used beforehand to first determine the actual optical thickness of the reference thin film at each relative position of the beam and reference thin film. In one embodiment, the ratio S/R of detected light intensity S from the sample thin film and detected light intensity R from the reference thin film is found for each relative position and the position at which the ratio is a maximum is determined. In another embodiment, this ratio is corrected by a corresponding ratio S.sub.1 /R.sub.1 derived from a bare wafer substrate. The sample can then be located behind additional optical surfaces, such as a vacuum port without causing substantial errors.

Abstract: The ion beam which performs the printing on the resist through the mask is also used to perform the alignment function. Alignment marks are initially provided on the wafer of a material which emits light when an ion beam impinges thereon, such as silicon dioxide. An ion mask, preferably of silicon, is then positioned over the wafer and alignment marks and ions are directed to the alignment marks through the mask. The degree of alignment is determined by the amount of light emitted by the alignment marks since more ions will strike the alignment marks with increased alignment. The emitted light is detected and +X, -X, +Y, -Y and +theta and -theta error signals are provided on a continuous basis for closed loop control of the mask relative to the wafer under proper alignment is achieved.

Abstract: The present invention offers an alternative to the chlorofluorocarbons which have been used in the cleaning industry. In particular, the present invention uses a solution having tetrahydrofurfuryl alcohol (THFA) and an activator.

Abstract: Combination of a flattened cathode in a cylindrical magnetron sputtering system and positioning of a substrate relatively close to the flattened cathode allows deposition of a uniform film having good composition. The system and method of the present invention is especially suitable for depositing films using YBCO and BCSCO targets.

Abstract: An etching process and apparatus employ a novel magnetic enhancement means and a substantially pure molecular bromine plasma in order to perform in a desired manner for a number of important applications requiring etching of single-crystal and polycrystalline silicon.