Abstract: Indicia are imaged at a workstation having windows arranged in intersecting planes. The workstation also has solid-state imagers with fields of view that are split into intersecting subfields that look out through the windows, as well as illumination assemblies each having multiple light sources that illuminate each subfield with illumination light over an illumination field that overlaps a respective subfield. Light-modifying elements, such as lenses or baffles that are radially offset from the multiple light sources, condition the illumination light from the multiple light sources to be generally uniform in light intensity over at least one illuminated subfield.

Abstract: Indicia are imaged at a workstation having windows arranged in intersecting planes. The workstation also has solid-state imagers with fields of view that are split into intersecting subfields that look out through the windows, as well as illumination assemblies each having multiple light sources that illuminate each subfield with illumination light over an illumination field that overlaps a respective subfield. Light-modifying elements, such as lenses or baffles that are radially offset from the multiple light sources, condition the illumination light from the multiple light sources to be generally uniform in light intensity over at least one illuminated subfield.

Abstract: An illumination time of an illumination system and/or an exposure setting of an imaging system are adjusted by a proximity system operative for detecting a product entering a field of view in a bi-optical, dual window, point-of-transaction workstation. The proximity system includes an infrared emitter for emitting infrared light to the product, and an infrared sensor for sensing return infrared light from the product. Multiple predefined thresholds are stored for the sensed return infrared light, and a predefined illumination time and/or exposure setting are stored and assigned to each predefined threshold. Adjustment of the illumination time and/or of the exposure setting is performed by comparing the sensed return infrared light from the product in real time operation with the stored predefined thresholds.

Abstract: An illumination time of an illumination system and/or an exposure setting of an imaging system are adjusted by a proximity system operative for detecting a product entering a field of view in a bi-optical, dual window, point-of-transaction workstation. The proximity system includes an infrared emitter for emitting infrared light to the product, and an infrared sensor for sensing return infrared light from the product. Multiple predefined thresholds are stored for the sensed return infrared light, and a predefined illumination time and/or exposure setting are stored and assigned to each predefined threshold. Adjustment of the illumination time and/or of the exposure setting is performed by comparing the sensed return infrared light from the product in real time operation with the stored predefined thresholds.

Abstract: In an optical coupling system, an optical coupler having a dielectric mirror or Gaussian beam mirror is used to efficiently couple optical signals to photonic crystal waveguides. Dielectric mirrors offer the advantage of optical coupling between dielectric waveguides and single mode photonic crystal waveguides. Various types of optical couplers may be implemented with or without a dielectric waveguide in the system.

Abstract: In an optical coupling system, an optical coupler having a dielectric mirror or Gaussian beam mirror is used to efficiently couple optical signals to photonic crystal waveguides. Dielectric mirrors offer the advantage of optical coupling between dielectric waveguides and single mode photonic crystal waveguides. Various types of optical couplers may be implemented with or without a dielectric waveguide in the system.