Patents by Inventor Caizhi Xu

Caizhi Xu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11011378
    Abstract: Systems, apparatuses, and methods related to atom implantation for reduction of compressive stress are described. An example method may include patterning a working surface of a semiconductor, the working surface having a hard mask material formed over a dielectric material and forming a material having a lower refractive index (RI), relative to a RI of the hard mask material, over the hard mask material. The method may further include implanting atoms through the lower RI material and into the hard mask material to reduce the compressive stress in the hard mask material.
    Type: Grant
    Filed: July 1, 2019
    Date of Patent: May 18, 2021
    Assignee: Micron Technology, Inc.
    Inventors: Yiping Wang, Caizhi Xu, Pengyuan Zheng, Ying Rui, Russell A. Benson, Yongjun J. Hu, Jaydeb Goswami
  • Publication number: 20210005455
    Abstract: Systems, apparatuses, and methods related to atom implantation for reduction of compressive stress are described. An example method may include patterning a working surface of a semiconductor, the working surface having a hard mask material formed over a dielectric material and forming a material having a lower refractive index (RI), relative to a RI of the hard mask material, over the hard mask material. The method may further include implanting atoms through the lower RI material and into the hard mask material to reduce the compressive stress in the hard mask material.
    Type: Application
    Filed: July 1, 2019
    Publication date: January 7, 2021
    Inventors: Yiping Wang, Caizhi Xu, Pengyuan Zheng, Ying Rui, Russell A. Benson, Yongjun J. Hu, Jaydeb Goswami