Patents by Inventor Caleb MINSKY

Caleb MINSKY has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • METHODS AND APPARATUS FOR PROCESSING AN ELECTROSTATIC CHUCK
    Publication number: 20240286398
    Abstract: Described are techniques and equipment (apparatus) for processing an electrostatic chuck at controlled process conditions, including, as an example, for processing an electrostatic chuck during a step of curing an adhesive that forms a bond between two layers of the electrostatic chuck.
    Type: Application
    Filed: April 25, 2024
    Publication date: August 29, 2024
    Inventors: Chiranjeevi PYDI, Nathan RICHARD, Steven DONNELL, Sara MERCHEL, Caleb MINSKY, Cerel MUNOZ, Yan LIU
  • Electrostatic chuck having a gas flow feature, and related methods
    Patent number: 11837492
    Abstract: Described are electrostatic chucks designed for use in supporting a workpiece during a workpiece processing step, the electrostatic chuck including a gas flow system.
    Type: Grant
    Filed: May 11, 2021
    Date of Patent: December 5, 2023
    Assignee: ENTEGRIS, INC.
    Inventors: Yan Liu, Jakub Rybczynski, Steven Donnell, Caleb Minsky, Chun Wang Chan
  • ELECTROSTATIC CHUCK WITH A CHARGE DISSIPATION STRUCTURE
    Publication number: 20230274967
    Abstract: Described are electrostatic chucks that are useful to support a workpiece during a step of processing the workpiece, the electrostatic chuck including a pattern of charge dissipation lines on an insulating layer, the lines having a first conductive layer and a second conductive layer and being arranged to define enclosed fields of the insulating layer between the lines.
    Type: Application
    Filed: February 24, 2023
    Publication date: August 31, 2023
    Inventors: Jakub Rybczynski, Steven Donnell, Yan Liu, Caleb Minsky, Chandra Venkatraman, Carlo Waldfried
  • ELECTROSTATIC CHUCK THAT INCLUDES UPPER CERAMIC LAYER THAT INCLUDES A DIELECTRIC LAYER, AND RELATED METHODS AND STRUCTURES
    Publication number: 20230136703
    Abstract: Described are electrostatic chuck devices that are useful to support a workpiece while processing the workpiece, upper ceramic layer components of electrostatic chuck assemblies, the upper ceramic layer having a deposited dielectric layer, a relatively smooth finish, or both, and related methods.
    Type: Application
    Filed: October 26, 2022
    Publication date: May 4, 2023
    Inventors: Yan Liu, Jakub Rybczynski, Caleb Minsky, Steven Donnell
  • Electrostatic chuck with embossments that comprise diamond-like carbon and deposited silicon-based material, and related methods
    Patent number: 11612972
    Abstract: Described are electrostatic chucks that are useful to support a workpiece during a step of processing the workpiece, the electrostatic chuck including embossments that are made of multiple deposited layers, the layers including diamond-like carbon layers and layers that contain silicon-based materials such as silicon carbide layers.
    Type: Grant
    Filed: August 27, 2021
    Date of Patent: March 28, 2023
    Assignee: ENTEGRIS, INC.
    Inventors: Yan Liu, Steven Donnell, Jakub Rybczynski, Chun Wang Chan, Caleb Minsky
  • METHODS AND APPARATUS FOR PROCESSING AN ELECTROSTATIC CHUCK
    Publication number: 20230060192
    Abstract: Described are techniques and equipment (apparatus) for processing an electrostatic chuck at controlled process conditions, including, as an example, for processing an electrostatic chuck during a step of curing an adhesive that forms a bond between two layers of the electrostatic chuck.
    Type: Application
    Filed: August 29, 2022
    Publication date: March 2, 2023
    Inventors: Chiranjeevi PYDI, Nathan RICHARD, Steven DONNELL, Sara MERCHEL, Caleb MINSKY, Cerel MUNOZ, Yan LIU
  • ELECTROSTATIC CHUCK WITH EMBOSSMENTS THAT COMPRISE DIAMOND-LIKE CARBON AND DEPOSITED SILICON-BASED MATERIAL, AND RELATED METHODS
    Publication number: 20220063035
    Abstract: Described are electrostatic chucks that are useful to support a workpiece during a step of processing the workpiece, the electrostatic chuck including embossments that are made of multiple deposited layers, the layers including diamond-like carbon layers and layers that contain silicon-based materials such as silicon carbide layers.
    Type: Application
    Filed: August 27, 2021
    Publication date: March 3, 2022
    Inventors: Yan LIU, Steven DONNELL, Jakub RYBCZYNSKI, Chun Wang CHAN, Caleb MINSKY
  • ELECTROSTATIC CHUCK HAVING A GAS FLOW FEATURE, AND RELATED METHODS
    Publication number: 20210351061
    Abstract: Described are electrostatic chucks designed for use in supporting a workpiece during a workpiece processing step, the electrostatic chuck including a gas flow system.
    Type: Application
    Filed: May 11, 2021
    Publication date: November 11, 2021
    Inventors: Yan LIU, Jakub RYBCZYNSKI, Steven DONNELL, Caleb MINSKY, Chun Wang CHAN