Patents by Inventor Calvin Ka Kuen Ho

Calvin Ka Kuen Ho has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Methods for etch loading planar lightwave circuits
    Patent number: 7182878
    Abstract: This relates to optical devices such as planar light-wave components/circuits which are designed to have a high waveguide pattern density effecting a higher etch selectivity and overall improved dimensional control of the functional waveguides on the optical device.
    Type: Grant
    Filed: February 6, 2004
    Date of Patent: February 27, 2007
    Assignee: Lightwave Microsystems Corporation
    Inventors: Jongik Won, Calvin Ka Kuen Ho, Fan Zhong, Liang Zhao
  • Methods for etch loading plannar lightwave circuits
    Publication number: 20040159855
    Abstract: This relates to optical devices such as planar light-wave components/circuits which are designed to have a high waveguide pattern density effecting a higher etch selectivity and overall improved dimensional control of the functional waveguides on the optical device.
    Type: Application
    Filed: February 6, 2004
    Publication date: August 19, 2004
    Inventors: Jongik Won, Calvin Ka Kuen Ho, Fan Zhong, Liang Zhao
  • Devices for etch loading planar lightwave circuits
    Patent number: 6690025
    Abstract: This relates to optical devices such as planar light-wave components/circuits which are designed to have a high waveguide pattern density effecting a higher etch selectivity and overall improved dimensional control of the functional waveguides on the optical device.
    Type: Grant
    Filed: July 10, 2001
    Date of Patent: February 10, 2004
    Assignee: Lightwave Microsystems Corporation
    Inventors: Jongik Won, Calvin Ka Kuen Ho, Fan Zhong, Liang Zhao
  • Devices and methods for etch loading planar lightwave circuits
    Publication number: 20020168860
    Abstract: This relates to optical devices such as planar light-wave components/circuits which are designed to have a high waveguide pattern density effecting a higher etch selectivity and overall improved dimensional control of the functional waveguides on the optical device.
    Type: Application
    Filed: July 10, 2001
    Publication date: November 14, 2002
    Inventors: Jongik Won, Calvin Ka Kuen Ho, Fan Zhong, Liang Zhao