Abstract: An atomic force microscope based apparatus for examining a sample includes a cantilever having a cantilever arm and a probe tip where the probe tip is offset laterally from a longitudinal axis of torsion of the cantilever arm, an oscillator that drives the cantilever into oscillation in a flexural mode to cause the probe tip to repeatedly interact with the sample where the tip-sample interaction of the laterally offset probe tip excites torsional motion of the cantilever, and a detection system that detects torsional motion of the cantilever in response to the tip-sample interaction.

Abstract: The present invention provides sensors based on micromachined ultrasonic transducer technology. The sensors preferably include a plurality of sensor elements, but may include only one sensor element. Arrays of sensors are also provided. Sensor elements include a functionalized membrane supported over a substrate by a support frame. The functionalized membrane, support frame and substrate together form a vacuum gap. The sensor element is connected to an electrical circuit, which is configured to operate the sensor element at or near an open circuit resonance condition. The mechanical resonance frequency of the functionalized membrane is responsive to binding of an agent to the membrane. Thus, the sensor element also includes a detector, where the detector provides a sensor output responsive to the mechanical resonance frequency of the sensor element.

Abstract: An improved optical photolithography system and method provides predetermined light patterns generated by a direct write system without the use of photomasks. The Direct Write System provides predetermined light patterns projected on the surface of a substrate (e.g., a wafer) by using a computer controlled means for dynamically generating the predetermined light pattern, e.g., a spatial light modulator. Image patterns are stored in a computer and through electronic control of the spatial light modulator directly illuminate the wafer to define a portion of the polymer array, rather than being defined by a pattern on a photomask. Thus, in the Direct Write System each pixel is illuminated with an optical beam of suitable intensity and the imaging (printing) of an individual feature is determined by computer control of the spatial light modulator at each photolithographic step without the use of a photomask.

Abstract: A method for measuring high frequency force of interaction between a tip of a cantilever and a sample includes providing a cantilever having a cantilever arm and a probe tip formed on a free end of the cantilever arm where the cantilever arm has a first shape and an axis of torsion associated with the first shape and the probe tip is positioned in an offset displacement from the axis of torsion, vibrating the cantilever at or near the fundamental flexural resonance frequency with a predetermined oscillation amplitude, bringing the cantilever to the vicinity of the sample, tapping the surface of the sample repeatedly using the probe tip, and detecting changes in the amplitude or the phase of a high frequency vibration harmonic of the cantilever as the cantilever is deflected in response to features on the surface of the sample.

Abstract: A cantilever for the use in atomic force microscopy includes a cantilever arm having a fixed end being attached to a base member and a free end where the cantilever arm has a first shape and an axis of torsion associated with the first shape, and a probe tip projecting from the cantilever arm near the free end where the probe tip is positioned in an offset displacement from the axis of torsion. Alternately, the cantilever arm has a first shape selected to tune a torsional resonance frequency of a selected torsional mode or the fundamental flexural resonance frequency of the fundamental mode so that the torsional resonance frequency and the fundamental flexural resonance frequency has an integer ratio. In this manner, the torsional motion of the torsional harmonic cantilever at that harmonic frequency will be largely enhanced by the corresponding torsional resonance.

Abstract: An improved optical photolithography system and method provides predetermined light patterns generated by a direct write system without the use of photomasks. The Direct Write System provides predetermined light patterns projected on the surface of a substrate (e.g., a wafer) by using a computer controlled means for dynamically generating the predetermined light pattern, e.g., a spatial light modulator. Image patterns are stored in a computer and through electronic control of the spatial light modulator directly illuminate the wafer to define a portion of the polymer array, rather than being defined by a pattern on a photomask. Thus, in the Direct Write System each pixel is illuminated with an optical beam of suitable intensity and the imaging (printing) of an individual feature is determined by computer control of the spatial light modulator at each photolithographic step without the use of a photomask.

Abstract: In one embodiment, fiber optic arrays or bundles are used as a light guide to transmit ultraviolet light to the substrate surface for photo-directed polymer synthesis Digital Micromirror Array (DMA) is used as a switching device to reflect light onto the entry side of the fiber optic array

Abstract: A method of using micromechanical devices as sensors for detecting chemical interactions between naturally occurring bio-polymers which are non-identical binding partners is provided. The method is useful whether the reactions occur through electrostatic forces or other forces. Induced stress, heat, or change in mass is detected where a binding partner is placed on a cantilever for possible reaction with an analyte molecules (i.e., a non-identical binding partner). The method is particularly useful in determining DNA hybridization but may be useful in detecting interaction in any chemical assay.

Abstract: An improved optical photolithography system and method provides predetermined light patterns generated by a direct write system without the use of photomasks. The Direct Write System provides predetermined light patterns projected on the surface of a substrate (e.g., a wafer) by using a computer controlled means for dynamically generating the predetermined light pattern, e.g., a spatial light modulator. Image patterns are stored in a computer and through electronic control of the spatial light modulator directly illuminate the wafer to define a portion of the polymer array, rather than being defined by a pattern on a photomask. Thus, in the Direct Write System each pixel is illuminated with an optical beam of suitable intensity and the imaging (printing) of an individual feature is determined by computer control of the spatial light modulator at each photolithographic step without the use of a photomask.