Abstract: A flow control module includes an inlet hub coupled to a first flow passage having a first flow bore, a flow meter associated with the first flow bore and positioned for top-down fluid flow, a choke disposed in a second flow passage having a second flow bore, the second flow passage coupled to a distal end of the first flow passage, and an outlet hub coupled to a distal end of the second flow passage, the outlet hub facing in a different direction from the inlet hub.

Abstract: An assembly includes an inlet hub (112) coupled to a first flow passage (124) located within a flow control module, the first flow passage having a first flow bore, a flow meter (144) associated with the first flow bore and positioned for top-down fluid flow, a choke (109) disposed in a second flow passage (136) having a second flow bore, and an outlet hub (119) coupled to a distal end of the second flow passage. A system includes a flow control module assembly (902) having an inlet (912) and at least two outlets (914, 916), a main line (920) in fluid communication with the inlet, a first branch line (922) coupled to the main line and to a first outlet (916) of the at least two outlets, and a second branch line (924) coupled to the main line and to a second outlet (914) of the at least two outlets, and a tie-in connector (918) coupled to the inlet of the flow control module assembly.

Abstract: An assembly includes an inlet hub (112) coupled to a first flow passage (124) located within a flow control module, the first flow passage having a first flow bore, a flow meter (144) associated with the first flow bore and positioned for top-down fluid flow, a choke (109) disposed in a second flow passage (136) having a second flow bore, and an outlet hub (119) coupled to a distal end of the second flow passage. A system includes a flow control module assembly (902) having an inlet (912) and at least two outlets (914, 916), a main line (920) in fluid communication with the inlet, a first branch line (922) coupled to the main line and to a first outlet (916) of the at least two outlets, and a second branch line (924) coupled to the main line and to a second outlet (914) of the at least two outlets, and a tie-in connector (918) coupled to the inlet of the flow control module assembly.

Abstract: A flow control module includes an inlet hub coupled to a first flow passage having a first flow bore, a flow meter associated with the first flow bore and positioned for top-down fluid flow, a choke disposed in a second flow passage having a second flow bore, the second flow passage coupled to a distal end of the first flow passage, and an outlet hub coupled to a distal end of the second flow passage, the outlet hub facing in a different direction from the inlet hub.

Abstract: An assembly includes an inlet hub (112) coupled to a first flow passage (124) located within a flow control module, the first flow passage having a first flow bore, a flow meter (144) associated with the first flow bore and positioned for top-down fluid flow, a choke (109) disposed in a second flow passage (136) having a second flow bore, and an outlet hub (119) coupled to a distal end of the second flow passage. A system includes a flow control module assembly (902) having an inlet (912) and at least two outlets (914, 916), a main line (920) in fluid communication with the inlet, a first branch line (922) coupled to the main line and to a first outlet (916) of the at least two outlets, and a second branch line (924) coupled to the main line and to a second outlet (914) of the at least two outlets, and a tie-in connector (918) coupled to the inlet of the flow control module assembly.

Abstract: A flow control module includes an inlet hub coupled to a first flow passage having a first flow bore, a flow meter, and a choke disposed in a second flow passage having a second flow bore, where the second flow passage is coupled to a distal end of the first flow passage. The flow meter is associated with the first flow bore and positioned for top-down fluid flow. The flow control module also includes an outlet hub coupled to a distal end of the second flow passage, where the outlet hub faces in a different direction from the inlet hub.

Abstract: A flow control module includes an inlet hub coupled to a first flow passage having a first flow bore, a flow meter associated with the first flow bore and positioned for top-down fluid flow, a choke disposed in a second flow passage having a second flow bore, the second flow passage coupled to a distal end of the first flow passage, and an outlet hub coupled to a distal end of the second flow passage, the outlet hub facing in a different direction from the inlet hub.

Abstract: An assembly includes an inlet hub (112) coupled to a first flow passage (124) located within a flow control module, the first flow passage having a first flow bore, a flow meter (144) associated with the first flow bore and positioned for top-down fluid flow, a choke (109) disposed in a second flow passage (136) having a second flow bore, and an outlet hub (119) coupled to a distal end of the second flow passage. A system includes a flow control module assembly (902) having an inlet (912) and at least two outlets (914, 916), a main line (920) in fluid communication with the inlet, a first branch line (922) coupled to the main line and to a first outlet (916) of the at least two outlets, and a second branch line (924) coupled to the main line and to a second outlet (914) of the at least two outlets, and a tie-in connector (918) coupled to the inlet of the flow control module assembly.

Abstract: A method for sharing bookmarks by receiving client bookmarks at a server and selectively sharing the client bookmarks with other clients.

Abstract: A method for forming a patterned photosensitive material layer over a substrate is described. A photosensitive material layer is formed on a substrate and then exposed. The selected parameters of the photosensitive material layer or between the photosensitive material layer and the predetermined layer are measured for determining whether the exposed patterns of the photosensitive material layer are acceptable. A development step is performed when the exposed patterns of the photosensitive material layer are found to be acceptable. An apparatus for forming a patterned photosensitive material layer is also described, which utilizes the aforementioned method and has a mechanism capable of feeding back offsets of the measured parameters in real time for reducing the cycle time and the rework time in the lithography process.

Abstract: A method for forming a photoresist pattern is described. A photoresist layer is first formed over a substrate, and then an exposure process and a development process are performed to pattern the photoresist layer so as to form a patterned photoresist layer. Next, a multiple-trimming process is performed to trim the patterned photoresist lay to form a photoresist pattern. The multiple-trimming process includes at least one step of alkaline solution treatment and/or at least one step of neutral solution treatment. The method is applicable for improving properties of smoothness of the surface, and uniformity and minification of critical dimensions of the photoresist patterns.

Abstract: A method for forming a patterned photoresist layer aligned with a predetermined layer is described. A photoresist layer is formed on a substrate and then exposed. The overlay offset between the exposed portions of the photoresist layer and the predetermined layer is measured for determining whether the exposed portions of the photoresist layer are aligned with the predetermined layer. A development step is performed when the exposed portions of the photoresist layer are found to align with the predetermined layer. An apparatus for forming a patterned photoresist layer is also described, which utilizes the aforementioned method and has a mechanism capable of feeding back the overlay offset in real time for reducing the cycle time and the rework time in the lithography process.

Abstract: A method for forming a patterned photoresist layer aligned with a predetermined layer is described. A photoresist layer is formed on a substrate and then exposed. The overlay offset between the exposed portions of the photoresist layer and the predetermined layer is measured for determining whether the exposed portions of the photoresist layer are aligned with the predetermined layer. A development step is performed when the exposed portions of the photoresist layer are found to align with the predetermined layer. An apparatus for forming a patterned photoresist layer is also described, which utilizes the aforementioned method and has a mechanism capable of feeding back the overlay offset in real time for reducing the cycle time and the rework time in the lithography process.

Abstract: A method for forming a patterned photoresist layer aligned with a predetermined layer is described. A photoresist layer is formed on a substrate and then exposed. The overlay offset between the exposed portions of the photoresist layer and the predetermined layer is measured for determining whether the exposed portions of the photoresist layer are aligned with the predetermined layer. A development step is performed when the exposed portions of the photoresist layer are found to align with the predetermined layer. An apparatus for forming a patterned photoresist layer is also described, which utilizes the aforementioned method and has a mechanism capable of feeding back the overlay offset in real time for reducing the cycle time and the rework time in the lithography process.

Abstract: The invention is a mask pattern comprising a first region that is strip-shaped and has two long sides and two short sides, and two second regions that are strip-shaped with each region having two long sides and two short sides, in which the short sides of the second regions are shorter than the sides of the first region, and the second regions extend in a lengthwise direction from the two short sides of the first region, respectively, with the short sides of the second regions adjacent to the short sides of the first region. The mask pattern is used to define a floating gate region in a flash memory.

Abstract: A method for fabricating poly-spacers used in a semiconductor substrate, comprising: forming an undoped first polysilicon layer on the semiconductor substrate; performing a first ion implantation with a first angle to implant impurities into the first polysilicon layer; performing a second ion implantation with a second angle to implant the impurities into the first polysilicon layer; forming a second polysilicon layer on the first polysilicon layer; and etching the first polysilicon layer and the second polysilicon layer to form spacers.