Patents by Inventor Cam V. Endicott

Cam V. Endicott has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Technology migration for integrated circuits with radical design restrictions
    Patent number: 8464189
    Abstract: A method, system and program product for migrating an integrated circuit (IC) design from a source technology without radical design restrictions (RDR) to a target technology with RDR, are disclosed. The invention implements a minimum layout perturbation approach that addresses the RDR requirements. The invention also solves the problem of inserting dummy shapes where required, and extending the lengths of the critical shapes and/or the dummy shapes to meet ‘edge coverage’ requirements.
    Type: Grant
    Filed: March 18, 2010
    Date of Patent: June 11, 2013
    Assignee: International Business Machines Corporation
    Inventors: Robert J. Allen, Cam V. Endicott, Fook-Luen Heng, Jason D. Hibbeler, Kevin W. McCullen, Rani Narayan, Robert F. Walker, Xin Yuan
  • TECHNOLOGY MIGRATION FOR INTEGRATED CIRCUITS WITH RADICAL DESIGN RESTRICTIONS
    Publication number: 20100185997
    Abstract: A method, system and program product for migrating an integrated circuit (IC) design from a source technology without radical design restrictions (RDR) to a target technology with RDR, are disclosed. The invention implements a minimum layout perturbation approach that addresses the RDR requirements. The invention also solves the problem of inserting dummy shapes where required, and extending the lengths of the critical shapes and/or the dummy shapes to meet ‘edge coverage’ requirements.
    Type: Application
    Filed: March 18, 2010
    Publication date: July 22, 2010
    Applicant: International Business Machines Corporation
    Inventors: Robert J. Allen, Cam V. Endicott, Fook-Luen Heng, Jason D. Hibbeler, Kevin W. McCullen, Rani Narayan, Robert F. Walker, Xin Yuan
  • Technology migration for integrated circuits with radical design restrictions
    Patent number: 7761821
    Abstract: A method, system and program product for migrating an integrated circuit (IC) design from a source technology without radical design restrictions (RDR) to a target technology with RDR, are disclosed. The invention implements a minimum layout perturbation approach that addresses the RDR requirements. The invention also solves the problem of inserting dummy shapes where required, and extending the lengths of the critical shapes and/or the dummy shapes to meet ‘edge coverage’ requirements.
    Type: Grant
    Filed: August 13, 2007
    Date of Patent: July 20, 2010
    Assignee: International Business Machines Corporation
    Inventors: Robert J. Allen, Cam V. Endicott, Fook-Luen Heng, Jason D. Hibbeler, Kevin W. McCullen, Rani Narayan, Robert F. Walker, Xin Yuan
  • Technology migration for integrated circuits with radical design restrictions
    Patent number: 7610565
    Abstract: A method, system and program product for migrating an integrated circuit (IC) design from a source technology without radical design restrictions (RDR) to a target technology with RDR, are disclosed. Also, a method, system and program product for migrating an integrated circuit design from a source technology without RDR to a target technology with RDR in which space may be reserved for late insertion of a feature and in which migration first occurs in a primary compaction direction having less tolerant ground rules.
    Type: Grant
    Filed: April 9, 2007
    Date of Patent: October 27, 2009
    Assignee: International Business Machines Corporation
    Inventors: Robert J. Allen, Cam V. Endicott, Fook-Luen Heng, Jason D. Hibbeler, Kevin W. McCullen, Rani Narayan, Robert F. Walker, Xin Yuan
  • Technology migration for integrated circuits with radical design restrictions
    Patent number: 7302651
    Abstract: A method, system and program product for migrating an integrated circuit (IC) design from a source technology without radical design restrictions (RDR) to a target technology with RDR, are disclosed. The invention implements a minimum layout perturbation approach that addresses the RDR requirements. The invention also solves the problem of inserting dummy shapes where required, and extending the lengths of the critical shapes and/or the dummy shapes to meet ‘edge coverage’ requirements.
    Type: Grant
    Filed: October 29, 2004
    Date of Patent: November 27, 2007
    Assignee: International Business Machines Corporation
    Inventors: Robert J. Allen, Cam V. Endicott, Fook-Luen Heng, Jason D. Hibbeler, Kevin W. McCullen, Rani Narayan, Robert F. Walker, Xin Yuan
  • Technology migration for integrated circuits with radical design restrictions
    Patent number: 7257783
    Abstract: A method, system and program product for migrating an integrated circuit (IC) design from a source technology without radical design restrictions (RDR) to a target technology with RDR, are disclosed. Also, a method, system and program product for migrating an integrated circuit design from a source technology without RDR to a target technology with RDR in which space may be reserved for late insertion of a feature and in which migration first occurs in a primary compaction direction having less tolerant ground rules.
    Type: Grant
    Filed: December 9, 2004
    Date of Patent: August 14, 2007
    Assignee: International Business Machines Corporation
    Inventors: Robert J. Allen, Cam V. Endicott, Fook-Luen Heng, Jason D. Hibbeler, Kevin W. McCullen, Rani Narayan, Robert F. Walker, Xin Yuan