Patents by Inventor Cameron James Brooks

Cameron James Brooks has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6858357
    Abstract: An attenuating embedded phase shift photomask blank that produces a phase shift of the transmitted light is formed with an optically translucent film made of metal, silicon, nitrogen or metal, silicon, nitrogen and oxygen. A wide range of optical transmission (0.001% up to 20% at 193 nm) is obtained by this process. A post deposition process is implemented to obtain the desired properties (stability of optical properties with respect to laser irradiation and acid treatment) for use in industry. A special fabrication process for the sputter target is implemented to lower the defects of the film.
    Type: Grant
    Filed: September 8, 2003
    Date of Patent: February 22, 2005
    Assignee: International Business Machines Corporation
    Inventors: Marie Angelopoulos, Katherina E. Babich, Cameron James Brooks, S. Jay Chey, C. Richard Guarnieri, Michael Straight Hibbs, Kenneth Christopher Racette
  • Publication number: 20040053026
    Abstract: An attenuating embedded phase shift photomask blank that produces a phase shift of the transmitted light is formed with an optically translucent film made of metal, silicon, nitrogen or metal, silicon, nitrogen and oxygen. A wide range of optical transmission (0.001% up to 20% at 193 nm) is obtained by this process. A post deposition process is implemented to obtain the desired properties (stability of optical properties with respect to laser irradiation and acid treatment) for use in industry. A special fabrication process for the sputter target is implemented to lower the defects of the film.
    Type: Application
    Filed: September 8, 2003
    Publication date: March 18, 2004
    Inventors: Marie Angelopoulos, Katherina E. Babich, Cameron James Brooks, S. Jay Chey, C. Richard Guarnieri, Michael Straight Hibbs, Kenneth Christopher Racette
  • Patent number: 6653027
    Abstract: An attenuating embedded phase shift photomask blank that produces a phase shift of the transmitted light is formed with an optically translucent film made of metal, silicon, nitrogen or metal, silicon, nitrogen and oxygen. A wide range of optical transmission (0.001% up to 20% at 193 nm) is obtained by this process. A post deposition process is implemented to obtain the desired properties (stability of optical properties with respect to laser irradiation and acid treatment) for use in industry. A special fabrication process for the sputter target is implemented to lower the defects of the film.
    Type: Grant
    Filed: February 26, 2001
    Date of Patent: November 25, 2003
    Assignee: International Business Machines Corporation
    Inventors: Marie Angelopoulos, Katherina E. Babich, Cameron James Brooks, S. Jay Chey, C. Richard Guarnieri, Michael Straight Hibbs, Kenneth Christopher Racette
  • Publication number: 20020119378
    Abstract: An attenuating embedded phase shift photomask blank that produces a phase shift of the transmitted light is formed with an optically translucent film made of metal, silicon, nitrogen or metal, silicon, nitrogen and oxygen. A wide range of optical transmission (0.001% up to 20% at 193 nm) is obtained by this process. A post deposition process is implemented to obtain the desired properties (stability of optical properties with respect to laser irradiation and acid treatment) for use in industry. A special fabrication process for the sputter target is implemented to lower the defects of the film.
    Type: Application
    Filed: February 26, 2001
    Publication date: August 29, 2002
    Inventors: Marie Angelopoulos, Katherina E. Babich, Cameron James Brooks, S. Jay Chey, C. Richard Guarnieri, Michael Straight Hibbs, Kenneth Christopher Racette