Patents by Inventor Cameron S. Gross

Cameron S. Gross has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Hard-mask etch process
    Publication number: 20020072225
    Abstract: A method is described for forming a patterned polysilicon, amorphous, or single crystal silicon layer. The method comprises forming a consumable mask (50, 60) that is simultaneously removed while etching the underlying film (30).
    Type: Application
    Filed: September 28, 2001
    Publication date: June 13, 2002
    Inventors: Reima T. Laaksonen, Freidoon Mehrad, Cameron S. Gross