Patents by Inventor Carina Sacha C.S. Snijder

Carina Sacha C.S. Snijder has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process for removing residual spin solvent from a gel spun filament, the filament, multi-filament yarn and products comprising the filament
    Patent number: 9260801
    Abstract: Process for removing residual spin solvent from a gel spun, UHMwPE filament having an effective diameter of above 16 ?m, comprising the steps of: removing residual spin solvent from the filament to a level of below 100 ppm at elevated temperature, while keeping the filament taut. The invention also relates to gel spun UHMwPE filament having an effective diameter of above 16 ?m and a residual spin solvent residue of less than 100 ppm. Preferably the filament has a creep rate, measured at 50° C., under a load, so that the initial stress is 600 MPa, of less than 510?6 sec?1.
    Type: Grant
    Filed: March 21, 2008
    Date of Patent: February 16, 2016
    Assignee: DSM IP ASSETS B.V.
    Inventors: Roelof R. Marissen, Claudia Maria C. M. Vaz, Carina Sacha C. S. Snijder, Joseph Arnold Paul Maria J A P M Simmelink, Leonard Josef Arnold L. J. A. Nielaba
  • PROCESS FOR REMOVING RESIDUAL SPIN SOLVENT FROM A GEL SPUN FILAMENT, THE FILAMENT, MULTI-FILAMENT YARN AND PRODUCTS COMPRISING THE FILAMENT
    Publication number: 20100086781
    Abstract: Process for removing residual spin solvent from a gel spun, UHMwPE filament having an effective diameter of above 16 ?m, comprising the steps of: removing residual spin solvent from the filament to a level of below 100 ppm at elevated temperature, while keeping the filament taut. The invention also relates to gel spun UHMwPE filament having an effective diameter of above 16 ?m and a residual spin solvent residue of less than 100 ppm. Preferably the filament has a creep rate, measured at 50° C., under a load, so that the initial stress is 600 MPa, of less than 510?6 sec?1.
    Type: Application
    Filed: March 21, 2008
    Publication date: April 8, 2010
    Inventors: Roelof R. Marissen, Claudia Maria C.M. Vaz, Carina Sacha C.S. Snijder, Joseph Arnold Paul Maria Japm Simmelink, Leonard Josef Arnold L.J.A. Nielaba