Abstract: A combination retainer and electrical contact mechanism for a deposition monitor sensor includes a sensor body and a removable flexible electrical contact spanning between a fixed electrical (contact) element in the sensor's body and one face of an associated monitor crystal. A retainer insulates or insures electrical isolation of the spanning electrical contact from unwanted contact to electrically grounded components in which at least one of the retainer and crystal holder include features that maintain the electrical contact with the retainer in order to provide a single mechanism.

Abstract: An apparatus for monitoring and detecting material deposited onto a substrate during a deposition process in a processing chamber includes a storage structure having a primary axis extending between respective first and second ends and an exterior lateral surface between the first and second ends extending about the primary axis. A plurality of monitor crystals are supported by the storage structure at spaced positions along said exterior lateral surface and in which a drive mechanism advances the storage structure rotatably and axially relative to the primary axis such that at least one monitor crystal is advanced or retracted relative to at least one measuring position. A retained crystal that is advanced to the measuring position can be electrically connected, using a brush contact or other mechanism, in order to excite the crystal using a resonance circuit.

Abstract: A combination retainer and electrical contact mechanism for a deposition monitor sensor includes a sensor body and a removable flexible electrical contact spanning between a fixed electrical (contact) element in the sensor's body and one face of an associated monitor crystal. A retainer insulates or insures electrical isolation of the spanning electrical contact from unwanted contact to electrically grounded components in which at least one of the retainer and crystal holder include features that maintain the electrical contact with the retainer in order to provide a single mechanism.

Abstract: A method of determining the reaction efficiency of a CVD process reactor by which a reactive gas combination entering the reactor deposits a solid reaction product as a thin film onto a substrate. The composition of the reactive gas combination is measured by an acoustic cell which is disposed downstream from the outlet port of the reactor to determine the reactor's efficiency. Determination of the reactor's efficiency allows the growth rate of the thin film to be determined as well as associated rates of the products which have been exhausted from the reactor.

Abstract: Method and apparatus for monitoring the deposition of a material or materials upon a substrate using atomic absorption techniques. Radiant energy is directed through a flow of evaporant during a deposition process. The radiation contains spectral emission lines absorbable by the evaporant as well as emission lines not absorbable by the evaporant. Changes in the transmission of one or more non-absorbable lines are used to compensate for changes in the absorption of absorbable lines of interest that are caused by misalignment or displacement of the optical elements during the deposition process.