Abstract: A substrate gripping system includes a plunger body actuatable by an actuator and a gripper at a distal end of the plunger body. The gripper is configured to grip a substrate responsive to actuation of the plunger body by the actuator. The system further includes a sensor configured to measure a value of a parameter associated with actuation of the plunger body and a controller configured to cause the actuator to actuate the plunger body based at least partially on the value of the parameter measured by the sensor.

Abstract: A system includes an enclosure configured to couple to an equipment front end module (EFEM) of a substrate processing system, a charging assembly, and one or more support structures within the enclosure. The one or more support structures are configured to support a validation wafer in a charging position to charge the validation wafer via the charging assembly.

Abstract: A system includes an enclosure configured to couple to an equipment front end module (EFEM) of a substrate processing system, a charging assembly, and one or more support structures within the enclosure. The one or more support structures are configured to support a validation wafer in a charging position to charge the validation wafer via the charging assembly.

Abstract: An enclosure system includes multiple walls forming an interior volume. The enclosure system is configured to couple to an equipment front end module (EFEM) of a substrate processing system. The enclosure system further includes a charging assembly including a first charging coil. The enclosure system further includes one or more first support structures disposed within the interior volume under the first charging coil. The one or more first support structures are configured to support a first validation wafer within a threshold distance of the first charging coil to charge the first validation wafer via the charging assembly.

Abstract: An enclosure system includes multiple walls forming an interior volume. The enclosure system is configured to couple to an equipment front end module (EFEM) of a substrate processing system. The enclosure system further includes a charging assembly including a first charging coil. The enclosure system further includes one or more first support structures disposed within the interior volume under the first charging coil. The one or more first support structures are configured to support a first validation wafer within a threshold distance of the first charging coil to charge the first validation wafer via the charging assembly.

Abstract: According to certain aspects of the present disclosure, a semiconductor die includes a decoupling capacitor between a first interconnect metal layer and a second interconnect metal layer of the die, a first supply rail formed from the second interconnect metal layer, and a resistive metal path coupled between the decoupling capacitor and the first supply rail. The decoupling capacitor may be a metal-insulator-metal (MIM) capacitor. In some embodiments, the resistive metal path includes a plurality of elongated segments, and one or more connecting segments, wherein each of the one or more connecting segments electrically couples a respective pair of the plurality of elongated segments. In some embodiments, the resistive metal path includes multiple vias coupled in series.

Abstract: According to certain aspects of the present disclosure, a semiconductor die includes a decoupling capacitor between a first interconnect metal layer and a second interconnect metal layer of the die, a first supply rail formed from the second interconnect metal layer, and a resistive metal path coupled between the decoupling capacitor and the first supply rail. The decoupling capacitor may be a metal-insulator-metal (MIM) capacitor. In some embodiments, the resistive metal path includes a plurality of elongated segments, and one or more connecting segments, wherein each of the one or more connecting segments electrically couples a respective pair of the plurality of elongated segments. In some embodiments, the resistive metal path includes multiple vias coupled in series.

Abstract: A workpiece orientation is determined by camera during transfer to a load lock, and the orientation is corrected during load lock pump down.

Abstract: A workpiece orientation is determined by camera during transfer to a load lock, and the orientation is corrected during load lock pump down.