Abstract: A surgical microscope for visualizing a tissue region contains an illumination device with a light source and an illumination beam path for illuminating an object region with an object plane and an observation device having an observation beam path for imaging the object region with the object plane into an observation plane. A first polarizer can be coupled into the illumination beam path and is suitable for polarizing the illumination light in a first orientation. A polarizer, which can be coupled into the observation beam path, has a second orientation at an angle between 80° and 100° relative to the first orientation. In a first mode, the light source emits illumination light in a first wavelength range between 450 nm and 550 nm, the first polarizer is coupled into the illumination beam path, and the second polarizer is coupled into the observation beam path.

Abstract: A surgical microscope for visualizing a tissue region contains an illumination device with a light source and an illumination beam path for illuminating an object region with an object plane and an observation device having an observation beam path for imaging the object region with the object plane into an observation plane. A first polarizer can be coupled into the illumination beam path and is suitable for polarizing the illumination light in a first orientation. A polarizer, which can be coupled into the observation beam path, has a second orientation at an angle between 80° and 100° relative to the first orientation. In a first mode, the light source emits illumination light in a first wavelength range between 450 nm and 550 nm, the first polarizer is coupled into the illumination beam path, and the second polarizer is coupled into the observation beam path.

Abstract: Presented herein is an optical filter system for visible light, which has a first average transmittance T1 between a limit wavelength ?G and a wavelength of 700 nm and a second average transmittance T2 between a wavelength of 380 nm and the limit wavelength ?G. In this case: 410 nm<?G<520 nm and 0.05 < T 1 T 2 < 0.60 .

Abstract: A surgical microscope for visualizing a tissue region contains an illumination device with a light source and an illumination beam path for illuminating an object region with an object plane and an observation device having an observation beam path for imaging the object region with the object plane into an observation plane. A first polarizer can be coupled into the illumination beam path and is suitable for polarizing the illumination light in a first orientation. A polarizer, which can be coupled into the observation beam path, has a second orientation at an angle between 80° and 100° relative to the first orientation. In a first mode, the light source emits illumination light in a first wavelength range between 450 nm and 550 nm, the first polarizer is coupled into the illumination beam path, and the second polarizer is coupled into the observation beam path.

Abstract: Presented herein is an optical filter system for visible light, which has a first average transmittance T1 between a limit wavelength ?G and a wavelength of 700 nm and a second average transmittance T2 between a wavelength of 380 nm and the limit wavelength ?G. In this case: 410 nm<?G<520 nm and 0.05 < T 1 T 2 < 0.60 .

Abstract: A processing system for forming a cross-section of an object. The processing system comprises a focused ion beam system for forming the cross-section from a pre-prepared surface region of the object and a laser and a light optical system for forming the pre-prepared surface region by laser ablation of a processing region of the object with a first and a second laser beam. The light optical system is configured to direct the first and the second laser beams onto common impingement locations of a common scanning line in the processing region for scanning the first laser beam and for scanning the second laser beam. For each of the impingement locations, an angle between a first incidence direction along an axis of the first laser beam and a second incidence direction along an axis of the second laser beam is greater than 10 degrees, measured in a stationary coordinate system.

Abstract: A process of preparing a lamella from a substrate includes manufacturing a protection strip on an edge portion of the lamella to be prepared from the substrate, and preparing the lamella, wherein the manufacturing the protection strip includes a first phase of activating a surface area portion of the substrate, and a second phase of electron beam assisted deposition of the protective strip on the activated surface area portion from the gas phase.

Abstract: A process of preparing a lamella from a substrate includes manufacturing a protection strip on an edge portion of the lamella to be prepared from the substrate, and preparing the lamella, wherein the manufacturing the protection strip includes a first phase of activating a surface area portion of the substrate, and a second phase of electron beam assisted deposition of the protective strip on the activated surface area portion from the gas phase.

Abstract: A processing system for forming a cross-section of an object. The processing system comprises a focused ion beam system for forming the cross-section from a pre-prepared surface region of the object and a laser and a light optical system for forming the pre-prepared surface region by laser ablation of a processing region of the object with a first and a second laser beam. The light optical system is configured to direct the first and the second laser beams onto common impingement locations of a common scanning line in the processing region for scanning the first laser beam and for scanning the second laser beam.

Abstract: A process of preparing a lamella from a substrate includes manufacturing a protection strip on an edge portion of the lamella to be prepared from the substrate, and preparing the lamella, wherein the manufacturing the protection strip includes a first phase of activating a surface area portion of the substrate, and a second phase of electron beam assisted deposition of the protective strip on the activated surface area portion from the gas phase.

Abstract: A process of preparing a lamella from a substrate includes manufacturing a protection strip on an edge portion of the lamella to be prepared from the substrate, and preparing the lamella, wherein the manufacturing the protection strip includes a first phase of activating a surface area portion of the substrate, and a second phase of electron beam assisted deposition of the protective strip on the activated surface area portion from the gas phase.

Abstract: A process of preparing a lamella from a substrate includes manufacturing a protection strip on an edge portion of the lamella to be prepared from the substrate, and preparing the lamella, wherein the manufacturing the protection strip includes a first phase of activating a surface area portion of the substrate, and a second phase of electron beam assisted deposition of the protective strip on the activated surface area portion from the gas phase.