Patents by Inventor Carl L. White

Carl L. White has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9593416
    Abstract: A precursor source vessel comprises a vessel body, a passage within the vessel body, and a valve attached to a surface of the body. An internal chamber is adapted to contain a chemical reactant, and the passage extends from outside the body to the chamber. The valve regulates flow through the passage. The vessel has inlet and outlet valves, and optionally a vent valve for venting internal gas. An external gas panel can include at least one valve fluidly interposed between the outlet valve and a substrate reaction chamber. Gas panel valves can each be positioned along a plane that is generally parallel to, and no more than about 10.0 cm from, a flat surface of the vessel. Filters in a vessel lid or wall filter gas flow through the vessel's valves. A quick-connection assembly allows fast and easy connection of the vessel to a gas panel.
    Type: Grant
    Filed: February 24, 2012
    Date of Patent: March 14, 2017
    Assignee: ASM AMERICA, INC.
    Inventors: Kyle Fondurulia, Eric Shero, Mohith E. Verghese, Carl L. White
  • Publication number: 20160281232
    Abstract: A device for performing ALD includes a housing having a vacuum chamber that surrounds a horizontal flow reactor. The device further includes a gas distribution system for delivering gases to the reactor. The gas distribution system includes at least one of a high temperature valve and a high temperature filter disposed inside the vacuum chamber. The high temperature valve (and/or filter) controls (and/or filters) a supply of a precursor/reactant gas, inert gas, or precursor/reactant and inert gas mixture before it enters the horizontal flow reactor.
    Type: Application
    Filed: June 8, 2016
    Publication date: September 29, 2016
    Inventors: Carl L. White, Eric Shero
  • Patent number: 9394608
    Abstract: A reactor having a housing that encloses a gas delivery system operatively connected to a reaction chamber and an exhaust assembly. The gas delivery system includes a plurality of gas lines for providing at least one process gas to the reaction chamber. The gas delivery system further includes a mixer for receiving the at least one process gas. The mixer is operatively connected to a diffuser that is configured to diffuse process gases. The diffuser is attached directly to an upper surface of the reaction chamber, thereby forming a diffuser volume therebetween. The diffuser includes at least one distribution surface that is configured to provide a flow restriction to the process gases as they pass through the diffuser volume before being introduced into the reaction chamber.
    Type: Grant
    Filed: April 5, 2010
    Date of Patent: July 19, 2016
    Assignee: ASM America, Inc.
    Inventors: Eric Shero, Mohith E. Verghese, Carl L. White, Herbert Terhorst, Dan Maurice
  • Patent number: 9388492
    Abstract: A device for performing ALD includes a housing having a vacuum chamber that surrounds a horizontal flow reactor. The device further includes a gas distribution system for delivering gases to the reactor. The gas distribution system includes at least one of a high temperature valve and a high temperature filter disposed inside the vacuum chamber. The high temperature valve (and/or filter) controls (and/or filters) a supply of a precursor/reactant gas, inert gas, or precursor/reactant and inert gas mixture before it enters the horizontal flow reactor.
    Type: Grant
    Filed: December 27, 2011
    Date of Patent: July 12, 2016
    Assignee: ASM AMERICA, INC.
    Inventors: Carl L. White, Eric Shero
  • Patent number: 8986456
    Abstract: A precursor source vessel for providing vaporized precursor to a reaction chamber is provided. The precursor source vessel includes a lid having a first port, a second port, and a third port. The precursor source vessel also includes a base removably attached to the lid. The base includes a recessed region formed therein. One of the first, second, and third ports is a burp port configured to relieve the head pressure within the source vessel after the source vessel is installed but prior to use of the source vessel in semiconductor processing.
    Type: Grant
    Filed: April 19, 2010
    Date of Patent: March 24, 2015
    Assignee: ASM America, Inc.
    Inventors: Kyle Fondurulia, Eric Shero, Mohith E. Verghese, Carl L. White
  • Publication number: 20130232866
    Abstract: Disclosed herein are photobioreactor systems for high productivity aquaculture or aquafarming for growing of algae or other organisms in an aquatic environment featuring aspects that favor improved growth rates by achieving control over the contents of the growth medium, including carbon source, nitrogen source, and essential trace elements necessary for growth.
    Type: Application
    Filed: January 29, 2013
    Publication date: September 12, 2013
    Applicant: HELIAE DEVELOPMENT, LLC
    Inventors: Jason D. LICAMELE, Carl L. WHITE
  • Publication number: 20130160709
    Abstract: A device for performing ALD includes a housing having a vacuum chamber that surrounds a horizontal flow reactor. The device further includes a gas distribution system for delivering gases to the reactor. The gas distribution system includes at least one of a high temperature valve and a high temperature filter disposed inside the vacuum chamber. The high temperature valve (and/or filter) controls (and/or filters) a supply of a precursor/reactant gas, inert gas, or precursor/reactant and inert gas mixture before it enters the horizontal flow reactor.
    Type: Application
    Filed: December 27, 2011
    Publication date: June 27, 2013
    Applicant: ASM AMERICA, INC.
    Inventors: Carl L. White, Eric Shero
  • Patent number: 8365462
    Abstract: Disclosed herein are photobioreactor systems for high productivity aquaculture or aquafarming for growing of algae or other organisms in an aquatic environment featuring aspects that favor improved growth rates by achieving control over the contents of the growth medium, including carbon source, nitrogen source, and essential trace elements necessary for growth.
    Type: Grant
    Filed: May 31, 2011
    Date of Patent: February 5, 2013
    Assignee: Heliae Development, LLC
    Inventors: Jason D. Licamele, Carl L. White
  • Patent number: 8341877
    Abstract: Disclosed herein are photobioreactor systems for high productivity aquaculture or aquafarming for growing of algae or other organisms in an aquatic environment featuring aspects that favor improved growth rates by achieving control over the contents of the growth medium, including carbon source, nitrogen source, and essential trace elements necessary for growth.
    Type: Grant
    Filed: September 30, 2011
    Date of Patent: January 1, 2013
    Assignee: Heliae Development, LLC
    Inventors: Jason D. Licamele, Carl L. White
  • Patent number: 8216380
    Abstract: A semiconductor processing apparatus includes a reaction chamber, a movable susceptor, a movement element, and a control system. The reaction chamber includes a baseplate. The baseplate includes an opening. The movable susceptor is configured to hold a workpiece. The movable element is configured to move a workpiece held on the susceptor towards the opening of the baseplate. The control system is configured to space the susceptor from the baseplate by an unsealed gap during processing of a workpiece in the reaction chamber. Purge gases may flow through the gap into the reaction chamber. Methods of maintaining the gap during processing include calibrating the height of pads and capacitance measurements when the susceptor is spaced from the baseplate.
    Type: Grant
    Filed: January 8, 2009
    Date of Patent: July 10, 2012
    Assignee: ASM America, Inc.
    Inventors: Carl L. White, Eric Shero, Joe Reed
  • Publication number: 20120156108
    Abstract: A precursor source vessel comprises a vessel body, a passage within the vessel body, and a valve attached to a surface of the body. An internal chamber is adapted to contain a chemical reactant, and the passage extends from outside the body to the chamber. The valve regulates flow through the passage. The vessel has inlet and outlet valves, and optionally a vent valve for venting internal gas. An external gas panel can include at least one valve fluidly interposed between the outlet valve and a substrate reaction chamber. Gas panel valves can each be positioned along a plane that is generally parallel to, and no more than about 10.0 cm from, a flat surface of the vessel. Filters in a vessel lid or wall filter gas flow through the vessel's valves. A quick-connection assembly allows fast and easy connection of the vessel to a gas panel.
    Type: Application
    Filed: February 24, 2012
    Publication date: June 21, 2012
    Applicant: ASM AMERICA, INC.
    Inventors: KYLE FONDURULIA, Eric Shero, Mohith E. Verghese, Carl L. White
  • Patent number: 8137462
    Abstract: A precursor source vessel comprises a vessel body, a passage within the vessel body, and a valve attached to a surface of the body. An internal chamber is adapted to contain a chemical reactant, and the passage extends from outside the body to the chamber. The valve regulates flow through the passage. The vessel has inlet and outlet valves, and optionally a vent valve for venting internal gas. An external gas panel can include at least one valve fluidly interposed between the outlet valve and a substrate reaction chamber. Gas panel valves can each be positioned along a plane that is generally parallel to, and no more than about 10.0 cm from, a flat surface of the vessel. Filters in a vessel lid or wall filter gas flow through the vessel's valves. A quick-connection assembly allows fast and easy connection of the vessel to a gas panel.
    Type: Grant
    Filed: October 10, 2007
    Date of Patent: March 20, 2012
    Assignee: ASM America, Inc.
    Inventors: Kyle Fondurulia, Eric Shero, Mohith E Verghese, Carl L White
  • Publication number: 20120064508
    Abstract: Disclosed herein are photobioreactor systems for high productivity aquaculture or aquafarming for growing of algae or other organisms in an aquatic environment featuring aspects that favor improved growth rates by achieving control over the contents of the growth medium, including carbon source, nitrogen source, and essential trace elements necessary for growth.
    Type: Application
    Filed: September 30, 2011
    Publication date: March 15, 2012
    Applicant: Heliae Development, LLC
    Inventors: Jason D. Licamele, Carl L. White
  • Publication number: 20110258920
    Abstract: Disclosed herein are photobioreactor systems for high productivity aquaculture or aquafarming for growing of algae or other organisms in an aquatic environment featuring aspects that favor improved growth rates by achieving control over the contents of the growth medium, including carbon source, nitrogen source, and essential trace elements necessary for growth.
    Type: Application
    Filed: May 31, 2011
    Publication date: October 27, 2011
    Inventors: Jason D. LICAMELE, Carl L. WHITE
  • Publication number: 20100322604
    Abstract: A precursor source vessel for providing vaporized precursor to a reaction chamber is provided. The precursor source vessel includes a lid having a first port, a second port, and a third port. The precursor source vessel also includes a base removably attached to the lid. The base includes a recessed region formed therein. One of the first, second, and third ports is a burp port configured to relieve the head pressure within the source vessel after the source vessel is installed but prior to use of the source vessel in semiconductor processing.
    Type: Application
    Filed: April 19, 2010
    Publication date: December 23, 2010
    Inventors: Kyle Fondurulia, Eric Shero, Mohith E. Verghese, Carl L. White
  • Publication number: 20100307415
    Abstract: A reactor having a housing that encloses a gas delivery system operatively connected to a reaction chamber and an exhaust assembly. The gas delivery system includes a plurality of gas lines for providing at least one process gas to the reaction chamber. The gas delivery system further includes a mixer for receiving the at least one process gas. The mixer is operatively connected to a diffuser that is configured to diffuse process gases. The diffuser is attached directly to an upper surface of the reaction chamber, thereby forming a diffuser volume therebetween. The diffuser includes at least one distribution surface that is configured to provide a flow restriction to the process gases as they pass through the diffuser volume before being introduced into the reaction chamber. The reaction chamber defines a reaction space in which a semiconductor substrate is disposed for processing.
    Type: Application
    Filed: April 5, 2010
    Publication date: December 9, 2010
    Inventors: Eric Shero, Mohith E. Verghese, Carl L. White, Herbert Terhorst, Dan Maurice
  • Publication number: 20100266765
    Abstract: An apparatus and method of growing a thin film onto a substrate comprises placing a substrate in a reaction chamber and subjecting the substrate to surface reactions of a plurality of vapor-phase reactants according to the ALD method. Non-fully closing valves are placed into the reactant feed conduit and backsuction conduit of an ALD system. The non-fully closed valves are operated such that one valve is open and the other valve is closed during the purge or pulse cycle of the ALD process.
    Type: Application
    Filed: April 21, 2009
    Publication date: October 21, 2010
    Inventors: Carl L. White, Eric J. Shero
  • Publication number: 20100173432
    Abstract: A semiconductor processing apparatus includes a reaction chamber, a movable susceptor, a movement element, and a control system. The reaction chamber includes a baseplate. The baseplate includes an opening. The movable susceptor is configured to hold a workpiece. The movable element is configured to move a workpiece held on the susceptor towards the opening of the baseplate. The control system is configured to space the susceptor from the baseplate by an unsealed gap during processing of a workpiece in the reaction chamber. Purge gases may flow through the gap into the reaction chamber. Methods of maintaining the gap during processing include calibrating the height of pads and capacitance measurements when the susceptor is spaced from the baseplate.
    Type: Application
    Filed: January 8, 2009
    Publication date: July 8, 2010
    Applicant: ASM America, Inc.
    Inventors: Carl L. White, Eric Shero, Joe Reed
  • Patent number: 7595271
    Abstract: Described herein is an apparatus useful for depositing a material on a substrate. At least one component of the apparatus comprises a protective coating, which facilitates the cleaning and/or removal of the deposited material from the component. Also described are methods for depositing a material on a substrate using the disclosed apparatus, for fabricating the apparatus, and for cleaning the apparatus.
    Type: Grant
    Filed: December 1, 2006
    Date of Patent: September 29, 2009
    Assignee: ASM America, Inc.
    Inventor: Carl L. White
  • Patent number: D614153
    Type: Grant
    Filed: April 6, 2009
    Date of Patent: April 20, 2010
    Assignee: ASM America, Inc.
    Inventors: Kyle Fondurulia, Eric J Shero, Mohith Verghese, Carl L White