Patents by Inventor Carl L. White
Carl L. White has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11208722Abstract: A device for performing ALD includes a housing having a vacuum chamber that surrounds a horizontal flow reactor. The device further includes a gas distribution system for delivering gases to the reactor. The gas distribution system includes at least one of a high temperature valve and a high temperature filter disposed inside the vacuum chamber. The high temperature valve (and/or filter) controls (and/or filters) a supply of a precursor/reactant gas, inert gas, or precursor/reactant and inert gas mixture before it enters the horizontal flow reactor.Type: GrantFiled: June 8, 2016Date of Patent: December 28, 2021Assignee: ASM IP HOLDING B.V.Inventors: Carl L. White, Eric Shero
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Patent number: 9593416Abstract: A precursor source vessel comprises a vessel body, a passage within the vessel body, and a valve attached to a surface of the body. An internal chamber is adapted to contain a chemical reactant, and the passage extends from outside the body to the chamber. The valve regulates flow through the passage. The vessel has inlet and outlet valves, and optionally a vent valve for venting internal gas. An external gas panel can include at least one valve fluidly interposed between the outlet valve and a substrate reaction chamber. Gas panel valves can each be positioned along a plane that is generally parallel to, and no more than about 10.0 cm from, a flat surface of the vessel. Filters in a vessel lid or wall filter gas flow through the vessel's valves. A quick-connection assembly allows fast and easy connection of the vessel to a gas panel.Type: GrantFiled: February 24, 2012Date of Patent: March 14, 2017Assignee: ASM AMERICA, INC.Inventors: Kyle Fondurulia, Eric Shero, Mohith E. Verghese, Carl L. White
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Publication number: 20160281232Abstract: A device for performing ALD includes a housing having a vacuum chamber that surrounds a horizontal flow reactor. The device further includes a gas distribution system for delivering gases to the reactor. The gas distribution system includes at least one of a high temperature valve and a high temperature filter disposed inside the vacuum chamber. The high temperature valve (and/or filter) controls (and/or filters) a supply of a precursor/reactant gas, inert gas, or precursor/reactant and inert gas mixture before it enters the horizontal flow reactor.Type: ApplicationFiled: June 8, 2016Publication date: September 29, 2016Inventors: Carl L. White, Eric Shero
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Patent number: 9394608Abstract: A reactor having a housing that encloses a gas delivery system operatively connected to a reaction chamber and an exhaust assembly. The gas delivery system includes a plurality of gas lines for providing at least one process gas to the reaction chamber. The gas delivery system further includes a mixer for receiving the at least one process gas. The mixer is operatively connected to a diffuser that is configured to diffuse process gases. The diffuser is attached directly to an upper surface of the reaction chamber, thereby forming a diffuser volume therebetween. The diffuser includes at least one distribution surface that is configured to provide a flow restriction to the process gases as they pass through the diffuser volume before being introduced into the reaction chamber.Type: GrantFiled: April 5, 2010Date of Patent: July 19, 2016Assignee: ASM America, Inc.Inventors: Eric Shero, Mohith E. Verghese, Carl L. White, Herbert Terhorst, Dan Maurice
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Patent number: 9388492Abstract: A device for performing ALD includes a housing having a vacuum chamber that surrounds a horizontal flow reactor. The device further includes a gas distribution system for delivering gases to the reactor. The gas distribution system includes at least one of a high temperature valve and a high temperature filter disposed inside the vacuum chamber. The high temperature valve (and/or filter) controls (and/or filters) a supply of a precursor/reactant gas, inert gas, or precursor/reactant and inert gas mixture before it enters the horizontal flow reactor.Type: GrantFiled: December 27, 2011Date of Patent: July 12, 2016Assignee: ASM AMERICA, INC.Inventors: Carl L. White, Eric Shero
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Patent number: 8986456Abstract: A precursor source vessel for providing vaporized precursor to a reaction chamber is provided. The precursor source vessel includes a lid having a first port, a second port, and a third port. The precursor source vessel also includes a base removably attached to the lid. The base includes a recessed region formed therein. One of the first, second, and third ports is a burp port configured to relieve the head pressure within the source vessel after the source vessel is installed but prior to use of the source vessel in semiconductor processing.Type: GrantFiled: April 19, 2010Date of Patent: March 24, 2015Assignee: ASM America, Inc.Inventors: Kyle Fondurulia, Eric Shero, Mohith E. Verghese, Carl L. White
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Publication number: 20130232866Abstract: Disclosed herein are photobioreactor systems for high productivity aquaculture or aquafarming for growing of algae or other organisms in an aquatic environment featuring aspects that favor improved growth rates by achieving control over the contents of the growth medium, including carbon source, nitrogen source, and essential trace elements necessary for growth.Type: ApplicationFiled: January 29, 2013Publication date: September 12, 2013Applicant: HELIAE DEVELOPMENT, LLCInventors: Jason D. LICAMELE, Carl L. WHITE
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Publication number: 20130160709Abstract: A device for performing ALD includes a housing having a vacuum chamber that surrounds a horizontal flow reactor. The device further includes a gas distribution system for delivering gases to the reactor. The gas distribution system includes at least one of a high temperature valve and a high temperature filter disposed inside the vacuum chamber. The high temperature valve (and/or filter) controls (and/or filters) a supply of a precursor/reactant gas, inert gas, or precursor/reactant and inert gas mixture before it enters the horizontal flow reactor.Type: ApplicationFiled: December 27, 2011Publication date: June 27, 2013Applicant: ASM AMERICA, INC.Inventors: Carl L. White, Eric Shero
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Patent number: 8365462Abstract: Disclosed herein are photobioreactor systems for high productivity aquaculture or aquafarming for growing of algae or other organisms in an aquatic environment featuring aspects that favor improved growth rates by achieving control over the contents of the growth medium, including carbon source, nitrogen source, and essential trace elements necessary for growth.Type: GrantFiled: May 31, 2011Date of Patent: February 5, 2013Assignee: Heliae Development, LLCInventors: Jason D. Licamele, Carl L. White
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Patent number: 8341877Abstract: Disclosed herein are photobioreactor systems for high productivity aquaculture or aquafarming for growing of algae or other organisms in an aquatic environment featuring aspects that favor improved growth rates by achieving control over the contents of the growth medium, including carbon source, nitrogen source, and essential trace elements necessary for growth.Type: GrantFiled: September 30, 2011Date of Patent: January 1, 2013Assignee: Heliae Development, LLCInventors: Jason D. Licamele, Carl L. White
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Patent number: 8216380Abstract: A semiconductor processing apparatus includes a reaction chamber, a movable susceptor, a movement element, and a control system. The reaction chamber includes a baseplate. The baseplate includes an opening. The movable susceptor is configured to hold a workpiece. The movable element is configured to move a workpiece held on the susceptor towards the opening of the baseplate. The control system is configured to space the susceptor from the baseplate by an unsealed gap during processing of a workpiece in the reaction chamber. Purge gases may flow through the gap into the reaction chamber. Methods of maintaining the gap during processing include calibrating the height of pads and capacitance measurements when the susceptor is spaced from the baseplate.Type: GrantFiled: January 8, 2009Date of Patent: July 10, 2012Assignee: ASM America, Inc.Inventors: Carl L. White, Eric Shero, Joe Reed
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Publication number: 20120156108Abstract: A precursor source vessel comprises a vessel body, a passage within the vessel body, and a valve attached to a surface of the body. An internal chamber is adapted to contain a chemical reactant, and the passage extends from outside the body to the chamber. The valve regulates flow through the passage. The vessel has inlet and outlet valves, and optionally a vent valve for venting internal gas. An external gas panel can include at least one valve fluidly interposed between the outlet valve and a substrate reaction chamber. Gas panel valves can each be positioned along a plane that is generally parallel to, and no more than about 10.0 cm from, a flat surface of the vessel. Filters in a vessel lid or wall filter gas flow through the vessel's valves. A quick-connection assembly allows fast and easy connection of the vessel to a gas panel.Type: ApplicationFiled: February 24, 2012Publication date: June 21, 2012Applicant: ASM AMERICA, INC.Inventors: KYLE FONDURULIA, Eric Shero, Mohith E. Verghese, Carl L. White
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Patent number: 8137462Abstract: A precursor source vessel comprises a vessel body, a passage within the vessel body, and a valve attached to a surface of the body. An internal chamber is adapted to contain a chemical reactant, and the passage extends from outside the body to the chamber. The valve regulates flow through the passage. The vessel has inlet and outlet valves, and optionally a vent valve for venting internal gas. An external gas panel can include at least one valve fluidly interposed between the outlet valve and a substrate reaction chamber. Gas panel valves can each be positioned along a plane that is generally parallel to, and no more than about 10.0 cm from, a flat surface of the vessel. Filters in a vessel lid or wall filter gas flow through the vessel's valves. A quick-connection assembly allows fast and easy connection of the vessel to a gas panel.Type: GrantFiled: October 10, 2007Date of Patent: March 20, 2012Assignee: ASM America, Inc.Inventors: Kyle Fondurulia, Eric Shero, Mohith E Verghese, Carl L White
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Publication number: 20120064508Abstract: Disclosed herein are photobioreactor systems for high productivity aquaculture or aquafarming for growing of algae or other organisms in an aquatic environment featuring aspects that favor improved growth rates by achieving control over the contents of the growth medium, including carbon source, nitrogen source, and essential trace elements necessary for growth.Type: ApplicationFiled: September 30, 2011Publication date: March 15, 2012Applicant: Heliae Development, LLCInventors: Jason D. Licamele, Carl L. White
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Publication number: 20110258920Abstract: Disclosed herein are photobioreactor systems for high productivity aquaculture or aquafarming for growing of algae or other organisms in an aquatic environment featuring aspects that favor improved growth rates by achieving control over the contents of the growth medium, including carbon source, nitrogen source, and essential trace elements necessary for growth.Type: ApplicationFiled: May 31, 2011Publication date: October 27, 2011Inventors: Jason D. LICAMELE, Carl L. WHITE
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Publication number: 20100322604Abstract: A precursor source vessel for providing vaporized precursor to a reaction chamber is provided. The precursor source vessel includes a lid having a first port, a second port, and a third port. The precursor source vessel also includes a base removably attached to the lid. The base includes a recessed region formed therein. One of the first, second, and third ports is a burp port configured to relieve the head pressure within the source vessel after the source vessel is installed but prior to use of the source vessel in semiconductor processing.Type: ApplicationFiled: April 19, 2010Publication date: December 23, 2010Inventors: Kyle Fondurulia, Eric Shero, Mohith E. Verghese, Carl L. White
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Publication number: 20100307415Abstract: A reactor having a housing that encloses a gas delivery system operatively connected to a reaction chamber and an exhaust assembly. The gas delivery system includes a plurality of gas lines for providing at least one process gas to the reaction chamber. The gas delivery system further includes a mixer for receiving the at least one process gas. The mixer is operatively connected to a diffuser that is configured to diffuse process gases. The diffuser is attached directly to an upper surface of the reaction chamber, thereby forming a diffuser volume therebetween. The diffuser includes at least one distribution surface that is configured to provide a flow restriction to the process gases as they pass through the diffuser volume before being introduced into the reaction chamber. The reaction chamber defines a reaction space in which a semiconductor substrate is disposed for processing.Type: ApplicationFiled: April 5, 2010Publication date: December 9, 2010Inventors: Eric Shero, Mohith E. Verghese, Carl L. White, Herbert Terhorst, Dan Maurice
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Publication number: 20100266765Abstract: An apparatus and method of growing a thin film onto a substrate comprises placing a substrate in a reaction chamber and subjecting the substrate to surface reactions of a plurality of vapor-phase reactants according to the ALD method. Non-fully closing valves are placed into the reactant feed conduit and backsuction conduit of an ALD system. The non-fully closed valves are operated such that one valve is open and the other valve is closed during the purge or pulse cycle of the ALD process.Type: ApplicationFiled: April 21, 2009Publication date: October 21, 2010Inventors: Carl L. White, Eric J. Shero
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Publication number: 20100173432Abstract: A semiconductor processing apparatus includes a reaction chamber, a movable susceptor, a movement element, and a control system. The reaction chamber includes a baseplate. The baseplate includes an opening. The movable susceptor is configured to hold a workpiece. The movable element is configured to move a workpiece held on the susceptor towards the opening of the baseplate. The control system is configured to space the susceptor from the baseplate by an unsealed gap during processing of a workpiece in the reaction chamber. Purge gases may flow through the gap into the reaction chamber. Methods of maintaining the gap during processing include calibrating the height of pads and capacitance measurements when the susceptor is spaced from the baseplate.Type: ApplicationFiled: January 8, 2009Publication date: July 8, 2010Applicant: ASM America, Inc.Inventors: Carl L. White, Eric Shero, Joe Reed
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Patent number: D614153Type: GrantFiled: April 6, 2009Date of Patent: April 20, 2010Assignee: ASM America, Inc.Inventors: Kyle Fondurulia, Eric J Shero, Mohith Verghese, Carl L White