Abstract: Apparatus, method and program product detect an attempt to tamper with a microchip by determining that an electrical path comprising one or more connections and a metal plate attached to the backside of a microchip has become disconnected or otherwise altered. A tampering attempt may also be detected in response to the presence of an electrical path that should not be present, as may result from the microchip being incorrectly reconstituted. Actual and/or deceptive paths may be automatically selected and monitored to further confound a reverse engineering attempt.

Abstract: Apparatus, method and program product detect an attempt to tamper with a microchip by determining that an electrical path comprising one or more connections and a metal plate attached to the backside of a microchip has become disconnected or otherwise altered. A tampering attempt may also be detected in response to the presence of an electrical path that should not be present, as may result from the microchip being incorrectly reconstituted. Actual and/or deceptive paths may be automatically selected and monitored to further confound a reverse engineering attempt.

Abstract: A system for plasma etching predetermined portions of material on the major surfaces of a plurality of substrates. The system comprises a plurality of electrodes substantially parallel to each other and to substrates alternating therewith. Each of the electrodes is of a hollow configuration and includes a pair of flat sides, each side having a plurality of tapered apertures therein. A means for directing a reactive gas through the apertures toward the substrates is provided. A first bus structure electrically connects the substrates and may be grounded. A second bus structure electrically connects alternate ones of the electrodes and is connected to a first radio frequency power source. A third bus structure electrically connects the remaining ones of the electrodes and is connected to a second radio frequency power source adapted to operate 180 degrees out of phase with the first power source.

Abstract: A system for plasma etching predetermined portions of material on the major surfaces of a plurality of substrates. The system comprises a plasma reactor chamber, provision for continuously introducing a gas to be converted in a reactive species by an electrical field, provision for forcing the gas through one or more through holes in the substrates, provision for continuously exhausting gas, an automatic transport or drive mechanism connected to the chamber and to the substrates to facilitate the advancement of substrates seriatim along a predetermined path in the chamber, and a vacuum lock connected to the chamber for maintaining a substantially constant atmosphere in the chamber while each of the substrates is inserted into and removed from the chamber.

Abstract: A method and apparatus for laser cutting sheet material and especially for laser cutting composite sheet material. An inert gas shield, preferably of nitrogen, is provided at the cutting zone to minimize charred edges of the cut material and resulting in an extremely accurate and uniform cut line. The gas shield can also be used to accurately position the sheet material so as to lie at the focal point of the laser beam. Alternatively, a vacuum can draw the sheet material against a supporting surface for positioning the sheet material. In a continuous process, one or more stationary lasers operating on an advancing web of the sheet material are positioned to cut in the longitudinal direction and a movable laser is positioned to cut in the transverse direction. Mechanical expedients enable the movable laser to make a cut perpendicular to the cut made by each stationary laser without interrupting the flow of the sheet material.