Patents by Inventor Carl Soccolich

Carl Soccolich has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6753118
    Abstract: A grating fabrication process utilizes real-time measurement of a grating characteristic (such as, for example, grating period chirp, reflectivity, group delay) as a feedback error signal to modify the writing process and improve the characteristics of the finished grating. A test beam is launched through the optical medium during the writing process (or at the end of an initial writing process) and a particular characteristic is measured and used to generate a “corrective” apodization refractive index profile that can be incorporated with the grating to improve its characteristics. The improvements may be applied to a phase (or amplitude) mask used to write the grating (etching, local deformation, coating changes, for example), or the grating itself may be corrected using additional UV exposure, non-uniform annealing, non-uniform heating, and/or non-uniform tension—these techniques applied separately or in an intermittent sequence.
    Type: Grant
    Filed: March 27, 2002
    Date of Patent: June 22, 2004
    Assignee: Fitel USA Corp.
    Inventors: Rajan D. Deshmukh, Benjamin J. Eggleton, Pavel Ivanoff Reyes, Carl Soccolich, Michael Sumetsky, Paul S. Westbrook
  • Publication number: 20030186142
    Abstract: A grating fabrication process utilizes real-time measurement of a grating characteristic (such as, for example, grating period chirp, reflectivity, group delay) as a feedback error signal to modify the writing process and improve the characteristics of the finished grating. A test beam is launched through the optical medium during the writing process (or at the end of an initial writing process) and a particular characteristic is measured and used to generate a “corrective” apodization refractive index profile that can be incorporated with the grating to improve its characteristics. The improvements may be applied to a phase (or amplitude) mask used to write the grating (etching, local deformation, coating changes, for example), or the grating itself may be corrected using additional UV exposure, non-uniform annealing, non-uniform heating, and/or non-uniform tension—these techniques applied separately or in an intermittent sequence.
    Type: Application
    Filed: March 27, 2002
    Publication date: October 2, 2003
    Inventors: Rajan D. Deshmukh, Benjamin J. Eggleton, Pavel Ivanoff Reyes, Carl Soccolich, Michael Sumetsky, Paul S. Westbrook