Abstract: A scalable, high-throughput nanoimprint lithography priming tool includes a dual-reactant chemical vapor deposition reactor chamber, a mandrel configured to hold a plurality of hard disks at an inner diameter of the hard disks, and a transport mechanism to move the plurality of hard disks into and out of the chamber. The tool may also include a transfer tool to transfer the plurality of hard disks to additional chambers for processing.

Abstract: A scalable, high-throughput nanoimprint lithography priming tool includes a dual-reactant chemical vapor deposition reactor chamber, a mandrel configured to hold a plurality of hard disks at an inner diameter of the hard disks, and a transport mechanism to move the plurality of hard disks into and out of the chamber. The tool may also include a transfer tool to transfer the plurality of hard disks to additional chambers for processing.

Abstract: A sputtering apparatus and method for high rate deposition of electrically insulating and semiconducting coatings with substantially uniform stoichiometry. At least one set of vertically mounted, dual and triple rotatable cylindrical (or planar) magnetrons with associated vacuum pumps, form semi-isolated sputtering modules. The sputtering modules can be independently controlled for the sequential deposition of layers of similar or different materials. Constant voltage operation of AC power with an optional reactive gas flow feedback loop maintains constant coating stoichiometry during small changes in pumping speed caused by substrate motion. The coating method is extremely stable over long periods (days) of operation, with the film stoichiometry being selectable by the voltage control point.

Abstract: A magnetron sputtering source for depositing a material onto a substrate includes a target from which the material is sputtered, a magnet assembly disposed in proximity to the target for confining a plasma at the surface of the target and a drive assembly for scanning the magnet assembly relative to the target. The sputtering source may further include an anode for maintaining substantially constant plasma characteristics as the magnet assembly is scanned relative to the target. The anode may be implemented as variable voltage stationary electrodes positioned at or near the opposite ends of the scan path followed by the magnet assembly, spaced-apart anode wires positioned between the target and the substrate or a movable anode that is scanned with the magnet assembly. The magnet elements of the magnet assembly may have different spacings from the surface of the target to enhance depositional thickness uniformity.

Abstract: Centering pins mounted to a susceptor in a vacuum chamber align a glass substrate with respect to the susceptor on which it is supported, and with respect to a shadow frame which overlies the periphery of the substrate and protects the edge and underside of the substrate from undesired processing.Shaped pins loosely mounted in openings in the susceptor so that the pins extend above the upper surface of the susceptor support the centered glass substrate during the transporting stages, but recess into the heated susceptor during processing.

Abstract: Centering pins mounted to a susceptor in a vacuum chamber align a glass substrate with respect to the susceptor on which it is supported, and with respect to a shadow frame which overlies the periphery of the substrate and protects the edge and underside of the substrate from undesired processing.Shaped pins loosely mounted in openings in the susceptor so that the pins extend above the upper surface of the susceptor support the centered glass substrate during the transporting stages, but recess into the susceptor during processing.

Abstract: A loadlock apparatus for a workpiece processing chamber such as those incorporated in vacuum processing systems. The apparatus includes an isolation chamber having evacuation apertures and workpiece transfer apertures with independently operable doors for closing and sealing the workpiece transfer apertures and an independent operable workpiece transfer mechanism. The doors and workpiece transfer mechanisms may be contained within the isolation chamber and the chamber may be closed and sealed while containing a workpiece. The door and workpiece transfer mechanisms may be adapted such that they are not positioned over the workpiece, thereby reducing the possibility of workpiece particulate contamination.The preferred embodiment of the workpiece transfer mechanism moves a workpiece through the isolation chamber along a path which is essentially a straight line.

Abstract: A loadlock apparatus for a workpiece processing chamber such as those incorporated in vacuum processing systems. The apparatus includes an isolation chamber having evacuation apertures and workpiece transfer apertures with independently operable doors for closing and sealing the workpiece transfer apertures and an independent operable workpiece transfer mechanism. The doors and workpiece transfer mechanisms may be contained within the isolation chamber and the chamber may be closed and sealed while containing a workpiece. The door and workpiece transfer mechanisms may be adapted such that they are not positioned over the workpiece, thereby reducing the possibility of workpiece particulate contamination.The preferred embodiment of the workpiece transfer mechanism moves a workpiece through the isolation chamber along a path which is essentially a straight line.

Abstract: An improved method and apparatus for facilitating specimen handling during freezing, coating and transfer to and from the main chamber of an SEM. A unique specimen shuttle manipulable by a control rod permits transfer of a specimen between the main chamber and an auxiliary air lock chamber alternatively defined by an air lock housing and a coating apparatus housing. Either housing is removably attached to an entrance flange communicating via a gate valve assembly with the main chamber and is provided with a sealable access aperture for enabling transfer of both frozen and unfrozen specimens to and from the airlock chamber. The specimen manipulator enables specimen attachment and removal from the shuttle and has a frost shield for eliminating frost formation on the specimen surface during handling after freezing.